High density embedded interconnects in substrate

    公开(公告)号:US10804195B2

    公开(公告)日:2020-10-13

    申请号:US16230896

    申请日:2018-12-21

    Abstract: A device that includes a die and a substrate coupled to the die. The substrate includes a dielectric layer and a plurality of embedded interconnects. Each embedded interconnect located through a first planar surface of the substrate such that a first portion of the embedded interconnect is located within the dielectric layer and a second portion of the embedded interconnect is external of the dielectric layer. In some implementations, the substrate includes a core layer. In some implementations, the dielectric layer and the plurality of embedded interconnects may be part of a build up layer of the substrate.

    Bump pad structure
    3.
    发明授权

    公开(公告)号:US11527498B2

    公开(公告)日:2022-12-13

    申请号:US17038124

    申请日:2020-09-30

    Abstract: Aspects disclosed herein include a device including a bump pad structure and methods for fabricating the same. The device includes a bump pad. The device also includes a first trace adjacent the bump pad, where a first trace top surface is recessed a first recess distance from a bump pad top surface. The device also includes a second trace adjacent the first trace, covered at least in part by a solder resist. The device also includes a substrate, where the bump pad, the first trace, and the second trace are each formed on a portion of the substrate.

    Redistribution layer connection
    6.
    发明授权

    公开(公告)号:US11784151B2

    公开(公告)日:2023-10-10

    申请号:US16936263

    申请日:2020-07-22

    Abstract: Examples herein include die to metallization structure connections that eliminate the solder joint to reduce the resistance and noise on the connection. In one example, a first die is attached to a metallization layer by a plurality of copper interconnections and a second is attached to the metallization layer opposite the first die through another plurality of copper interconnections. In this example, the copper interconnects may connect the respective die to a metallization structure in the metallization layer.

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