PROCESS AND PRODUCTION DEVICE FOR THE PRODUCTION OF AT LEAST ONE ANALYTICAL DEVICE
    2.
    发明申请
    PROCESS AND PRODUCTION DEVICE FOR THE PRODUCTION OF AT LEAST ONE ANALYTICAL DEVICE 审中-公开
    用于生产至少一个分析装置的工艺和生产装置

    公开(公告)号:US20150233889A1

    公开(公告)日:2015-08-20

    申请号:US14611611

    申请日:2015-02-02

    Abstract: A process for the production of at least one analytical device is disclosed. The analytical device comprises at least one capillary element. The process comprises providing at least one carrier layer; providing at least one spacer layer; applying the spacer layer on top of the carrier layer; providing at least one cover layer; and applying the cover layer on top of the spacer layer. The process further comprises at least one cutting step. At least one capillary channel of the capillary element is cut out from the spacer layer. The cutting step is performed by using at least two cutting tools. The cutting tools complement one another to form a contour of the capillary channel.

    Abstract translation: 公开了生产至少一种分析装置的方法。 分析装置包括至少一个毛细管元件。 该方法包括提供至少一个载体层; 提供至少一个间隔层; 将间隔层施加在载体层的顶部上; 提供至少一个覆盖层; 以及将覆盖层施加在间隔层的顶部上。 该方法还包括至少一个切割步骤。 从间隔层切出毛细管元件的至少一个毛细管通道。 通过使用至少两个切割工具来执行切割步骤。 切割工具相互补充以形成毛细通道的轮廓。

    MARKING METHOD FOR THE REJECT MARKING OF TEST ELEMENTS
    3.
    发明申请
    MARKING METHOD FOR THE REJECT MARKING OF TEST ELEMENTS 审中-公开
    测试元素的标记方法

    公开(公告)号:US20140096368A1

    公开(公告)日:2014-04-10

    申请号:US14104614

    申请日:2013-12-12

    Abstract: The test elements are provided that are adapted to detect at least one analyte in a sample. At least some of the test elements are provided with a defect marking which contains information about defectiveness of the test elements. The test elements include at least one radiation-sensitive material. The test elements are exposed to at least one radiation, the radiation being adapted to induce marking in the form of at least one optically detectable change in the radiation-sensitive material.

    Abstract translation: 提供了适于检测样品中的至少一种分析物的测试元件。 至少一些测试元件被提供有缺陷标记,该缺陷标记包含关于测试元件的缺陷的信息。 测试元件包括至少一种辐射敏感材料。 测试元件暴露于至少一个辐射,辐射适于以辐射敏感材料中的至少一个可光学检测的变化的形式诱导标记。

Patent Agency Ranking