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    Silicon modulator offset tuning arrangement
    1.
    发明授权
    Silicon modulator offset tuning arrangement 有权
    硅调制器偏移调谐布置

    公开(公告)号：US07447395B2

    公开(公告)日：2008-11-04

    申请号：US11810591

    申请日：2007-06-06

    申请人： Robert Keith Montgomery ,  Margaret Ghiron ,  Prakash Gothoskar ,  Paulius Mindaugas Mosinskis ,  Vipulkumar Patel ,  Kalpendu Shastri ,  Mark Webster

    发明人： Robert Keith Montgomery ,  Margaret Ghiron ,  Prakash Gothoskar ,  Paulius Mindaugas Mosinskis ,  Vipulkumar Patel ,  Kalpendu Shastri ,  Mark Webster

    IPC分类号： G02B6/12 ,  G02F1/295

    CPC分类号： G02F1/025 ,  G02F1/0147 ,  G02F1/225 ,  G02F2201/126

    摘要： A silicon-based optical modulator structure includes one or more separate localized heating elements for changing the refractive index of an associated portion of the structure and thereby providing corrective adjustments to address unwanted variations in device performance. Heating is provided by thermo-optic devices such as, for example, silicon-based resistors, silicide resistors, forward-biased PN junctions, and the like, where any of these structures may easily be incorporated with a silicon-based optical modulator. The application of a DC voltage to any of these structures will generate heat, which then transfers into the waveguiding area. The increase in local temperature of the waveguiding area will, in turn, increase the refractive index of the waveguiding in the area. Control of the applied DC voltage results in controlling the refractive index.

    摘要翻译： 基于硅的光学调制器结构包括一个或多个单独的局部加热元件，用于改变结构的相关部分的折射率，从而提供校正调整以解决器件性能的不期望的变化。 加热由诸如硅基电阻器，硅化物电阻器，正向偏置PN结等的热光器件提供，其中这些结构中的任何一种可以容易地与硅基光学调制器结合。 对这些结构中的任何一个施加直流电压将产生热量，然后传递到波导区域。 波导区域的局部温度的增加又将增加该区域中波导的折射率。 施加的直流电压的控制导致控制折射率。

    Silicon modulator offset tuning arrangement
    2.
    发明申请
    Silicon modulator offset tuning arrangement 有权
    硅调制器偏移调谐布置

    公开(公告)号：US20070292075A1

    公开(公告)日：2007-12-20

    申请号：US11810591

    申请日：2007-06-06

    申请人： Robert Keith Montgomery ,  Margaret Ghiron ,  Prakash Gothoskar ,  Paulius Mindaugas Mosinskis ,  Vipulkumar Patel ,  Kalpendu Shastri ,  Mark Webster

    发明人： Robert Keith Montgomery ,  Margaret Ghiron ,  Prakash Gothoskar ,  Paulius Mindaugas Mosinskis ,  Vipulkumar Patel ,  Kalpendu Shastri ,  Mark Webster

    IPC分类号： G02B6/12

    CPC分类号： G02F1/025 ,  G02F1/0147 ,  G02F1/225 ,  G02F2201/126

    摘要： A silicon-based optical modulator structure includes one or more separate localized heating elements for changing the refractive index of an associated portion of the structure and thereby providing corrective adjustments to address unwanted variations in device performance. Heating is provided by thermo-optic devices such as, for example, silicon-based resistors, silicide resistors, forward-biased PN junctions, and the like, where any of these structures may easily be incorporated with a silicon-based optical modulator. The application of a DC voltage to any of these structures will generate heat, which then transfers into the waveguiding area. The increase in local temperature of the waveguiding area will, in turn, increase the refractive index of the waveguiding in the area. Control of the applied DC voltage results in controlling the refractive index

    摘要翻译： 基于硅的光学调制器结构包括一个或多个单独的局部加热元件，用于改变结构的相关部分的折射率，从而提供校正调整以解决器件性能的不期望的变化。 加热由诸如硅基电阻器，硅化物电阻器，正向偏置PN结等的热光器件提供，其中这些结构中的任何一种可以容易地与硅基光学调制器结合。 对这些结构中的任何一个施加直流电压将产生热量，然后传递到波导区域。 波导区域的局部温度的增加又将增加该区域中波导的折射率。 施加的直流电压的控制导致控制折射率

    SOI-based photonic bandgap devices
    7.
    发明授权
    SOI-based photonic bandgap devices 有权
    基于SOI的光子带隙器件

    公开(公告)号：US07298949B2

    公开(公告)日：2007-11-20

    申请号：US11042774

    申请日：2005-01-24

    申请人： Prakash Gothoskar ,  Margaret Ghiron ,  Robert Keith Montgomery ,  Vipulkumar Patel ,  Soham Pathak ,  David Piede ,  Kalpendu Shastri ,  Katherine A. Yanushefski

    发明人： Prakash Gothoskar ,  Margaret Ghiron ,  Robert Keith Montgomery ,  Vipulkumar Patel ,  Soham Pathak ,  David Piede ,  Kalpendu Shastri ,  Katherine A. Yanushefski

    IPC分类号： G02B6/10 ,  G02B6/12

    CPC分类号： G02F1/025 ,  G02F2202/32

    摘要： An SOI-based photonic bandgap (PBG) electro-optic device utilizes a patterned PBG structure to define a two-dimensional waveguide within an active waveguiding region of the SOI electro-optic device. The inclusion of the PBG columnar arrays within the SOI structure results in providing extremely tight lateral confinement of the optical mode within the waveguiding structure, thus significantly reducing the optical loss. By virtue of including the PBG structure, the associated electrical contacts may be placed in closer proximity to the active region without affecting the optical performance, thus increasing the switching speed of the electro-optic device. The overall device size, capacitance and resistance are also reduced as a consequence of using PBGs for lateral mode confinement.

    摘要翻译： 基于SOI的光子带隙（PBG）电光器件利用图案化的PBG结构来在SOI电光器件的有源波导区域内限定二维波导。 在SOI结构中包含PBG柱状阵列导致在波导结构内提供光学模式的非常紧密的侧向约束，从而显着减少光学损耗。 通过包括PBG结构，相关联的电触点可以放置在更接近有源区域而不影响光学性能，从而增加电光器件的切换速度。 由于使用PBG用于横向模式限制，整个装置尺寸，电容和电阻也减小。

    Active manipulation of light in a silicon-on-insulator (SOI) structure
    9.
    发明授权
    Active manipulation of light in a silicon-on-insulator (SOI) structure 有权
    主动操纵绝缘体上硅（SOI）结构中的光

    公开(公告)号：US07187837B2

    公开(公告)日：2007-03-06

    申请号：US11069852

    申请日：2005-02-28

    申请人： Prakash Gothoskar ,  Margaret Ghiron ,  Robert Keith Montgomery ,  Vipulkumar Patel ,  Kalpendu Shastri ,  Soham Pathak ,  Katherine A. Yanushefski

    发明人： Prakash Gothoskar ,  Margaret Ghiron ,  Robert Keith Montgomery ,  Vipulkumar Patel ,  Kalpendu Shastri ,  Soham Pathak ,  Katherine A. Yanushefski

    IPC分类号： G02B6/26 ,  G02B6/10 ,  H01L29/22 ,  H01L33/00 ,  H01L27/14 ,  H01L31/00

    CPC分类号： G02B6/12004 ,  G02F1/025 ,  G02F1/292 ,  G02F2001/294

    摘要： An arrangement for actively controlling, in two dimensions, the manipulation of light within an SOI-based optical structure utilizes doped regions formed within the SOI layer and a polysilicon layer of a silicon-insulator-silicon capacitive (SISCAP) structure. The regions are oppositely doped so as to form an active device, where the application of a voltage potential between the oppositely doped regions functions to modify the refractive index in the affected area and alter the properties of an optical signal propagating through the region. The doped regions may be advantageously formed to exhibit any desired “shaped” (such as, for example, lenses, prisms, Bragg gratings, etc.), so as to manipulate the propagating beam as a function of the known properties of these devices. One or more active devices of the present invention may be included within a SISCAP formed, SOI-based optical element (such as, for example, a Mach-Zehnder interferometer, ring resonator, optical switch, etc.) so as to form an active, tunable element.

    摘要翻译： 用于主动地控制SOI基光学结构内的光的操纵的布置利用形成在SOI层内的掺杂区域和硅绝缘体 - 硅电容（SISCAP）结构的多晶硅层。 这些区域相反地掺杂以形成有源器件，其中在相对掺杂区域之间施加电压电位用于改变受影响区域中的折射率并改变传播通过该区域的光信号的特性。 可以有利地形成掺杂区域以呈现任何期望的“成形”（例如，透镜，棱镜，布拉格光栅等），以便根据这些器件的已知特性来操纵传播光束。 本发明的一个或多个有源器件可以包括在形成SISCAP的SOI基光学元件（例如，诸如Mach-Zehnder干涉仪，环形谐振器，光学开关等）中，以形成活跃的 ，可调元素。

    Permanent light coupling arrangement and method for use with thin silicon optical waveguides
    10.
    发明授权
    Permanent light coupling arrangement and method for use with thin silicon optical waveguides 有权
    永久光耦合布置及其与薄硅光波导的使用方法

    公开(公告)号：US07020364B2

    公开(公告)日：2006-03-28

    申请号：US10668947

    申请日：2003-09-23

    申请人： Margaret Ghiron ,  Prakash Gothoskar ,  Robert Keith Montgomery ,  Vipulkumar Patel ,  Soham Pathak ,  Kalpendu Shastri ,  Katherine A. Yanushefski

    发明人： Margaret Ghiron ,  Prakash Gothoskar ,  Robert Keith Montgomery ,  Vipulkumar Patel ,  Soham Pathak ,  Kalpendu Shastri ,  Katherine A. Yanushefski

    IPC分类号： G02B6/34

    CPC分类号： G02B6/4206

    摘要： A trapezoidal shaped single-crystal silicon prism is formed and permanently attached to an SOI wafer, or any structure including a silicon optical waveguide. In order to provide efficient optical coupling, the dopant species and concentration within the silicon waveguide is chosen such that the refractive index of the silicon waveguide is slightly less than that of the prism coupler (refractive index of silicon≈3.5). An intermediate evanescent coupling layer, disposed between the waveguide and the prism coupler, comprises a refractive index less than both the prism and the waveguide. In one embodiment, the evanescent coupling layer comprises a constant thickness. In an alternative embodiment, the evanescent coupling layer may be tapered to improve coupling efficiency between the prism and the waveguide. Methods of making the coupling arrangement are also disclosed.

    摘要翻译： 形成梯形形状的单晶硅棱镜，并且永久地附着到SOI晶片或包括硅光波导的任何结构。 为了提供有效的光耦合，选择硅波导内的掺杂物种类和浓度使得硅波导的折射率略小于棱镜耦合器的折射率（硅折射率为0.35）。 设置在波导和棱镜耦合器之间的中间消逝耦合层包括小于棱镜和波导两者的折射率。 在一个实施例中，ev逝耦合层包括恒定的厚度。 在替代实施例中，渐逝耦合层可以是锥形的，以提高棱镜和波导之间的耦合效率。 还公开了制造耦合装置的方法。