INTEGRATED CAPACITOR STRUCTURE
    1.
    发明申请
    INTEGRATED CAPACITOR STRUCTURE 有权
    集成电容结构

    公开(公告)号:US20070181924A1

    公开(公告)日:2007-08-09

    申请号:US11538227

    申请日:2006-10-03

    摘要: A semiconductor component includes an integrated capacitor structure embodied at least partly in an electrically conductive plane and which is patterned such that a multiplicity of strip elements are present. A first group of strip elements constitutes a first electrode of the capacitor structure and a second group of strip elements constitutes a second electrode of the capacitor structure. The first strip elements together with the second strip elements being at least partly interlinked in one another, and at least one strip element may have a non-constant width along its length.

    摘要翻译: 半导体部件包括至少部分地在导电平面中实现的集成电容器结构,并且被图案化以使得存在多个带​​状元件。 第一组带状元件构成电容器结构的第一电极,第二组带状元件构成电容器结构的第二电极。 第一带状元件与第二带状元件一起至少部分地彼此连接,并且至少一个带状元件沿其长度可以具有不恒定的宽度。

    Integrated capacitor structure
    2.
    发明授权
    Integrated capacitor structure 有权
    集成电容器结构

    公开(公告)号:US07485945B2

    公开(公告)日:2009-02-03

    申请号:US11538227

    申请日:2006-10-03

    IPC分类号: H01L29/00

    摘要: A semiconductor component includes an integrated capacitor structure embodied at least partly in an electrically conductive plane and which is patterned such that a multiplicity of strip elements are present. A first group of strip elements constitutes a first electrode of the capacitor structure and a second group of strip elements constitutes a second electrode of the capacitor structure. The first strip elements together with the second strip elements being at least partly interlinked in one another, and at least one strip element may have a non-constant width along its length.

    摘要翻译: 半导体部件包括至少部分地在导电平面中实现的集成电容器结构,并且被图案化以使得存在多个带​​状元件。 第一组带状元件构成电容器结构的第一电极,第二组带状元件构成电容器结构的第二电极。 第一带状元件与第二带状元件一起至少部分地彼此连接,并且至少一个带状元件沿其长度可以具有不恒定的宽度。

    Integrated circuits with inductors in multiple conductive layers

    公开(公告)号:US20060284718A1

    公开(公告)日:2006-12-21

    申请号:US11156743

    申请日:2005-06-20

    IPC分类号: H01F27/28

    CPC分类号: H01F17/0006 H01F2021/125

    摘要: Two inductors formed in multiple layers of conductive layers of integrated circuits are disclosed. Symmetric portions of a first inductor and a second inductor are formed in two or more conductive layers. Portions of the first inductor in adjacent conductive layers are connected by vias, and portions of the second inductor in adjacent conductive layers are connected by vias. The first and second inductor portions form a substantially loop-shaped structure in each conductive layer. The first and second inductor vias may be positioned at the same position within the substantially loop-shaped inductor structure by alternating inner and outer radiuses, or the vias for the second inductor may be positioned opposite the vias for the first inductor within the substantially loop-shaped inductor structure, using notches in the first and second inductor portions.