公开(公告)号：US07268966B2

公开(公告)日：2007-09-11

申请号：US10957012

申请日：2004-09-30

申请人： Remmelt Pit ,  C. Singh Bhatia

发明人： Remmelt Pit ,  C. Singh Bhatia

IPC分类号： G11B21/02 ,  G11B27/36 ,  G11B33/14

CPC分类号： G11B5/6005 ,  G11B5/5534 ,  G11B5/6029 ,  G11B5/6064 ,  G11B5/607 ,  Y10T29/49036

摘要： A method for adjusting fly heights for a plurality of heads of a hard disk drive is disclosed. The method includes measuring respective magnetic and mechanical performance for the plurality of heads and varying the density of an environment within the hard disk drive. This variation of the environment is such that the respective fly heights of the plurality of heads are adjusted to achieve a preferred distribution with respect to an ideal fly height.

摘要翻译： 公开了一种用于调整硬盘驱动器的多个磁头的飞行高度的方法。 该方法包括测量多个磁头的各自的磁性和机械性能并改变硬盘驱动器内的环境的密度。 环境的这种变化使得多个头部的相应飞行高度被调节以实现相对于理想飞行高度的优选分布。

公开(公告)号：US5838522A

公开(公告)日：1998-11-17

申请号：US794672

申请日：1997-02-03

申请人： Kyriakos Komvopoulos ,  Ian G. Brown ,  Bo Wei ,  Simone Anders ,  Andre Anders ,  C. Singh Bhatia

发明人： Kyriakos Komvopoulos ,  Ian G. Brown ,  Bo Wei ,  Simone Anders ,  Andre Anders ,  C. Singh Bhatia

IPC分类号： C04B41/00 ,  C04B41/80 ,  C23C14/32 ,  C23C14/48 ,  G11B5/10 ,  G11B5/187 ,  G11B5/255 ,  G11B5/40 ,  G11B5/60 ,  G11B33/10

CPC分类号： C04B41/009 ,  C04B41/0027 ,  C04B41/0054 ,  C04B41/80 ,  C23C14/325 ,  C23C14/48 ,  G11B33/10 ,  G11B5/10 ,  G11B5/187 ,  G11B5/255 ,  G11B5/40 ,  G11B5/6005

摘要： Surface modification of magnetic recording heads using plasma immersion ion implantation and deposition is disclosed. This method may be carried out using a vacuum arc deposition system with a metallic or carbon cathode. By operating a plasma gun in a long-pulse mode and biasing the substrate holder with short pulses of a high negative voltage, direct ion implantation, recoil implantation, and surface deposition are combined to modify the near-surface regions of the head or substrate in processing times which may be less than 5 min. The modified regions are atomically mixed into the substrate. This surface modification improves the surface smoothness and hardness and enhances the tribological characteristics under conditions of contact-start-stop and continuous sliding. These results are obtained while maintaining original tolerances.

公开(公告)号：US5851475A

公开(公告)日：1998-12-22

申请号：US667502

申请日：1996-06-21

申请人： Kyriakos Komvopoulos ,  Ian G. Brown ,  Bo Wei ,  Simone Anders ,  Andre Anders ,  C. Singh Bhatia

发明人： Kyriakos Komvopoulos ,  Ian G. Brown ,  Bo Wei ,  Simone Anders ,  Andre Anders ,  C. Singh Bhatia

IPC分类号： C04B41/00 ,  C04B41/80 ,  C23C14/32 ,  C23C14/48 ,  G11B5/10 ,  G11B5/187 ,  G11B5/255 ,  G11B5/40 ,  G11B5/60 ,  G11B33/10 ,  B29C71/00

CPC分类号： C04B41/009 ,  C04B41/0027 ,  C04B41/80 ,  C23C14/325 ,  C23C14/48 ,  G11B33/10 ,  G11B5/10 ,  G11B5/187 ,  G11B5/255 ,  G11B5/40 ,  G11B5/6005

摘要： A process for producing an article with improved ceramic surface properties including providing an article having a ceramic surface, and placing the article onto a conductive substrate holder in a hermetic enclosure. Thereafter a low pressure ambient is provided in the hermetic enclosure. A plasma including ions of solid materials is produced the ceramic surface of the article being at least partially immersed in a macroparticle free region of the plasma. While the article is immersed in the macroparticle free region, a bias of the substrate holder is biased between a low voltage at which material from the plasma condenses on the surface of the article and a high negative voltage at which ions from the plasma are implanted into the article.

摘要翻译： 一种用于生产具有改进的陶瓷表面性质的制品的方法，包括提供具有陶瓷表面的制品，以及将制品放置在密封外壳中的导电衬底保持器上。 此后，在密封外壳中设置低压环境。 产生包括固体材料离子的等离子体，该制品的陶瓷表面至少部分地浸没在等离子体的无大颗粒区域中。 当制品浸没在无大颗粒区域中时，衬底保持器的偏压被偏压在来自等离子体物质在物体表面上凝结的低电压和来自等离子体的离子注入到高负电压的低电压之间 文章。