摘要:
Bubble-free core glass can be deposited at relatively high rate (e.g., >0.3 gm SiO.sub.2 /minute, preferably 0.6 gm SiO.sub.2 /minute or more) by MCVD if the deposition conditions are appropriately selected. For instance, a relatively high torch traverse speed, a relatively low sintering temperature, and/or relatively low gas flow rates can facilitate high rate deposition of bubble-free glass. By way of example, conditions are disclosed that yielded essentially bubble-free core glass (.DELTA.=0.35%) at a rate of 1 gm SiO.sub.2 /minute.
摘要:
The deposition rate of MCVD processes is enhanced by applying at least a first and a second independently controlled heat source to a plurality of reactants which are used to form deposited particulate matter. The first heat source is adjusted so as to provide at least a specified rate of reaction for the reactants, and the second source is adjusted so as to provide at least a specified deposition rate for the particulate matter.
摘要:
Multistage Er-doped fiber amplifiers (EDFAs) are disclosed. They comprise a first stage that comprises Er and Al, and further comprise a second stage that comprises Er and a further rare earth element, exemplary Yb. Such multistage EDFAs can have advantageous characteristics e.g., a relatively wide flat gain region (e.g. 1544-1562 nm), and relatively high output power, without significant degradation of the noise figure. Exemplary, the amplifiers are used in WDM systems and in analog CATV systems.