Process for the electrodeposition of palladium
    1.
    发明授权
    Process for the electrodeposition of palladium 失效
    电沉积钯的工艺

    公开(公告)号:US4401527A

    公开(公告)日:1983-08-30

    申请号:US294668

    申请日:1981-08-20

    IPC分类号: C25D3/50

    CPC分类号: C25D3/50

    摘要: A process for the electrodeposition of palladium in which palladium is electrodeposited from an aqueous plating bath which contains a bath soluble palladium compound, an electrolyte compound and a nitrite compound in an amount sufficient to provide an excess of free nitrite ions relative to the palladium ions. In a preferred embodiment, the bath also contains a buffering agent to maintain the bath pH at from about 6.5 to 7.5. The electrodeposition is carried out using an insoluble anode, while maintaining the excess of free nitrite ions in the bath relative to the palladium ions. In this manner, the plating efficiency of the bath is maintained at a substantially constant, high level for extended periods of plating at current densities in excess of 10 amps per square decimeter.

    摘要翻译: 钯的电沉积方法,其中钯从含有可溶性钯化合物,电解质化合物和亚硝酸盐化合物的水性电镀浴电沉积,其量足以相对于钯离子提供过量的游离亚硝酸根离子。 在优选的实施方案中,浴还含有缓冲剂,以将浴的pH值保持在约6.5至7.5。 使用不溶性阳极进行电沉积,同时相对于钯离子保持浴中过量的游离亚硝酸根离子。 以这种方式,在电流密度超过10安培/平方分米的情况下,电镀的电镀效率保持在基本恒定的高电平,持续延长的电镀时间。

    Bath and process for high speed nickel electroplating
    2.
    发明授权
    Bath and process for high speed nickel electroplating 失效
    用于高速镍电镀的浴缸和工艺

    公开(公告)号:US4411744A

    公开(公告)日:1983-10-25

    申请号:US407662

    申请日:1982-08-16

    IPC分类号: C25D3/12

    CPC分类号: C25D3/12

    摘要: Electroplating baths for producing semi-bright, ductile, low stressed nickel deposits in an electrodeposition process utilizing insoluble anodes are disclosed. The nickel baths contain, in addition to nickel salts, ortho-formyl benzene sulfonic acid and perfluorocyclohexyl potassium sulfonate.

    摘要翻译: 公开了在使用不溶性阳极的电沉积方法中生产半光亮,延性,低应力镍沉积物的电镀浴。 除了镍盐之外,镍浴还含有邻甲酰基苯磺酸和全氟环己基磺酸钾。

    High speed copper electroplating process and bath therefor
    3.
    发明授权
    High speed copper electroplating process and bath therefor 失效
    高速铜电镀工艺及浴缸

    公开(公告)号:US4555315A

    公开(公告)日:1985-11-26

    申请号:US614088

    申请日:1984-05-29

    IPC分类号: C25D3/38

    CPC分类号: C25D3/38

    摘要: An improved electrolyte composition and process for electrodepositing bright, level and ductile copper deposits on a substrate enabling use of conventional electroplating equipment for high-speed copper plating employing average cathode current densities substantially higher than heretofore feasible. The electrolyte contains an additive system comprising carefully controlled relative concentrations of:(a) a bath soluble polyether compound;(b) a bath soluble organic divalent sulfur compound;(c) a bath soluble adduct of a tertiary alkyl amine with epichlorohydrin; and(d) a bath soluble reaction product of polyethyleneimine and an alkylating agent.

    摘要翻译: 一种改进的电解质组合物和在基底上电沉积光亮,水平和延性铜沉积物的电解质组合物和方法,使得能够使用常规电镀设备进行高速镀铜,其平均阴极电流密度远高于迄今为止的可行。 电解质含有一种添加剂系统,其包括仔细控制的相对浓度:(a)浴溶性聚醚化合物; (b)溶于水的有机二价硫化合物; (c)叔烷基胺与表氯醇的浴溶性加合物; 和(d)聚乙烯亚胺和烷基化剂的浴溶性反应产物。

    Electrodeposition of bright copper
    4.
    发明授权
    Electrodeposition of bright copper 失效
    亮铜电沉积

    公开(公告)号:US4336114A

    公开(公告)日:1982-06-22

    申请号:US247577

    申请日:1981-03-26

    IPC分类号: C25D3/38

    CPC分类号: C25D3/38

    摘要: A composition and method for electrodepositing ductile, bright, level copper deposits from an aqueous acidic copper plating electrolyte particularly suited for plating electronic circuit boards containing a brightening and leveling amount of a brightening and leveling system comprising (a) a bath soluble substituted phthalocyanine radical, (b) a bath soluble adduct of a tertiary alkyl amine with polyepichlorohydrin, (c) a bath soluble organic divalent sulfur compound, and (d) a bath soluble reaction product of polyethyleneimine and an alkylating agent which will alkylate the nitrogen on the polyethyleneimine to produce a quaternary nitrogen. The electrolyte optionally also contains bath soluble polyether compounds as a supplemental brightening agent.

    摘要翻译: 特别适用于电镀电子电路板的含水酸性铜电镀电解质的电沉积延性,亮度高的铜沉积物的组合物和方法,该电镀电路板含有增亮和平整量的增白和流平系统,其包含(a)浴溶性取代酞菁基, (b)叔烷基胺与聚表氯醇的浴溶性加合物,(c)可溶溶的有机二价硫化合物,和(d)聚乙烯亚胺和烷基化剂的溶液反应产物,其将使聚乙烯亚胺上的氮烷基化成 产生季氮。 电解质任选地还含有溶于水的聚醚化合物作为补充增亮剂。

    Process and composition for the electrodeposition of tin and tin alloys
    6.
    发明授权
    Process and composition for the electrodeposition of tin and tin alloys 失效
    锡和锡合金电沉积的工艺和组成

    公开(公告)号:US4381228A

    公开(公告)日:1983-04-26

    申请号:US274084

    申请日:1981-06-16

    IPC分类号: C25D3/32 C25D3/60

    CPC分类号: C25D3/32

    摘要: An electroplating bath for the high speed deposition of bright metallic tin utilizing tin fluoroborate and sulfuric acid as the electrolyte; wherein, in addition to certain other additives, the bath contains a perfluoroalkyl sulfonate wetting agent to promote anode corrosion. Brighteners used in the system include aromatic amines and aliphatic aldehydes. For certain purposes it may be advantageous to include boric acid as part of the electrolyte; and, in other instances, to use an aromatic sulfonic acid to enhance bath stability and brightness. The method for utilizing a bath containing tin fluoroborate in a sulfuric acid matrix containing these perfluoroalkyl sulfonate wetting agents is also described.

    摘要翻译: 一种电镀槽,用于利用氟硼酸锡和硫酸作为电解液高速沉积明亮的金属锡; 其中,除了某些其它添加剂之外,浴含有全氟烷基磺酸盐润湿剂以促进阳极腐蚀。 系统中使用的增白剂包括芳族胺和脂族醛。 出于某些目的,可能有利的是将硼酸作为电解质的一部分; 并且在其它情况下,使用芳族磺酸来提高浴的稳定性和亮度。 还描述了在含有这些全氟烷基磺酸盐润湿剂的硫酸基质中使用含有氟硼酸锡的浴的方法。

    Electroplating tin and tin alloys and baths therefor
    7.
    发明授权
    Electroplating tin and tin alloys and baths therefor 失效
    电镀锡和锡合金及其浴

    公开(公告)号:US4347107A

    公开(公告)日:1982-08-31

    申请号:US250373

    申请日:1981-04-02

    IPC分类号: C25D3/32 C25D3/60

    CPC分类号: C25D3/32 C25D3/60

    摘要: Improved electroplating bath for depositing bright, metallic tin wherein divalent tin, in the form of stannous sulfate or fluoroborate, is present in conjunction with sulfuric or fluoroboric acid, brighteners including an aromatic amine and an aliphatic aldehyde, a polyalkylene ether surfactant, and an aromatic sulfonic acid to ensure bath stability as well as the requisite brightness. The divalent tin-containing electroplating bath may also be provided with copper or rhodium salts to achieve codeposition of tin with at least one of these alloying metals. The method of utilizing such divalent tin electroplating baths to plate substrates with bright metallic tin is also described and claimed.

    摘要翻译: 改进的用于沉积光亮金属锡的电镀浴,其中硫酸亚锡或氟硼酸盐形式的二价锡与硫酸或氟硼酸结合存在,包括芳族胺和脂族醛的增白剂,聚亚烷基醚表面活性剂和芳族化合物 磺酸,以确保浴的稳定性以及必要的亮度。 二价含锡电镀浴还可以提供铜或铑盐,以实现与这些合金金属中的至少一种的锡的共沉积。 还描述并要求保护利用这种二价锡电镀浴将光亮金属锡平板化的方法。