公开(公告)号：US20070169800A1

公开(公告)日：2007-07-26

申请号：US11625556

申请日：2007-01-22

申请人： Pejman Fani ,  Mark Rouillard ,  John Korbler ,  James Brown ,  Chad Hosack

发明人： Pejman Fani ,  Mark Rouillard ,  John Korbler ,  James Brown ,  Chad Hosack

IPC分类号： B08B3/00 ,  B08B3/12

CPC分类号： H01L21/02057 ,  B08B3/04 ,  B08B3/10 ,  B08B3/12 ,  H01L21/67051

摘要： A system, apparatus and method for processing this flat articles, such as semiconductor wafers, with acoustical energy. In a cleaning process, the inventive system, apparatus and method can remove particles from both sides of a wafer more efficiently and effectively. in one aspect, the invention is a system for processing flat articles comprising: a rotatable support for supporting a flat article; a first dispenser for applying liquid to a first surface of a flat article on the rotatable support; a second dispenser for applying liquid to a second surface of a flat article on the rotatable support; a first transducer assembly comprising a first transducer for generating acoustic energy and a first transmitter acoustically coupled to the first transducer, the first transducer assembly positioned so that when the first dispenser applies liquid to the first surface of a flat article on the rotatable support, a first meniscus of liquid is formed between a portion of the first transmitter and the first surface of the flat article; and a second transducer assembly comprising a second transducer for generating acoustic energy and a second transmitter acoustically coupled to the second transducer, the second transducer assembly positioned so that when the second dispenser applies liquid to the second surface of the flat article on the rotatable support, a second meniscus of liquid is formed between a portion of the second transmitter and the second surface of the flat article.

摘要翻译： 用于处理具有声能的扁平制品（例如半导体晶片）的系统，装置和方法。 在清洁过程中，本发明的系统，装置和方法可以更有效和更有效地从晶片的两侧去除颗粒。 在一个方面，本发明是一种用于处理扁平制品的系统，包括：用于支撑扁平制品的可旋转支撑件; 用于将液体施加到可旋转支撑件上的扁平物品的第一表面的第一分配器; 用于将液体施加到可旋转支撑件上的平坦物品的第二表面的第二分配器; 第一传感器组件，包括用于产生声能的第一传感器和声耦合到第一换能器的第一传感器，第一传感器组件被定位成使得当第一分配器将液体施加到可旋转支撑件上的平坦物品的第一表面时， 在第一发射器的一部分和平坦物品的第一表面之间形成液体的第一弯液面; 以及第二换能器组件，其包括用于产生声能的第二换能器和声耦合到所述第二换能器的第二发射器，所述第二换能器组件被定位成使得当所述第二分配器将液体施加到所述可旋转支撑件上的所述扁平物品的第二表面时， 在第二发射器的一部分和平坦物品的第二表面之间形成液体的第二弯液面。

公开(公告)号：US08316869B2

公开(公告)日：2012-11-27

申请号：US12871286

申请日：2010-08-30

申请人： Pejman Fani ,  Mark Rouillard ,  John Korbler ,  James Brown ,  Chad Hosack

发明人： Pejman Fani ,  Mark Rouillard ,  John Korbler ,  James Brown ,  Chad Hosack

IPC分类号： B08B3/00

CPC分类号： H01L21/02057 ,  B08B3/04 ,  B08B3/10 ,  B08B3/12 ,  H01L21/67051

摘要： A system, apparatus and method for processing flat articles with acoustical energy. The inventive system, apparatus and method can remove particles from both sides of a wafer more efficiently and effectively. In one aspect, the invention is a system and/or method for processing flat articles wherein a liquid is applied to both major surfaces of the flat article. A first transducer assembly is positioned adjacent to a first of the major surfaces of the flat article and a second member is positioned adjacent to a second of the major surfaces. The first transducer assembly generates and transmits acoustical energy to the first major surface of the flat article while the second member either: (1) reflects the acoustical energy generated by the first transducer assembly back to the second major surface of the flat article; and/or (2) generates and transmits acoustical energy to the second major surface of the flat article.

摘要翻译： 用于处理具有声能的扁平制品的系统，装置和方法。 本发明的系统，装置和方法可以更有效和有效地从晶片的两侧去除颗粒。 一方面，本发明是一种用于处理扁平制品的系统和/或方法，其中将液体施加到扁平制品的两个主表面上。 第一换能器组件邻近扁平制品的第一主表面定位，并且第二构件邻近第二主表面定位。 第一换能器组件产生并将声能传递到扁平制品的第一主表面，而第二构件可以：（1）将由第一换能器组件产生的声能反射回平面物品的第二主表面; 和/或（2）产生和传播声能到平坦物品的第二主表面。

公开(公告)号：US07784478B2

公开(公告)日：2010-08-31

申请号：US11625556

申请日：2007-01-22

申请人： Pejman Fani ,  Mark Rouillard ,  John Korbler ,  James Brown ,  Chad Hosack

发明人： Pejman Fani ,  Mark Rouillard ,  John Korbler ,  James Brown ,  Chad Hosack

IPC分类号： B08B3/12

CPC分类号： H01L21/02057 ,  B08B3/04 ,  B08B3/10 ,  B08B3/12 ,  H01L21/67051

摘要： A system, apparatus and method for processing flat articles, such as semiconductor wafers, with acoustical energy. In a cleaning process, the inventive system, apparatus and method can remove particles from both sides of a wafer more efficiently and effectively. In one aspect, the invention is a system for processing flat articles comprising: a first dispenser for applying a liquid to a first surface of a flat article; a second dispenser for applying liquid to a second surface of a flat article; a first transducer assembly positioned so as to transmit acoustical energy to the first surface of the flat article; and a second transducer assembly positioned so as to transmit acoustical energy to the second surface of the flat article.

摘要翻译： 用于处理具有声能的扁平制品（例如半导体晶片）的系统，装置和方法。 在清洁过程中，本发明的系统，装置和方法可以更有效和更有效地从晶片的两侧去除颗粒。 一方面，本发明是一种用于处理扁平制品的系统，包括：用于将液体施加到平坦物品的第一表面的第一分配器; 用于将液体施加到平坦物品的第二表面的第二分配器; 第一换能器组件被定位成将声能传递到平坦物品的第一表面; 以及第二换能器组件，其定位成将声能传递到平坦物品的第二表面。

公开(公告)号：US20100326464A1

公开(公告)日：2010-12-30

申请号：US12871286

申请日：2010-08-30

申请人： Pejman Fani ,  Mark Rouillard ,  John Korbler ,  James Brown ,  Chad Hosack

发明人： Pejman Fani ,  Mark Rouillard ,  John Korbler ,  James Brown ,  Chad Hosack

IPC分类号： B08B3/12

CPC分类号： H01L21/02057 ,  B08B3/04 ,  B08B3/10 ,  B08B3/12 ,  H01L21/67051

摘要： A system, apparatus and method for processing flat articles with acoustical energy. The inventive system, apparatus and method can remove particles from both sides of a wafer more efficiently and effectively. In one aspect, the invention is a system and/or method for processing flat articles wherein a liquid is applied to both major surfaces of the flat article. A first transducer assembly is positioned adjacent to a first of the major surfaces of the flat article and a second member is positioned adjacent to a second of the major surfaces. The first transducer assembly generates and transmits acoustical energy to the first major surface of the flat article while the second member either: (1) reflects the acoustical energy generated by the first transducer assembly back to the second major surface of the flat article; and/or (2) generates and transmits acoustical energy to the second major surface of the flat article.

摘要翻译： 用于处理具有声能的扁平制品的系统，装置和方法。 本发明的系统，装置和方法可以更有效和有效地从晶片的两侧去除颗粒。 一方面，本发明是一种用于处理扁平制品的系统和/或方法，其中将液体施加到扁平制品的两个主表面上。 第一换能器组件邻近扁平制品的第一主表面定位，并且第二构件邻近第二主表面定位。 第一传感器组件产生并将声能传递到扁平制品的第一主表面，而第二构件可以：（1）将由第一换能器组件产生的声能反射回平面物品的第二主表面; 和/或（2）产生和传播声能到平坦物品的第二主表面。

公开(公告)号：US20070170812A1

公开(公告)日：2007-07-26

申请号：US11625651

申请日：2007-01-22

申请人： Pejman Fani ,  Mark Rouillard

发明人： Pejman Fani ,  Mark Rouillard

IPC分类号： H01L41/00

CPC分类号： B08B3/12 ,  B06B1/0648 ,  B06B1/0655 ,  H01L21/67051 ,  H01L21/67057 ,  H01L2924/01012 ,  H01L2924/01019 ,  H01L2924/0102 ,  H01L2924/01021 ,  H01L2924/01025 ,  H01L2924/01057 ,  H01L2924/01067 ,  H01L2924/01068 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/3011

摘要： A wafer cleaning system having a crystal or ceramic transducer assembly. The transducer assembly is adapted to convert electrical energy into sonic energy. The crystal or ceramic has a first conductive surface. The transducer assembly also has a transmitter made of an inert non-reactive plastic that transmits the sonic energy generated by the crystal or ceramic. The transmitter has a surface bonded directly to the conductive surface of the crystal or ceramic.

摘要翻译： 具有晶体或陶瓷换能器组件的晶片清洁系统。 换能器组件适于将电能转换成声能。 晶体或陶瓷具有第一导电表面。 换能器组件还具有由惰性非反应性塑料制成的发射器，其传输由晶体或陶瓷产生的声能。 发射器具有直接结合到晶体或陶瓷的导电表面的表面。

公开(公告)号：US20070261716A1

公开(公告)日：2007-11-15

申请号：US11745866

申请日：2007-05-08

申请人： Cole Franklin ,  Mark Rouillard ,  Yan Fan

发明人： Cole Franklin ,  Mark Rouillard ,  Yan Fan

IPC分类号： B08B7/00 ,  B08B3/00

CPC分类号： H01L21/67051 ,  B05B7/0483 ,  B08B3/02

摘要： A spray cleaning device having an atomizing unit with at least one gas passage and at least one cleaning fluid passage converging into a atomizing area. The gas flowing though the gas passage and the cleaning fluid flowing through the cleaning fluid passages combine to form a mixture at the atomizing area. The accelerating unit has an acceleration passage for spraying the mixture onto a substrate surface. The gas passages are preferably angled with respect to the cleaning acceleration passage.

摘要翻译： 一种喷雾清洁装置，具有具有至少一个气体通道的雾化单元和汇聚到雾化区域中的至少一个清洁流体通道。 流过气体通道的气体和流过清洗流体通道的清洗流体在雾化区域结合形成混合物。 加速单元具有用于将混合物喷射到基板表面上的加速通道。 气体通道优选地相对于清洁加速通道成角度。

公开(公告)号：US07946299B2

公开(公告)日：2011-05-24

申请号：US11745866

申请日：2007-05-08

申请人： Cole Franklin ,  Mark Rouillard ,  Yan Fan

发明人： Cole Franklin ,  Mark Rouillard ,  Yan Fan

IPC分类号： B08B3/04

CPC分类号： H01L21/67051 ,  B05B7/0483 ,  B08B3/02

摘要： A spray cleaning device having an atomizing unit with at least one gas passage and at least one cleaning fluid passage converging into a atomizing area. The gas flowing though the gas passage and the cleaning fluid flowing through the cleaning fluid passages combine to form a mixture at the atomizing area. The accelerating unit has an acceleration passage for spraying the mixture onto a substrate surface. The gas passages are preferably angled with respect to the cleaning acceleration passage.

摘要翻译： 一种喷雾清洁装置，具有具有至少一个气体通道的雾化单元和汇聚到雾化区域中的至少一个清洁流体通道。 流过气体通道的气体和流过清洗流体通道的清洗流体在雾化区域结合形成混合物。 加速单元具有用于将混合物喷射到基板表面上的加速通道。 气体通道优选地相对于清洁加速通道成角度。

公开(公告)号：US07087005B2

公开(公告)日：2006-08-08

申请号：US10404282

申请日：2003-04-02

申请人： Mark Rouillard

发明人： Mark Rouillard

IPC分类号： A63B26/00

CPC分类号： A63B23/0211 ,  A61H1/0292 ,  A63B23/02 ,  A63B23/0233 ,  A63B2023/006

摘要： A handgrip and leg brace assembly is located over a horizontal bench portion of a stretch bench that receives and supports a user's upper torso. The handgrip is adjustable in the horizontal and vertical planes as stretching exercises are on-going and without the user leaving the bench proper. Additional bench adjustments provide an individualized height setting, and these combined adjustments allow the bench to be personalized for each given individual in order to increase the effectiveness of certain on-the-bench stretching activities.

摘要翻译： 手柄和腿部支架组件位于伸展台的水平台部上，其接纳和支撑使用者的上身。 手握在水平和垂直平面上是可调节的，因为伸展运动正在进行，没有使用者离开工作台。 额外的工作台调整提供个性化的高度设置，并且这些组合的调整允许为每个给定的个体个性化长凳，以增加某些在台上伸展活动的有效性。