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公开(公告)号:US20130048881A1
公开(公告)日:2013-02-28
申请号:US13696033
申请日:2011-05-03
申请人: Pinchas Einziger , Eran Ben-Shmuel , Alexander Bilchinsky , Amit Rappel , Denis Dikarov , Michael Sigalov , Yoel Beberman
发明人: Pinchas Einziger , Eran Ben-Shmuel , Alexander Bilchinsky , Amit Rappel , Denis Dikarov , Michael Sigalov , Yoel Beberman
IPC分类号: B01J19/12
CPC分类号: H05B6/68 , B01J19/126 , B01J19/129 , B01J2219/0871 , B01J2219/1203 , B01J2219/1206 , F26B3/347 , G01S13/89 , H05B6/64 , H05B6/6447 , H05B6/686 , H05B6/70 , H05B6/705 , H05B6/72 , Y02B40/143 , Y02B40/146
摘要: Apparatuses and methods are disclosed for applying electromagnetic energy in a radio frequency (RF) range to an object in an energy application zone via at least one radiating element. At least one processor may be configured to determine locations of a first region and a second region in the energy application zone. In addition, the processor may be configured to regulate a source in order to apply a first predetermined amount of RF energy to the first region in the energy application zone and a second predetermined amount of RF energy to the second region in the energy application zone. The first predetermined amount of energy may be different from the second predetermined amount of energy.
摘要翻译: 公开了用于经由至少一个辐射元件将射频(RF)范围内的电磁能量施加到能量施加区域中的物体的装置和方法。 至少一个处理器可以被配置为确定能量施加区域中的第一区域和第二区域的位置。 此外,处理器可以被配置为调节源以便将第一预定量的RF能量施加到能量施加区域中的第一区域,并且将第二预定量的RF能量施加到能量施加区域中的第二区域。 第一预定量的能量可以不同于第二预定量的能量。
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公开(公告)号:US09459346B2
公开(公告)日:2016-10-04
申请号:US13696033
申请日:2011-05-03
申请人: Pinchas Einziger , Eran Ben-Shmuel , Alexander Bilchinsky , Amit Rappel , Denis Dikarov , Michael Sigalov , Yoel Biberman
发明人: Pinchas Einziger , Eran Ben-Shmuel , Alexander Bilchinsky , Amit Rappel , Denis Dikarov , Michael Sigalov , Yoel Biberman
CPC分类号: H05B6/68 , B01J19/126 , B01J19/129 , B01J2219/0871 , B01J2219/1203 , B01J2219/1206 , F26B3/347 , G01S13/89 , H05B6/64 , H05B6/6447 , H05B6/686 , H05B6/70 , H05B6/705 , H05B6/72 , Y02B40/143 , Y02B40/146
摘要: Apparatuses and methods are disclosed for applying electromagnetic energy in a radio frequency (RF) range to an object in an energy application zone via at least one radiating element. At least one processor may be configured to determine locations of a first region and a second region in the energy application zone. In addition, the processor may be configured to regulate a source in order to apply a first predetermined amount of RF energy to the first region in the energy application zone and a second predetermined amount of RF energy to the second region in the energy application zone. The first predetermined amount of energy may be different from the second predetermined amount of energy.
摘要翻译: 公开了用于经由至少一个辐射元件将射频(RF)范围内的电磁能量施加到能量施加区域中的物体的装置和方法。 至少一个处理器可以被配置为确定能量施加区域中的第一区域和第二区域的位置。 此外,处理器可以被配置为调节源以便将第一预定量的RF能量施加到能量施加区域中的第一区域,并且将第二预定量的RF能量施加到能量施加区域中的第二区域。 第一预定量的能量可以不同于第二预定量的能量。
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公开(公告)号:US20130087545A1
公开(公告)日:2013-04-11
申请号:US13508940
申请日:2010-05-12
CPC分类号: H05B6/705 , H05B1/02 , H05B6/00 , H05B6/6447 , H05B6/6455 , H05B6/68 , H05B6/686 , H05B6/687 , H05B6/688 , H05B6/70 , H05B6/72 , H05B2206/044 , Y02B40/143 , Y02B40/146
摘要: Apparatuses and methods for applying EM energy to a load. The apparatuses and methods may include at least one processor configured to receive information indicative of energy dissipated by the load for each of a plurality of modulation space elements. The processor may also be configured to associate each of the plurality of modulation space elements with a corresponding time duration of power application, based on the received information. The processor may be further configured to regulate energy applied to the load such that for each of the plurality of modulation space elements, power is applied to the load at the corresponding time duration of power application.
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公开(公告)号:US09215756B2
公开(公告)日:2015-12-15
申请号:US13508940
申请日:2010-05-12
CPC分类号: H05B6/705 , H05B1/02 , H05B6/00 , H05B6/6447 , H05B6/6455 , H05B6/68 , H05B6/686 , H05B6/687 , H05B6/688 , H05B6/70 , H05B6/72 , H05B2206/044 , Y02B40/143 , Y02B40/146
摘要: Apparatuses and methods for applying EM energy to a load. The apparatuses and methods may include at least one processor configured to receive information indicative of energy dissipated by the load for each of a plurality of modulation space elements. The processor may also be configured to associate each of the plurality of modulation space elements with a corresponding time duration of power application, based on the received information. The processor may be further configured to regulate energy applied to the load such that for each of the plurality of modulation space elements, power is applied to the load at the corresponding time duration of power application.
摘要翻译: 将EM能量施加到负载的装置和方法。 装置和方法可以包括至少一个处理器,其被配置为接收指示针对多个调制空间元件中的每一个的负载消耗的能量的信息。 处理器还可以被配置为基于所接收的信息将多个调制空间元素中的每一个与功率应用的相应持续时间相关联。 处理器还可以被配置为调节施加到负载的能量,使得对于多个调制空间元件中的每一个,功率在相应的功率施加持续时间被施加到负载。
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公开(公告)号:US20130146590A1
公开(公告)日:2013-06-13
申请号:US13695963
申请日:2011-05-03
IPC分类号: H05B6/64
摘要: Apparatuses and methods are disclosed for applying radio frequency (RF) energy from a source of electromagnetic energy to an object in an energy application zone. At least one processor may be configured to acquire information indicative of electromagnetic energy loss associated with at least a portion of the energy application zone. The processor may be further configured to determine a weight to be applied to each of a plurality of electromagnetic field patterns each having a known electromagnetic field intensity distribution and cause the source to supply each of the plurality of electromagnetic field patterns to the energy application zone at the determined weights.
摘要翻译: 公开了用于将射频(RF)能量从电磁能源施加到能量施加区中的物体的装置和方法。 至少一个处理器可以被配置为获取指示与能量施加区域的至少一部分相关联的电磁能量损失的信息。 处理器还可以被配置为确定要施加到每个具有已知电磁场强度分布的多个电磁场模式中的每一个的权重,并且使得源将多个电磁场图案中的每一个提供给能量施加区 确定的权重。
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公开(公告)号:US20120312801A1
公开(公告)日:2012-12-13
申请号:US13508932
申请日:2010-05-12
CPC分类号: H05B6/705 , H05B1/02 , H05B6/00 , H05B6/6447 , H05B6/6455 , H05B6/68 , H05B6/686 , H05B6/687 , H05B6/688 , H05B6/70 , H05B6/72 , H05B2206/044 , Y02B40/143 , Y02B40/146
摘要: An apparatus for applying EM energy to a load may include at least one processor configured to receive information indicative of dissipated energy for each of a plurality of modulation space elements and group a number of the plurality of modulations space elements into at least two subsets based on the information received indicative of dissipated energy. The processor may also be configured to associate a power delivery protocol with each of the at least two subsets wherein the power delivery protocol differs between subsets and regulate energy applied to the load in accordance with each power delivery protocol.
摘要翻译: 用于将EM能量施加到负载的装置可以包括至少一个处理器,其被配置为接收指示多个调制空间元件中的每一个的耗散能量的信息,并且基于多个调制空间元素中的至少两个子集将多个调制空间元素分组成至少两个子集 收到的信息指示消耗的能量。 处理器还可以被配置为将功率传递协议与所述至少两个子集中的每一个相关联,其中功率传递协议在子集之间不同并且根据每个功率传递协议来调节施加到负载的能量。
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公开(公告)号:US09462635B2
公开(公告)日:2016-10-04
申请号:US13508932
申请日:2010-05-12
CPC分类号: H05B6/705 , H05B1/02 , H05B6/00 , H05B6/6447 , H05B6/6455 , H05B6/68 , H05B6/686 , H05B6/687 , H05B6/688 , H05B6/70 , H05B6/72 , H05B2206/044 , Y02B40/143 , Y02B40/146
摘要: An apparatus for applying EM energy to a load may include at least one processor configured to receive information indicative of dissipated energy for each of a plurality of modulation space elements and group a number of the plurality of modulations space elements into at least two subsets based on the information received indicative of dissipated energy. The processor may also be configured to associate a power delivery protocol with each of the at least two subsets wherein the power delivery protocol differs between subsets and regulate energy applied to the load in accordance with each power delivery protocol.
摘要翻译: 用于将EM能量施加到负载的装置可以包括至少一个处理器,其被配置为接收指示多个调制空间元件中的每一个的耗散能量的信息,并且基于多个调制空间元素中的至少两个子集将多个调制空间元素分组成至少两个子集 收到的信息指示消耗的能量。 处理器还可以被配置为将功率传递协议与所述至少两个子集中的每一个相关联,其中功率传递协议在子集之间不同并且根据每个功率传递协议来调节施加到负载的能量。
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公开(公告)号:US20130240757A1
公开(公告)日:2013-09-19
申请号:US13696003
申请日:2011-05-03
IPC分类号: B01J19/12
CPC分类号: H05B6/68 , B01J19/126 , B01J19/129 , B01J2219/0871 , B01J2219/1203 , B01J2219/1206 , F26B3/347 , G01S13/89 , H05B6/64 , H05B6/6447 , H05B6/686 , H05B6/70 , H05B6/705 , H05B6/72 , Y02B40/143 , Y02B40/146
摘要: Apparatuses and methods are disclosed for applying radio frequency (RF) energy to an object in an energy application zone. At least one processor may be configured to cause RF energy to be applied at a plurality of electromagnetic field patterns to the object in the energy application zone. The processor may be further configured to determine an amount of power dissipated in the energy application zone, for each of the plurality of field patterns. The processor may also be configured to determine a spatial distribution of energy absorption characteristics across at least a portion of the energy application zone based on the amounts of power dissipated when the plurality of field patterns are applied to the energy application zone.
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公开(公告)号:US08922969B2
公开(公告)日:2014-12-30
申请号:US12926664
申请日:2010-12-02
CPC分类号: H05B6/688 , H05B6/645 , H05B6/6464 , H05B6/705 , H05B6/707 , H05B6/72 , H05B6/80 , Y02B40/143 , Y02B40/146
摘要: An apparatus for exciting a rotating field pattern in a cavity containing an object, the apparatus comprising a radiating element configured to excite an electromagnetic (EM) field pattern in the cavity, wherein the EM field pattern is excited with EM energy at a frequency in the radio-frequency (RF) range, a field rotating element configured to rotate the EM field pattern, wherein the field rotating element has an anisotropy, the anisotropy selected from magnetic anisotropy, electric anisotropy, and a combination of magnetic and electric anisotropies, and a controller configured to determine the EM field pattern according to value indicative of energy absorbable by the object and to control the anisotropy of the field rotating element in order to rotate the EM field pattern.
摘要翻译: 一种用于激发包含物体的空腔中的旋转场图案的装置,该装置包括被配置为激发空腔中的电磁(EM)场图案的辐射元件,其中EM场图案以EM能量以 射频(RF)范围,被配置为旋转EM场图案的场旋转元件,其中所述场旋转元件具有各向异性,各向异性选自磁各向异性,电各向异性以及磁各向异性的组合,以及 控制器,其被配置为根据指示由物体吸收的能量的值来确定EM场图案,并且控制场旋转元件的各向异性以便旋转EM场图案。
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公开(公告)号:US09132408B2
公开(公告)日:2015-09-15
申请号:US13696003
申请日:2011-05-03
申请人: Pinchas Einziger , Amit Rappel
CPC分类号: H05B6/68 , B01J19/126 , B01J19/129 , B01J2219/0871 , B01J2219/1203 , B01J2219/1206 , F26B3/347 , G01S13/89 , H05B6/64 , H05B6/6447 , H05B6/686 , H05B6/70 , H05B6/705 , H05B6/72 , Y02B40/143 , Y02B40/146
摘要: Apparatuses and methods are disclosed for applying radio frequency (RF) energy to an object in an energy application zone. At least one processor may be configured to cause RF energy to be applied at a plurality of electromagnetic field patterns to the object in the energy application zone. The processor may be further configured to determine an amount of power dissipated in the energy application zone, for each of the plurality of field patterns. The processor may also be configured to determine a spatial distribution of energy absorption characteristics across at least a portion of the energy application zone based on the amounts of power dissipated when the plurality of field patterns are applied to the energy application zone.
摘要翻译: 公开了用于向能量施加区域中的物体施加射频(RF)能量的装置和方法。 至少一个处理器可以被配置为使能量以多个电磁场图案施加到能量施加区域中的对象。 处理器还可以被配置为确定针对多个场模式中的每一个的能量施加区域中消耗的功率量。 处理器还可以被配置为基于当多个场模式被施加到能量施加区域时耗散的功率量来确定跨越能量施加区域的至少一部分的能量吸收特性的空间分布。
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