Processes for polishing glass and glass-ceramic surfaces using excimer
laser radiation
    2.
    发明授权
    Processes for polishing glass and glass-ceramic surfaces using excimer laser radiation 失效
    使用准分子激光辐射研磨玻璃和玻璃陶瓷表面的方法

    公开(公告)号:US5742026A

    公开(公告)日:1998-04-21

    申请号:US494911

    申请日:1995-06-26

    IPC分类号: B23K26/00 C03B29/00

    摘要: A method for polishing glass, ceramic, and glass-ceramic surfaces. The method includes exposing the surface to ultraviolet laser radiation under conditions effective to smooth the surface. Methods for polishing glass-ceramic surfaces containing spinel crystals using 193-351 nm radiation of a rare gas halide excimer laser operating at about 150 to about 400 mJ/cm.sup.2 are disclosed. Using the methods of the present invention, surfaces having an R.sub.a of about 4 to about 2 .ANG. are produced.

    摘要翻译: 一种抛光玻璃,陶瓷和玻璃陶瓷表面的方法。 该方法包括在有效平滑表面的条件下将表面暴露于紫外激光辐射。 公开了使用在约150至约400mJ / cm 2下操作的稀有气体卤化物准分子激光器的193-351nm辐射抛光含有尖晶石晶体的玻璃陶瓷表面的方法。 使用本发明的方法,制备具有约4至约2个角度的Ra的表面。