公开(公告)号：US20060114436A1

公开(公告)日：2006-06-01

申请号：US10998179

申请日：2004-11-29

申请人： Rene Oesterholt ,  Ralph Brinkhof ,  Tjarko Van Empel ,  Leon Levasier ,  Joost Ottens ,  Koen Jacobus Zaal ,  Koenraad Stephan Salden

发明人： Rene Oesterholt ,  Ralph Brinkhof ,  Tjarko Van Empel ,  Leon Levasier ,  Joost Ottens ,  Koen Jacobus Zaal ,  Koenraad Stephan Salden

IPC分类号： G03B27/52

CPC分类号： G03F7/70783 ,  G03F7/707

摘要： The invention relates to a lithographic system that includes an illumination system for providing a projection beam of radiation, a mask table for supporting a mask, the mask serving to impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. The system also comprises a processor arranged to calculate overlay corrections using a reference height map representing a surface of the substrate table or the mask table. The invention allows feed forward correction of non-flatness induced wafer grid distortion during alignment and during exposure, thereby reducing overlay errors caused by differences in flatness characteristics. It provides an indirect qualification method for overlay accuracy related to exposure chuck flatness based on height map information.

摘要翻译： 本发明涉及一种光刻系统，其包括用于提供投影辐射束的照明系统，用于支撑掩模的掩模台，用于使投影光束在其横截面上具有图案的掩模，用于保持 基板和用于将图案化的光束投影到基板的目标部分上的投影系统。 该系统还包括处理器，其被布置为使用表示衬底台或掩模台的表面的参考高度图计算覆盖校正。 本发明允许在对准和曝光期间非平坦度引起的晶片格栅失真的前馈校正，从而减少由平坦度特性的差异引起的重叠误差。 它提供了基于高度图信息的与曝光卡盘平坦度相关的覆盖精度的间接鉴定方法。