公开(公告)号：US20140145192A1

公开(公告)日：2014-05-29

申请号：US14079709

申请日：2013-11-14

Applicant: Renesas Electronics Corporation

Inventor： Hiroyuki MOMONO

IPC: H01L27/02 ,  G06F17/50 ,  H01L21/66

CPC classification number: H01L27/14685 ,  G06F17/5072 ,  G06F2217/12 ,  H01L22/20 ,  H01L22/30 ,  H01L27/14603 ,  H01L27/14605 ,  H01L27/14623 ,  H01L27/14643 ,  H01L27/14683 ,  Y10T428/24802

Abstract: A mask includes a substrate, an effective pixel formation region and a reference pattern formation region. A pixel pattern for forming a pixel component that constitutes a pixel is arranged in the effective pixel formation region. A reference pattern for indicating a reference position where pixel pattern should be arranged in the effective pixel formation region is arranged in the reference pattern formation region. Pixel pattern is arranged to be displaced from the reference position toward a center side of the effective pixel formation region.

Abstract translation: 掩模包括衬底，有效像素形成区域和参考图案形成区域。 用于形成构成像素的像素分量的像素图案被布置在有效像素形成区域中。 用于指示在有效像素形成区域中应该排列像素图案的参考位置的参考图案被布置在参考图案形成区域中。 像素图案被布置为从参考位置向有效像素形成区域的中心侧移位。

公开(公告)号：US20170033152A1

公开(公告)日：2017-02-02

申请号：US15293805

申请日：2016-10-14

Applicant: Renesas Electronics Corporation

Inventor： Hiroyuki MOMONO

IPC: H01L27/146 ,  G06F17/50 ,  H01L21/66

CPC classification number: H01L27/14685 ,  G06F17/5072 ,  G06F2217/12 ,  H01L22/20 ,  H01L22/30 ,  H01L27/14603 ,  H01L27/14605 ,  H01L27/14623 ,  H01L27/14643 ,  H01L27/14683 ,  Y10T428/24802

Abstract: A mask includes a substrate, an effective pixel formation region and a reference pattern formation region. A pixel pattern for forming a pixel component that constitutes a pixel is arranged in the effective pixel formation region. A reference pattern for indicating a reference position where pixel pattern should be arranged in the effective pixel formation region is arranged in the reference pattern formation region. Pixel pattern is arranged to be displaced from the reference position toward a center side of the effective pixel formation region.

Abstract translation: 掩模包括衬底，有效像素形成区域和参考图案形成区域。 用于形成构成像素的像素分量的像素图案被布置在有效像素形成区域中。 用于指示在有效像素形成区域中应该排列像素图案的参考位置的参考图案被布置在参考图案形成区域中。 像素图案被布置为从参考位置向有效像素形成区域的中心侧移位。

公开(公告)号：US20180053807A1

公开(公告)日：2018-02-22

申请号：US15797547

申请日：2017-10-30

Applicant: Renesas Electronics Corporation

Inventor： Hiroyuki MOMONO

IPC: H01L27/146 ,  G06F17/50 ,  H01L21/66

CPC classification number: H01L22/30 ,  G06F17/5072 ,  G06F2217/12 ,  H01L22/20 ,  H01L27/14603 ,  H01L27/14605 ,  H01L27/14623 ,  H01L27/14643 ,  H01L27/14683 ,  H01L27/14685 ,  Y10T428/24802

Abstract: A mask includes a substrate, an effective pixel formation region and a reference pattern formation region. A pixel pattern for forming a pixel component that constitutes a pixel is arranged in the effective pixel formation region. A reference pattern for indicating a reference position where pixel pattern should be arranged in the effective pixel formation region is arranged in the reference pattern formation region. Pixel pattern is arranged to be displaced from the reference position toward a center side of the effective pixel formation region.

公开(公告)号：US20160188787A1

公开(公告)日：2016-06-30

申请号：US15064387

申请日：2016-03-08

Applicant: RENESAS ELECTRONICS CORPORATION

Inventor： Hiroyuki MOMONO ,  Nobuo TSUBOI

IPC: G06F17/50 ,  H01L27/146

CPC classification number: G06F17/5081 ,  G06F17/5072 ,  H01L27/14621 ,  H01L27/14623 ,  H01L27/14645

Abstract: A solid-state imaging device includes pixels respectively having photoelectric conversion units and arranged in matrix in basic pattern units, and an optical member arranged on the incidence side of incident light than the pixels and having constituent elements respectively corresponding to the pixels. The pixels include first, second and third wavelength range light pixels. Each basic pattern is comprised of a combined arrangement pattern of the wavelength range light pixels. Misregistration constituent elements with the occurrence of misregistration exist in the constituent elements. The misregistration increases toward the misregistration constituent elements separated from a center position of a pixel array of the pixels. The misregistration of the misregistration constituent element for the first wavelength range light pixel and that of the misregistration constituent element for the third wavelength range light pixel are smaller and larger than that of the misregistration constituent element for the second wavelength range light pixel, respectively.

公开(公告)号：US20150235912A1

公开(公告)日：2015-08-20

申请号：US14702878

申请日：2015-05-04

Applicant: Renesas Electronics Corporation

Inventor： Hiroyuki MOMONO

IPC: H01L21/66 ,  H01L27/146

CPC classification number: H01L27/14685 ,  G06F17/5072 ,  G06F2217/12 ,  H01L22/20 ,  H01L22/30 ,  H01L27/14603 ,  H01L27/14605 ,  H01L27/14623 ,  H01L27/14643 ,  H01L27/14683 ,  Y10T428/24802

Abstract: A mask includes a substrate, an effective pixel formation region and a reference pattern formation region. A pixel pattern for forming a pixel component that constitutes a pixel is arranged in the effective pixel formation region. A reference pattern for indicating a reference position where pixel pattern should be arranged in the effective pixel formation region is arranged in the reference pattern formation region. Pixel pattern is arranged to be displaced from the reference position toward a center side of the effective pixel formation region.

Abstract translation: 掩模包括衬底，有效像素形成区域和参考图案形成区域。 用于形成构成像素的像素分量的像素图案被布置在有效像素形成区域中。 用于指示在有效像素形成区域中应该排列像素图案的参考位置的参考图案被布置在参考图案形成区域中。 像素图案被布置为从参考位置向有效像素形成区域的中心侧移位。

公开(公告)号：US20150123229A1

公开(公告)日：2015-05-07

申请号：US14529061

申请日：2014-10-30

Applicant: RENESAS ELECTRONICS CORPORATION

Inventor： Hiroyuki MOMONO ,  Nobuo TSUBOI

IPC: H01L27/146 ,  G06F17/50

CPC classification number: G06F17/5081 ,  G06F17/5072 ,  H01L27/14621 ,  H01L27/14623 ,  H01L27/14645

Abstract: A solid-state imaging device includes pixels respectively having photoelectric conversion units and arranged in matrix in basic pattern units, and an optical member arranged on the incidence side of incident light than the pixels and having constituent elements respectively corresponding to the pixels. The pixels include first, second and third wavelength range light pixels. Each basic pattern is comprised of a combined arrangement pattern of the wavelength range light pixels. Misregistration constituent elements with the occurrence of misregistration exist in the constituent elements. The misregistration increases toward the misregistration constituent elements separated from a center position of a pixel array of the pixels. The misregistration of the misregistration constituent element for the first wavelength range light pixel and that of the misregistration constituent element for the third wavelength range light pixel are smaller and larger than that of the misregistration constituent element for the second wavelength range light pixel, respectively.

Abstract translation: 固态成像装置包括分别具有光电转换单元并以基本图案单位矩阵排列的像素，以及配置在入射光的入射侧的光学部件，并且具有分别对应于像素的构成元件。 像素包括第一，第二和第三波长范围的光像素。 每个基本图案由波长范围的光像素的组合布置图案组成。 在组成要素中存在配对错误发生的注册组成要素。 不对准性增加到与像素的像素阵列的中心位置分离的对准构件。 针对第一波长范围的光像素和第三波长范围的光像素的不对准构成元件的重合配置元件的对准分别比分别用于第二波长范围的光像素的不对准构成元件的对准分配要小。