Calibration method and lithographic apparatus for calibrating an optimum take over height of a substrate
    1.
    发明授权
    Calibration method and lithographic apparatus for calibrating an optimum take over height of a substrate 有权
    校准方法和光刻设备,用于校准基板的最佳接管高度

    公开(公告)号:US08384882B2

    公开(公告)日:2013-02-26

    申请号:US12580066

    申请日:2009-10-15

    IPC分类号: G03B27/32 G03B27/58

    摘要: A calibration method for calibrating an optimum take over height of a substrate in a lithographic apparatus between a substrate table and an ejector element moveable to load and unload the substrate from the substrate table, the method including clamping the substrate on one of the substrate table and ejector element; moving the ejector element between an unloaded state wherein the substrate is supported by the substrate table and a loaded state wherein the substrate is at least partly supported by the ejector element; determining a reference height of the ejector element at the moment that the weight of the substrate is at least partly taken over between the substrate table and the ejector element; and determining the optimum take over height for the ejector element from the determined reference height.

    摘要翻译: 一种校准方法,用于校准光刻设备中的基板的最佳接管高度,该基板在基板台和顶板元件之间移动,可移动以从基板台装载和卸载基板,该方法包括将基板夹在基板台之一和 喷射元件 在所述衬底被所述衬底台支撑的卸载状态和所述衬底至少部分地被所述顶出器元件支撑的负载状态之间移动所述顶出器元件; 在衬底的重量至少部分地覆盖在衬底台和顶出器元件之间的时刻,确定顶出器元件的基准高度; 以及从所确定的参考高度确定所述喷射器元件的最佳接管高度。

    CALIBRATION METHOD AND LITHOGRAPHIC APPARATUS FOR CALIBRATING AN OPTIMUM TAKE OVER HEIGHT OF A SUBSTRATE
    2.
    发明申请
    CALIBRATION METHOD AND LITHOGRAPHIC APPARATUS FOR CALIBRATING AN OPTIMUM TAKE OVER HEIGHT OF A SUBSTRATE 有权
    用于校准基板高度最佳采样的校准方法和平面设备

    公开(公告)号:US20100110408A1

    公开(公告)日:2010-05-06

    申请号:US12580066

    申请日:2009-10-15

    IPC分类号: G03B27/58

    摘要: A calibration method for calibrating an optimum take over height of a substrate in a lithographic apparatus between a substrate table and an ejector element moveable to load and unload the substrate from the substrate table, the method including clamping the substrate on one of the substrate table and ejector element; moving the ejector element between an unloaded state wherein the substrate is supported by the substrate table and a loaded state wherein the substrate is at least partly supported by the ejector element; determining a reference height of the ejector element at me moment that me weight of me substrate is at least partly taken over between the substrate table and the ejector element; and determining the optimum take over height for the ejector element from the determined reference height.

    摘要翻译: 一种校准方法,用于校准光刻设备中的基板的最佳接管高度,该基板在基板台和顶板元件之间移动,可移动以从基板台装载和卸载基板,该方法包括将基板夹在基板台之一和 喷射元件 在所述衬底被所述衬底台支撑的卸载状态和所述衬底至少部分地被所述顶出器元件支撑的负载状态之间移动所述顶出器元件; 在我的时刻确定喷射器元件的基准高度,使得我的底板重量至少部分地被覆在衬底台和喷射器元件之间; 以及从所确定的参考高度确定所述喷射器元件的最佳接管高度。