公开(公告)号：US11315782B2

公开(公告)日：2022-04-26

申请号：US16616723

申请日：2018-04-26

申请人： PLANSEE SE ,  OSRAM GMBH

发明人： Hannes Traxler ,  Ingmar Wesemann ,  Wolfram Knabl ,  Alexander Tautermann ,  Maria Nilius

IPC分类号： H01J61/073 ,  C22C1/05 ,  H01J9/04

摘要： A cathode material for use in a high-pressure discharge lamp contains a matrix based on tungsten having a tungsten content of greater than or equal to 95% by weight, tungsten carbide, and oxides and/or predominantly oxidic phases of one or more emitter elements from the group of rare earth metals, Hf, and Zr. The cathode material additionally contains predominantly carbidic phases of the one or more emitter elements from the group of rare earth metals, Hf, and Zr. A high-pressure discharge lamp would contain such a cathode composed of the above cathode material.

公开(公告)号：US11065685B2

公开(公告)日：2021-07-20

申请号：US16626644

申请日：2018-06-12

申请人： PLANSEE SE

发明人： Thomas Huber ,  Katrin Knittl ,  Wolfram Knabl ,  Wolfgang Simader

IPC分类号： B22D11/06 ,  B22F3/17 ,  B22F3/06 ,  B22F3/18 ,  C22F1/18 ,  B21J9/02

摘要： A slinger, or slinger ring, for a melt spinning apparatus has a cylindrical, mechanically shaped main element that is composed of a refractory metal or a refractory metal-based alloy and has a circumferential surface running in a tangential direction. The circumferential surface is delimited in the axial direction by two end faces. A degree of deformation in the radial direction is greater than the degree of deformation in the axial direction.

公开(公告)号：US10329661B2

公开(公告)日：2019-06-25

申请号：US14764007

申请日：2014-01-29

申请人： PLANSEE SE

发明人： Christian Linke ,  Jiehua Li ,  Peter Schumacher ,  Wolfram Knabl ,  Gerhard Leichtfried

IPC分类号： C23C14/34 ,  B22F3/02 ,  B22F3/12 ,  B22F9/08 ,  B22F9/04 ,  B22F1/00 ,  C22C30/02 ,  C22C24/00 ,  H01J37/34 ,  H01L31/18 ,  C22C1/04 ,  C22C9/00 ,  C22C28/00 ,  B22F3/15 ,  B22F3/105

摘要： A sputtering target is composed of an alloy consisting of 5 to 70 at % of at least one element from the group of (Ga, In) and 0.1 to 15 at % of Na, the remainder being Cu and typical impurities. The sputtering target includes at least one intermetallic Na-containing phase.

公开(公告)号：US09767983B2

公开(公告)日：2017-09-19

申请号：US15133480

申请日：2016-04-20

申请人： PLANSEE SE

发明人： Johann Eiter ,  Juergen Schatte ,  Wolfgang Glatz ,  Wolfram Knabl ,  Gerhard Leichtfried ,  Stefan Schoenauer

IPC分类号： H01J35/10

CPC分类号： H01J35/108 ,  H01J2235/081 ,  H01J2235/085

摘要： A rotary X-ray anode has a support body and a focal track formed on the support body. The support body and the focal track are produced as a composite by powder metallurgy. The support body is formed from molybdenum or a molybdenum-based alloy and the focal track is formed from tungsten or a tungsten-based alloy. Here, in the conclusively heat-treated rotary X-ray anode, at least one portion of the focal track is located in a non-recrystallized and/or in a partially recrystallized structure.

公开(公告)号：US11072553B2

公开(公告)日：2021-07-27

申请号：US16088164

申请日：2017-03-23

申请人： PLANSEE SE

发明人： Hannes Traxler ,  Michael Mark ,  Robert Schiftner ,  Wolfram Knabl

IPC分类号： C03B5/425 ,  B22F3/24 ,  C03B5/167 ,  C03B5/43 ,  B22F5/00 ,  C22C27/00 ,  B22F3/16 ,  C21D7/06 ,  C21D1/26 ,  C22F1/18 ,  C22C1/04

摘要： A process for producing a glass melting component composed of refractory metal. A surface zone of the glass melting component is densified at least in sections by application of local compressive stress. As a result the surface zone has its porosity reduced compared to a volume section which is located underneath the surface zone and which has residual porosity.