Large field of view 2X magnification projection optical system for FPD manufacture
    1.
    发明授权
    Large field of view 2X magnification projection optical system for FPD manufacture 有权
    大视野2倍放大投影光学系统用于FPD制造

    公开(公告)号:US07405802B2

    公开(公告)日:2008-07-29

    申请号:US10921097

    申请日:2004-08-19

    IPC分类号: G03B27/42 G03B27/52 G03B27/68

    摘要: An exposure system for manufacturing flat panel displays (FPDs) includes a reticle stage and a substrate stage. A magnification reflective optical system images the reticle onto the substrate. The system may be a 2× magnification system, or another magnification that is compatible with currently available mask sizes. By writing reticles with circuit pattern dimensions that are one-half the desired size for an FPD, a 2× optical system can be used to expose FPDs. The designs for the 1.5× and larger magnification optical systems all typically have at least three powered mirrors. A corrector, positioned either near the reticle or near the substrate, can be added to the three mirror design to improve the systems optical performance. The corrector may be a reflective, or a refractive design. The corrector can have an aspheric surface, and optionally a powered surface.

    摘要翻译: 用于制造平板显示器(FPD)的曝光系统包括光罩台和基板台。 放大反射光学系统将掩模版图像到基板上。 该系统可以是2x放大系统,或与当前可用的掩模尺寸兼容的另一倍率。 通过写入具有FPD所需尺寸的一半的电路图形尺寸的光罩,可以使用2x光学系统来曝光FPD。 用于1.5倍和更大倍率的光学系统的设计通常至少有三个电动镜。 位于掩模版附近或基板附近的校正器可以被添加到三反射镜设计中以改善系统的光学性能。 校正器可以是反射或折射设计。 校正器可以具有非球面表面,并且可选地具有动力表面。

    Large field of view protection optical system with aberration correctability for flat panel displays
    2.
    发明授权
    Large field of view protection optical system with aberration correctability for flat panel displays 有权
    用于平板显示器的大视场保护光学系统具有像差校正能力

    公开(公告)号:US07158215B2

    公开(公告)日:2007-01-02

    申请号:US10831210

    申请日:2004-04-26

    摘要: An exposure system for manufacturing flat panel displays (FPDs) includes a reticle stage adapted to support a reticle. A substrate stage is adapted to support a substrate. A reflective optical system is adapted adapted to image the reticle onto the substrate. The reflective optical system includes a primary mirror including a first mirror and a second mirror, and a secondary mirror. The reflective optical system has sufficient degrees of freedom for both alignment and correction of third order aberrations when projecting an image of the reticle onto the substrate by reflections off the first mirror, the secondary mirror, and the second mirror.

    摘要翻译: 用于制造平板显示器(FPD)的曝光系统包括适于支撑掩模版的掩模版台。 衬底台适于支撑衬底。 反射光学系统适于将掩模版成像到基底上。 反射光学系统包括主镜,包括第一镜和第二镜以及次镜。 当通过第一反射镜,次反射镜和第二反射镜的反射将掩模版的图像投影到基板上时,反射光学系统具有足够的自由度用于三阶像差的对准和校正。

    Large field of view 2X magnification projection optical system for FPD manufacture
    3.
    发明申请
    Large field of view 2X magnification projection optical system for FPD manufacture 有权
    大视野2倍放大投影光学系统用于FPD制造

    公开(公告)号:US20050237505A1

    公开(公告)日:2005-10-27

    申请号:US10921097

    申请日:2004-08-19

    摘要: An exposure system for manufacturing flat panel displays (FPDs) includes a reticle stage and a substrate stage. A magnification ringfield reflective optical system images the reticle onto the substrate. The system may be a 2× magnification system, or another magnification that is compatible with currently available mask sizes. By writing reticles with circuit pattern dimensions that are one-half the desired size for an FPD, a 2× optical system can be used to expose FPDs. The designs for the 1.5× and larger magnification optical systems all typically have at least three powered mirrors. A corrector, positioned either near the reticle or near the substrate, can be added to the three mirror design to improve the systems optical performance. The corrector may be a reflective, or a refractive design. The corrector can have an aspheric surface, and optionally a powered surface. The corrector may be a flat glass plate, or a lens having concave-convex, concave-concave or convex-convex surfaces.

    摘要翻译: 用于制造平板显示器(FPD)的曝光系统包括光罩台和基板台。 放大倍数环形反射光学系统将掩模版图像到基板上。 该系统可以是2x放大系统,或与当前可用的掩模尺寸兼容的另一倍率。 通过写入具有FPD所需尺寸的一半的电路图形尺寸的光罩,可以使用2x光学系统来曝光FPD。 用于1.5倍和更大倍率的光学系统的设计通常至少有三个电动镜。 位于掩模版附近或基板附近的校正器可以被添加到三反射镜设计中以改善系统的光学性能。 校正器可以是反射或折射设计。 校正器可以具有非球面表面,并且可选地具有动力表面。 校正器可以是平板玻璃板或具有凹凸,凹入或凸凸表面的透镜。