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公开(公告)号:US20130211118A1
公开(公告)日:2013-08-15
申请号:US13586751
申请日:2012-08-15
申请人: Ravindra S. Dixit , Hua Bai , Curtis D. Modtland , Robert A. Ware , John G. Pendergast, JR. , Christopher P. Christenson , Deodatta Vinayak Shenai-Khatkhate , Artashes Amamchyan , Kenneth M. Crouch , Robert F. Polcari
发明人: Ravindra S. Dixit , Hua Bai , Curtis D. Modtland , Robert A. Ware , John G. Pendergast, JR. , Christopher P. Christenson , Deodatta Vinayak Shenai-Khatkhate , Artashes Amamchyan , Kenneth M. Crouch , Robert F. Polcari
CPC分类号: B01J19/2405 , B01J2219/00051 , B01J2219/24 , C07B61/00 , C07F5/00 , C07F5/003 , C07F7/003
摘要: A method of continuously manufacturing organometallic compounds is provided where two or more reactants are conveyed to a reactor having a laminar flow contacting zone, a heat transfer zone, and a mixing zone having a turbulence-promoting device; and causing the reactants to form the organometallic compound.
摘要翻译: 提供连续制造有机金属化合物的方法,其中将两种或更多种反应物输送到具有层流接触区,传热区和具有湍流促进装置的混合区的反应器; 并使反应物形成有机金属化合物。
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公开(公告)号:US09006475B2
公开(公告)日:2015-04-14
申请号:US13586751
申请日:2012-08-15
申请人: Ravindra S. Dixit , Hua Bai , Curtis D. Modtland , Robert A. Ware , John G. Pendergast, Jr. , Christopher P. Christenson , Deodatta Vinayak Shenai-Khatkhate , Artashes Amamchyan , Kenneth M. Crouch , Robert F. Polcari
发明人: Ravindra S. Dixit , Hua Bai , Curtis D. Modtland , Robert A. Ware , John G. Pendergast, Jr. , Christopher P. Christenson , Deodatta Vinayak Shenai-Khatkhate , Artashes Amamchyan , Kenneth M. Crouch , Robert F. Polcari
CPC分类号: B01J19/2405 , B01J2219/00051 , B01J2219/24 , C07B61/00 , C07F5/00 , C07F5/003 , C07F7/003
摘要: A method of continuously manufacturing organometallic compounds is provided where two or more reactants are conveyed to a reactor having a laminar flow contacting zone, a heat transfer zone, and a mixing zone having a turbulence-promoting device; and causing the reactants to form the organometallic compound.
摘要翻译: 提供连续制造有机金属化合物的方法,其中将两种或更多种反应物输送到具有层流接触区,传热区和具有湍流促进装置的混合区的反应器; 并使反应物形成有机金属化合物。
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公开(公告)号:US06956127B2
公开(公告)日:2005-10-18
申请号:US10346275
申请日:2003-01-17
申请人: Deodatta Vinayak Shenai-Khatkhate , Michael Brendan Power , Artashes Amamchyan , Ronald L. DiCarlo, Jr.
发明人: Deodatta Vinayak Shenai-Khatkhate , Michael Brendan Power , Artashes Amamchyan , Ronald L. DiCarlo, Jr.
CPC分类号: C07F9/72 , C07F9/5068 , C07F9/52 , C23C16/301
摘要: Disclosed are methods of preparing monoalkyl Group VA metal dihalide compounds in high yield and high purity by the reaction of a Group VA metal trihalide with an organo lithium reagent or a compound of the formula RnM1X3−n, where R is an alkyl, M1 is a Group IIIA metal, X is a halogen and n is an integer fro 1 to 3. Such monoalkyl Group VA metal dihalide compounds are substantially free of oxygenated impurities, ethereal solvents and metallic impurities. Monoalkyl Group VA metal dihydride compounds can be easily produced in high yield and high purity by reducing such monoalkyl Group VA metal dihalide compounds.
摘要翻译: 公开了通过VA族金属三卤化物与有机锂试剂或式R a的化合物的反应制备高产率和高纯度的单烷基基团VA金属二卤化物化合物的方法, 1 X 3-n N,其中R是烷基,M 1是IIIA族金属,X是卤素,n是1至 这样的单烷基VA族金属二卤化物基本上不含氧杂质,醚类溶剂和金属杂质。 通过还原这种单烷基VA族金属二卤化物化合物,可以容易地以高产率和高纯度制备单烷基基团VA金属二氢化合物。
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公开(公告)号:US06939983B2
公开(公告)日:2005-09-06
申请号:US10841127
申请日:2004-05-07
申请人: Deodatta Vinayak Shenai-Khatkhate , Artashes Amamchyan , Michael Brendan Power , Ronald L. DiCarol, Jr. , James Edward Felton
发明人: Deodatta Vinayak Shenai-Khatkhate , Artashes Amamchyan , Michael Brendan Power , Ronald L. DiCarol, Jr. , James Edward Felton
CPC分类号: C07F9/94 , C07F9/5068 , C07F9/70 , C07F9/90
摘要: A method of preparing Group VA organometal compounds in high yield and high purity by the reaction of a Grignard reagent with a Group VA metal halide in certain ethereal solvents is provided. A method of preparing Group VA organometal hydrides is also provided.
摘要翻译: 提供了通过Grignard试剂与VA族金属卤化物在某些醚类溶剂中反应制备高收率和高纯度的VA族有机金属化合物的方法。 还提供了一种制备VA族有机金属氢化物的方法。
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公开(公告)号:US07166734B2
公开(公告)日:2007-01-23
申请号:US11219227
申请日:2005-09-02
IPC分类号: C07F5/06
摘要: Organometallic compounds of Group IIB and IIIA metals that are substantially pure and contain low levels of oxygenated impurities are provided. Also provided are methods of preparing such organometallic compounds.
摘要翻译: 提供基本上纯且含有低含量氧化杂质的IIB族和IIIA族金属的有机金属化合物。 还提供了制备这种有机金属化合物的方法。
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公开(公告)号:US08101048B2
公开(公告)日:2012-01-24
申请号:US12215827
申请日:2008-06-30
申请人: Francis Joseph Lipiecki , Stephen G Maroldo , Deodatta Vinayak Shenai-Khatkhate , Robert A. Ware
发明人: Francis Joseph Lipiecki , Stephen G Maroldo , Deodatta Vinayak Shenai-Khatkhate , Robert A. Ware
IPC分类号: B01D3/00
摘要: This invention relates to methods of removing impurities from compounds having similar volatilities to form ultra high purity compounds.
摘要翻译: 本发明涉及从具有相似挥发性的化合物中除去杂质以形成超高纯度化合物的方法。
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公开(公告)号:US07919638B2
公开(公告)日:2011-04-05
申请号:US12701518
申请日:2010-02-05
申请人: Francis Joseph Lipiecki , Stephen G. Maroldo , Deodatta Vinayak Shenai-Khatkhate , Robert A. Ware
发明人: Francis Joseph Lipiecki , Stephen G. Maroldo , Deodatta Vinayak Shenai-Khatkhate , Robert A. Ware
CPC分类号: B01D3/14 , B33Y70/00 , B33Y80/00 , C07B63/00 , C07F5/00 , C07F5/061 , C07F5/062 , C07F5/069 , C07F7/00 , C07F7/28 , C07F7/30 , C07F15/0046 , C23C16/00 , C23C16/18 , C23C16/4402 , Y02P20/542
摘要: A method of preparing an ultra-pure metal amidinate compound comprising using a microchannel device for synthesis in reacting a metal halide solution with a lithium amidinate solution to produce an ultra-pure alkylmetal compound for processes such as chemical vapor deposition.
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公开(公告)号:US20100185003A1
公开(公告)日:2010-07-22
申请号:US12701518
申请日:2010-02-05
申请人: Francis Joseph Lipiecki , Stephen G. Maroldo , Deodatta Vinayak Shenai-Khatkhate , Robert A. Ware
发明人: Francis Joseph Lipiecki , Stephen G. Maroldo , Deodatta Vinayak Shenai-Khatkhate , Robert A. Ware
CPC分类号: B01D3/14 , B33Y70/00 , B33Y80/00 , C07B63/00 , C07F5/00 , C07F5/061 , C07F5/062 , C07F5/069 , C07F7/00 , C07F7/28 , C07F7/30 , C07F15/0046 , C23C16/00 , C23C16/18 , C23C16/4402 , Y02P20/542
摘要: A method of preparing an ultra-pure metal amidinate compound comprising using a microchannel device for synthesis in reacting a metal halide solution with a lithium amidinate solution to produce an ultra-pure alkylmetal compound for processes such as chemical vapor deposition.
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公开(公告)号:US07939684B2
公开(公告)日:2011-05-10
申请号:US12701517
申请日:2010-02-05
申请人: Francis Joseph Lipiecki , Stephen G. Maroldo , Deodatta Vinayak Shenai-Khatkhate , Robert A. Ware
发明人: Francis Joseph Lipiecki , Stephen G. Maroldo , Deodatta Vinayak Shenai-Khatkhate , Robert A. Ware
CPC分类号: B01D3/14 , B33Y70/00 , B33Y80/00 , C07B63/00 , C07F5/00 , C07F5/061 , C07F5/062 , C07F5/069 , C07F7/00 , C07F7/28 , C07F7/30 , C07F15/0046 , C23C16/00 , C23C16/18 , C23C16/4402 , Y02P20/542
摘要: A method of preparing an ultra-pure metal amidinate compound comprising using a microchannel device for synthesis in reacting a metal halide solution with a lithium amidinate solution to produce an ultra-pure alkylmetal compound for processes such as chemical vapor deposition.
摘要翻译: 一种制备超纯金属脒化合物的方法,包括使金属卤化物溶液与脒基胺溶液反应合成的微通道装置,以制备用于化学气相沉积等工艺的超纯烷基金属化合物。
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公开(公告)号:US08101787B2
公开(公告)日:2012-01-24
申请号:US12701513
申请日:2010-02-05
申请人: Francis Joseph Lipiecki , Stephen G. Maroldo , Deodatta Vinayak Shenai-Khatkhate , Robert A. Ware
发明人: Francis Joseph Lipiecki , Stephen G. Maroldo , Deodatta Vinayak Shenai-Khatkhate , Robert A. Ware
CPC分类号: B01D3/14 , B33Y70/00 , B33Y80/00 , C07B63/00 , C07F5/00 , C07F5/061 , C07F5/062 , C07F5/069 , C07F7/00 , C07F7/28 , C07F7/30 , C07F15/0046 , C23C16/00 , C23C16/18 , C23C16/4402 , Y02P20/542
摘要: A method of preparing an ultra-pure organometallic compound comprising using a microchannel device and ionic liquid solvent to produce an ultra-pure alkylmetal compound for processes such as chemical vapor deposition.
摘要翻译: 一种制备超纯有机金属化合物的方法,包括使用微通道装置和离子液体溶剂以制备用于诸如化学气相沉积的方法的超纯烷基金属化合物。
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