PROCESS FOR MAKING MICROLENS ARRAYS AND MASTERFORMS
    1.
    发明申请
    PROCESS FOR MAKING MICROLENS ARRAYS AND MASTERFORMS 有权
    制作微阵列和主体的过程

    公开(公告)号:US20090284840A1

    公开(公告)日:2009-11-19

    申请号:US12509904

    申请日:2009-07-27

    IPC分类号: G02B27/12 G03F7/20

    摘要: A process for making a microlens array or a microlens array masterform comprises (a) providing a photoreactive composition, the photoreactive composition comprising (1) at least one reactive species that is capable of undergoing an acid- or radical-initiated chemical reaction, and (2) at least one multiphoton photoinitiator system; and (b) imagewise exposing at least a portion of the composition to light sufficient to cause simultaneous absorption of at least two photons, thereby inducing at least one acid- or radical-initiated chemical reaction where the composition is exposed to the light, the imagewise exposing being carried out in a pattern that is effective to define at least the surface of a plurality of microlenses, each of the microlenses having a principal axis and a focal length, and at least one of the microlenses being an aspherical microlens.

    摘要翻译: 制备微透镜阵列或微透镜阵列原型的方法包括(a)提供光反应性组合物,所述光反应性组合物包含(1)能够经历酸或自由基引发的化学反应的至少一种反应性物质,和 2)至少一种多光子光引发剂体系; 和(b)将组合物的至少一部分成像曝光至足以引起同时吸收至少两个光子的光,从而诱导至少一种酸或自由基引发的化学反应,其中组合物暴露于光,成像 曝光以有效地限定多个微透镜的表面的图案进行,每个微透镜具有主轴和焦距,并且至少一个微透镜是非球面微透镜。

    Process for making microlens arrays and masterforms
    2.
    发明授权
    Process for making microlens arrays and masterforms 有权
    制备微透镜阵列和原型的方法

    公开(公告)号:US08004767B2

    公开(公告)日:2011-08-23

    申请号:US12509904

    申请日:2009-07-27

    IPC分类号: G02B27/10

    摘要: A process for making a microlens array or a microlens array masterform comprises (a) providing a photoreactive composition, the photoreactive composition comprising (1) at least one reactive species that is capable of undergoing an acid- or radical-initiated chemical reaction, and (2) at least one multiphoton photoinitiator system; and (b) imagewise exposing at least a portion of the composition to light sufficient to cause simultaneous absorption of at least two photons, thereby inducing at least one acid- or radical-initiated chemical reaction where the composition is exposed to the light, the imagewise exposing being carried out in a pattern that is effective to define at least the surface of a plurality of microlenses, each of the microlenses having a principal axis and a focal length, and at least one of the microlenses being an aspherical microlens.

    摘要翻译: 制备微透镜阵列或微透镜阵列原型的方法包括(a)提供光反应性组合物,所述光反应性组合物包含(1)能够经历酸或自由基引发的化学反应的至少一种反应性物质,和 2)至少一种多光子光引发剂体系; 和(b)将组合物的至少一部分成像曝光至足以引起同时吸收至少两个光子的光,从而诱导至少一种酸或自由基引发的化学反应,其中组合物暴露于光,成像 曝光以有效地限定多个微透镜的表面的图案进行,每个微透镜具有主轴和焦距,并且至少一个微透镜是非球面微透镜。

    Process for making microlens arrays and masterforms
    3.
    发明授权
    Process for making microlens arrays and masterforms 有权
    制备微透镜阵列和原型的方法

    公开(公告)号:US07583444B1

    公开(公告)日:2009-09-01

    申请号:US11313482

    申请日:2005-12-21

    IPC分类号: G02B27/18

    摘要: A process for making a microlens array or a microlens array masterform comprises (a) providing a photoreactive composition, the photoreactive composition comprising (1) at least one reactive species that is capable of undergoing an acid- or radical-initiated chemical reaction, and (2) at least one multiphoton photoinitiator system; and (b) imagewise exposing at least a portion of the composition to light sufficient to cause simultaneous absorption of at least two photons, thereby inducing at least one acid- or radical-initiated chemical reaction where the composition is exposed to the light, the imagewise exposing being carried out in a pattern that is effective to define at least the surface of a plurality of microlenses, each of the microlenses having a principal axis and a focal length, and at least one of the microlenses being an aspherical microlens.

    摘要翻译: 制备微透镜阵列或微透镜阵列原型的方法包括(a)提供光反应性组合物,所述光反应性组合物包含(1)能够经历酸或自由基引发的化学反应的至少一种反应性物质,和 2)至少一种多光子光引发剂体系; 和(b)将组合物的至少一部分成像曝光至足以引起同时吸收至少两个光子的光,从而诱导至少一种酸或自由基引发的化学反应,其中组合物暴露于光,成像 曝光以有效地限定多个微透镜的表面的图案进行,每个微透镜具有主轴和焦距,并且至少一个微透镜是非球面微透镜。

    Multidirectional photoreactive absorption method
    4.
    发明授权
    Multidirectional photoreactive absorption method 有权
    多向光反应吸收法

    公开(公告)号:US07790353B2

    公开(公告)日:2010-09-07

    申请号:US10297961

    申请日:2001-06-14

    IPC分类号: G11C7/00

    CPC分类号: G11C7/00 B33Y30/00 G03F7/2051

    摘要: A method for enhancing photoreactive absorption in a specified volume element of a photoreactive composition. In one embodiment, the method includes: providing a photoreactive composition: providing a source of light (preferably, a pulsed laser) sufficient for simultaneous absorption of at least two photons by the photoreactive composition, the light source having a beam capable of being divided: dividing the light beam into a plurality of equal path length exposure beams: and focusing the exposure beams in a substantially non-counter propagating manner at a single volume element of the photoreactive composition simultaneously to react at least a portion of the photoreactive composition. In another embodiment, a method includes: providing a photoreactive composition capable of photoreactive absorption: and exposing the photoreactive composition to laser light from a plurality of substantially non-counter propagating directions simultaneously, wherein the light overlaps in time and space at a predetermined focus spot.

    摘要翻译: 一种用于增强光反应性组合物的特定体积元素中的光反应性吸收的方法。 在一个实施方案中,该方法包括:提供光反应性组合物:提供足以使光反应性组合物同时吸收至少两种光子的光源(优选脉冲激光),所述光源具有能够被分割的光束: 将光束分成多个相等路径长度的曝光光束:并且将曝光光束以基本上非反向传播的方式聚焦在光反应性组合物的单一体积元件上同时反应至少一部分光反应性组合物。 在另一个实施方案中,一种方法包括:提供能够进行光反应吸收的光反应性组合物;和将光反应性组合物同时从多个基本上非反向传播方向的激光曝光,其中光在预定焦点处的时间和空间重叠 。

    Multipass multiphoton absorption method and apparatus
    5.
    发明授权
    Multipass multiphoton absorption method and apparatus 有权
    多光子多光子吸收法和装置

    公开(公告)号:US07166409B2

    公开(公告)日:2007-01-23

    申请号:US10297968

    申请日:2001-06-14

    IPC分类号: G03F7/038

    摘要: A method of increasing the efficiency of a multiphoton absorption process and apparatus. The method includes: providing a photoreactive composition; providing a source of sufficient light for simultaneous absorption of at least two photons; exposing the photoreactive composition to at least one transit of light from the light source; and directing at least a portion of the first transit of the light back into the photoreactive composition using at least one optical element, wherein a plurality of photons not absorbed in at least one transit are used to expose the photoreactive composition in a subsequent transit.

    摘要翻译: 提高多光子吸收过程和设备效率的方法。 该方法包括:提供光反应性组合物; 提供足够的光源以同时吸收至少两个光子; 将光反应性组合物暴露于来自光源的光的至少一个转运; 以及使用至少一个光学元件将所述光的第一转运的至少一部分引导回到所述光反应性组合物中,其中使用在至少一个转运中未被吸收的多个光子在随后的转运中暴露所述光反应性组合物。

    Monochromatic light source with high aspect ratio
    10.
    发明授权
    Monochromatic light source with high aspect ratio 失效
    具有高纵横比的单色光源

    公开(公告)号:US08193543B2

    公开(公告)日:2012-06-05

    申请号:US13058315

    申请日:2009-08-18

    IPC分类号: H01L27/15

    摘要: Light emitting systems are disclosed. The light emitting system includes an LED that emits light at a first wave-length. A primary portion of the emitted first wavelength light exits the LED from a top surface of the LED that has a minimum lateral dimension Wmin. The remaining portion of the emitted first wavelength light exits the LED from one or more sides of the LED that has a maximum edge thickness Tmax (122, 124). The ratio Wmin/Tmax is at least 30. The light emitting system further includes a re-emitting semiconductor construction that includes a semiconductor potential well. The re-emitting semiconductor construction receives the first wavelength light that exits the LED from the top surface and converts at least a portion of the received light to light of a second wavelength. The integrated emission intensity of all light at the second wavelength that exit the light emitting system is at least 4 times the integrated emission intensity of all light at the first wavelength that exit the light emitting system.

    摘要翻译: 公开了发光系统。 发光系统包括发射第一波长的光的LED。 发射的第一波长光的主要部分从具有最小横向尺寸Wmin的LED的顶表面离开LED。 发射的第一波长光的剩余部分从具有最大边缘厚度Tmax(122,124)的LED的一侧或多侧离开LED。 比率Wmin / Tmax至少为30.发光系统还包括包括半导体势阱的再发射半导体结构。 再发射半导体结构从顶表面接收离开LED的第一波长光,并将接收的光的至少一部分转换成第二波长的光。 离开发光系统的第二波长的所有光的集成发射强度是离开发光系统的第一波长的所有光的集成发射强度的至少4倍。