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    Large field of view 2X magnification projection optical system for FPD manufacture
    1.
    发明申请
    Large field of view 2X magnification projection optical system for FPD manufacture 有权
    大视野2倍放大投影光学系统用于FPD制造

    公开(公告)号：US20050237505A1

    公开(公告)日：2005-10-27

    申请号：US10921097

    申请日：2004-08-19

    申请人： Robert Harned ,  Lev Sakin ,  Patrick de Jager ,  Cheng-Qun Gui ,  Irina Pozhinskaya ,  Noreen Harned

    发明人： Robert Harned ,  Lev Sakin ,  Patrick de Jager ,  Cheng-Qun Gui ,  Irina Pozhinskaya ,  Noreen Harned

    IPC分类号： G02B17/00 ,  G02B17/06 ,  G03B27/52 ,  G03F7/20 ,  G09F9/00 ,  H01L21/027

    CPC分类号： G03B27/52 ,  G02B17/061 ,  G03F7/70233 ,  G03F7/70308 ,  G03F7/706 ,  G03F7/70791

    摘要： An exposure system for manufacturing flat panel displays (FPDs) includes a reticle stage and a substrate stage. A magnification ringfield reflective optical system images the reticle onto the substrate. The system may be a 2× magnification system, or another magnification that is compatible with currently available mask sizes. By writing reticles with circuit pattern dimensions that are one-half the desired size for an FPD, a 2× optical system can be used to expose FPDs. The designs for the 1.5× and larger magnification optical systems all typically have at least three powered mirrors. A corrector, positioned either near the reticle or near the substrate, can be added to the three mirror design to improve the systems optical performance. The corrector may be a reflective, or a refractive design. The corrector can have an aspheric surface, and optionally a powered surface. The corrector may be a flat glass plate, or a lens having concave-convex, concave-concave or convex-convex surfaces.

    摘要翻译： 用于制造平板显示器（FPD）的曝光系统包括光罩台和基板台。 放大倍数环形反射光学系统将掩模版图像到基板上。 该系统可以是2x放大系统，或与当前可用的掩模尺寸兼容的另一倍率。 通过写入具有FPD所需尺寸的一半的电路图形尺寸的光罩，可以使用2x光学系统来曝光FPD。 用于1.5倍和更大倍率的光学系统的设计通常至少有三个电动镜。 位于掩模版附近或基板附近的校正器可以被添加到三反射镜设计中以改善系统的光学性能。 校正器可以是反射或折射设计。 校正器可以具有非球面表面，并且可选地具有动力表面。 校正器可以是平板玻璃板或具有凹凸，凹入或凸凸表面的透镜。

    Large field of view 2X magnification projection optical system for FPD manufacture
    2.
    发明授权
    Large field of view 2X magnification projection optical system for FPD manufacture 有权
    大视野2倍放大投影光学系统用于FPD制造

    公开(公告)号：US07405802B2

    公开(公告)日：2008-07-29

    申请号：US10921097

    申请日：2004-08-19

    申请人： Robert D. Harned ,  Lev Sakin ,  Patrick de Jager ,  Cheng-Qun Gui ,  Irina Pozhinskaya ,  Noreen Harned

    发明人： Robert D. Harned ,  Lev Sakin ,  Patrick de Jager ,  Cheng-Qun Gui ,  Irina Pozhinskaya ,  Noreen Harned

    IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/68

    CPC分类号： G03B27/52 ,  G02B17/061 ,  G03F7/70233 ,  G03F7/70308 ,  G03F7/706 ,  G03F7/70791

    摘要： An exposure system for manufacturing flat panel displays (FPDs) includes a reticle stage and a substrate stage. A magnification reflective optical system images the reticle onto the substrate. The system may be a 2× magnification system, or another magnification that is compatible with currently available mask sizes. By writing reticles with circuit pattern dimensions that are one-half the desired size for an FPD, a 2× optical system can be used to expose FPDs. The designs for the 1.5× and larger magnification optical systems all typically have at least three powered mirrors. A corrector, positioned either near the reticle or near the substrate, can be added to the three mirror design to improve the systems optical performance. The corrector may be a reflective, or a refractive design. The corrector can have an aspheric surface, and optionally a powered surface.

    摘要翻译： 用于制造平板显示器（FPD）的曝光系统包括光罩台和基板台。 放大反射光学系统将掩模版图像到基板上。 该系统可以是2x放大系统，或与当前可用的掩模尺寸兼容的另一倍率。 通过写入具有FPD所需尺寸的一半的电路图形尺寸的光罩，可以使用2x光学系统来曝光FPD。 用于1.5倍和更大倍率的光学系统的设计通常至少有三个电动镜。 位于掩模版附近或基板附近的校正器可以被添加到三反射镜设计中以改善系统的光学性能。 校正器可以是反射或折射设计。 校正器可以具有非球面表面，并且可选地具有动力表面。

    System and method utilizing a lithography tool having modular illumination, pattern generator, and projection optics portions
    3.
    发明申请
    System and method utilizing a lithography tool having modular illumination, pattern generator, and projection optics portions 有权
    利用具有模块化照明，图案发生器和投影光学部件的光刻工具的系统和方法

    公开(公告)号：US20050264782A1

    公开(公告)日：2005-12-01

    申请号：US10853558

    申请日：2004-05-26

    申请人： Lev Ryzhikov ,  Yuli Vladimirsky ,  Lev Sakin

    发明人： Lev Ryzhikov ,  Yuli Vladimirsky ,  Lev Sakin

    IPC分类号： G03F7/20 ,  G03B27/52 ,  H01L21/027

    CPC分类号： G03F7/70791 ,  G03F7/70275 ,  G03F7/70291

    摘要： A lithography system has a magnification module having multiple magnifications at a same time within an object plane, which can include a pattern generator therein. The pattern generator is used to pattern light from an illumination system, which is directed by a projection optical system onto a substrate to form features on a substrate. Having multiple magnifications in the object plate allows for patterning of both large and small features on an image plane, which can include the substrate therein. In one example, an array of pattern generators are used. In this example, substantially an entire surface of the substrate can be patterned with large and small features at substantially a same time.

    摘要翻译： 光刻系统具有在物平面内同时具有多个倍率的放大模块，其中可以包括图案发生器。 图案发生器用于将来自投影光学系统的照明系统的光图案化到衬底上以在衬底上形成特征。 在对象板中具有多个放大率允许在可以包括其中的基板的图像平面上图案化大和小特征。 在一个示例中，使用图案生成器的阵列。 在该示例中，基本上整个表面的基板可以在大致相同的时间以大的和小的特征图案化。

    Method, system, and computer program product for determining refractive index distribution
    4.
    发明授权
    Method, system, and computer program product for determining refractive index distribution 有权
    确定折射率分布的方法

    公开(公告)号：US06741362B2

    公开(公告)日：2004-05-25

    申请号：US10138714

    申请日：2002-05-06

    申请人： Stanislav Smirnov ,  Mark L. Oskotsky ,  Lev Sakin ,  John D. Martin

    发明人： Stanislav Smirnov ,  Mark L. Oskotsky ,  Lev Sakin ,  John D. Martin

    IPC分类号： G01N2141

    CPC分类号： G01N21/45

    摘要： The present invention provides a method and system for determining three-dimensional refractive gradient index distribution. The method and system of the present invention determine inhomogeneity data and calculate index of refraction changes in three-dimensions (3D). The method and system provide 3D modeling of an optical object or system that determines the three-dimensional distribution of the refractive index in the object. In one embodiment, the optical object is a blank. In different embodiments, the optical system is more than one blank. In alternative embodiments, the optical system can be a projection optics system that can include optical components such as lenses, filters, plates, and prisms. The present invention also provides a method for selecting a plurality of preferred optical elements to assemble a composite optical system with predetermined parameters.

    摘要翻译： 本发明提供一种用于确定三维折射梯度指数分布的方法和系统。 本发明的方法和系统确定不均匀性数据并计算三维（3D）中的折射变化指数。 该方法和系统提供了确定物体中折射率的三维分布的光学对象或系统的3D建模。 在一个实施例中，光学对象是空白的。 在不同的实施例中，光学系统是多于一个空白的。 在替代实施例中，光学系统可以是可以包括诸如透镜，滤光器，板和棱镜的光学部件的投影光学系统。 本发明还提供一种用于选择多个优选光学元件以组合具有预定参数的复合光学系统的方法。

    System and method utilizing a lithography tool having modular illumination, pattern generator, and projection optics portions
    5.
    发明授权
    System and method utilizing a lithography tool having modular illumination, pattern generator, and projection optics portions 有权
    利用具有模块化照明，图案发生器和投影光学部件的光刻工具的系统和方法

    公开(公告)号：US07242456B2

    公开(公告)日：2007-07-10

    申请号：US10853558

    申请日：2004-05-26

    申请人： Lev Ryzhikov ,  Yuli Vladimirsky ,  Lev Sakin

    发明人： Lev Ryzhikov ,  Yuli Vladimirsky ,  Lev Sakin

    IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/54

    CPC分类号： G03F7/70791 ,  G03F7/70275 ,  G03F7/70291

    摘要： A lithography system has a magnification module having multiple magnifications at a same time within an object plane, which can include a pattern generator therein. The pattern generator is used to pattern light from an illumination system, which is directed by a projection optical system onto a substrate to form features on a substrate. Having multiple magnifications in the object plate allows for patterning of both large and small features on an image plane, which can include the substrate therein. In one example, an array of pattern generators are used. In this example, substantially an entire surface of the substrate can be patterned with large and small features at substantially a same time.

    摘要翻译： 光刻系统具有在物平面内同时具有多个倍率的放大模块，其中可以包括图案发生器。 图案发生器用于将来自投影光学系统的照明系统的光图案化到衬底上以在衬底上形成特征。 在对象板中具有多个放大率允许在可以包括其中的基板的图像平面上图案化大和小特征。 在一个示例中，使用图案生成器的阵列。 在该示例中，基本上整个表面的基板可以在大致相同的时间以大的和小的特征图案化。