公开(公告)号：US09272273B2

公开(公告)日：2016-03-01

申请号：US14168660

申请日：2014-01-30

申请人： POSTECH ACADEMY-INDUSTRY FOUNDATION

发明人： Dong-Pyo Kim ,  Kottagalu Chikkalingaiah Basavaraju

IPC分类号： B01J21/00 ,  B01J25/00 ,  B01J29/00 ,  B01J31/00 ,  B01J23/00 ,  B01J31/06 ,  B01J23/52 ,  B01J23/50 ,  B01J23/44 ,  B01J37/02

CPC分类号： B01J31/069 ,  B01J19/0093 ,  B01J23/40 ,  B01J23/44 ,  B01J23/50 ,  B01J23/52 ,  B01J29/0325 ,  B01J35/0013 ,  B01J35/006 ,  B01J35/1061 ,  B01J37/0018 ,  B01J37/0207 ,  B01J2219/00783 ,  B01J2219/00828 ,  B01J2219/00833 ,  B01J2219/00835 ,  B01J2229/60 ,  B01J2231/30 ,  B01J2231/44 ,  B01J2231/64 ,  B01J2231/72 ,  B01J2231/76

摘要： This invention relates to a vertically aligned mesoporous silicate film with site-selective metal deposition from a single polymeric precursor and to diverse catalytic applications thereof. There is an innovative approach of a single precursor to manufacture a vertically aligned mesoporous silicate thin film having high thermal and chemical resistance on a large-area silicon wafer (2 cm×3 cm). A precisely designed organic-inorganic block copolymer (BCP) polyethyleneoxide-ss-polyvinylcyclicsilazane (PEO-ss-PVCSZ) with a disulfide bridge that is chemically cleavable is newly synthesized as the single precursor for an oriented silicate nanoporous film, and using such a precursor, solvent annealing, self-assembling, block cleaving treatment, and then hydrolysis conversion of a polymer into a siliceous phase at room temperature are carried out, thus directly forming a mesostructure on the substrate.

摘要翻译： 本发明涉及一种垂直取向的介孔硅酸盐薄膜，其具有来自单一聚合物前体的位置选择性金属沉积及其各种催化应用。 在大面积硅晶片（2cm×3cm）上制造具有高耐热和耐化学性的垂直取向的中孔硅酸盐薄膜的单一前体的创新方法。 作为导向硅酸盐纳米多孔膜的单一前体，新合成了具有可化学切割的二硫键的精确设计的有机 - 无机嵌段共聚物（BCP）聚环氧乙烷-β-聚乙烯基环硅氮烷（PEO-β-PVCSZ），并使用这种前体 进行溶剂退火，自组装，嵌段裂解处理，然后在室温下将聚合物水解转化为硅质相，由此直接在基材上形成介孔结构。