Light-sensitive diazo composition and material with branched
polyurethane resin
    2.
    发明授权
    Light-sensitive diazo composition and material with branched polyurethane resin 失效
    光敏重氮组合物和具有支链聚氨酯树脂的材料

    公开(公告)号:US4337307A

    公开(公告)日:1982-06-29

    申请号:US211399

    申请日:1980-11-28

    申请人: Rudolf Neubauer

    发明人: Rudolf Neubauer

    CPC分类号: G03F7/0217 Y10S430/107

    摘要: A light-sensitive composition for the preparation of printing plates and photoresists is described, which comprises as the light-sensitive compound a diazonium salt polycondensation product and as the binding agent a branched polyurethane resin which contains no terminal isocyanate groups and the terminal units of which are at least partially derived from dihydroxy compounds. The printing plates produced with this light-sensitive composition are easily developable with aqueous developer solutions and yield long press runs.

    摘要翻译: 描述了用于制备印版和光致抗蚀剂的感光组合物,其包含作为感光性化合物的重氮盐缩聚产物,作为粘合剂,不含末端异氰酸酯基的支链聚氨酯树脂及其末端单元 至少部分衍生自二羟基化合物。 用该感光组合物生产的印刷版可用显影剂水溶液容易地显影并产生较长的压印次数。

    Sulphur-free expanding, hot hardening shaped parts
    3.
    发明授权
    Sulphur-free expanding, hot hardening shaped parts 有权
    无硫膨胀,热硬化成型件

    公开(公告)号:US6096791A

    公开(公告)日:2000-08-01

    申请号:US297347

    申请日:1999-04-29

    CPC分类号: C08J9/00 C08J2309/00

    摘要: Heat-curing, expanding mouldings based on solid polybutadiene rubber and vulcanization systems free from elemental sulfur are distinguished by the following advantageous properties: in the uncured state in which they are supplied, they have minimal rubber-elastic resilience and are readily formable. During the curing process, no unpleasant odors are given off and, after curing, a soft and elastic foam with a continuous outer skin is formed.

    摘要翻译: PCT No.PCT / EP97 / 05781 Sec。 371日期1999年4月29日第 102(e)1999年4月29日PCT 1997年10月20日PCT公布。 WO98 / 18853 PCT出版物 日期1998年5月7日基于固体聚丁二烯橡胶和不含元素硫的硫化体系的热固化,膨胀模制品的特征在于以下有利的性质:在其供应的未固化状态下,它们具有最小的橡胶弹性回弹性并且容易 可成形 在固化过程中,不会产生令人不愉快的气味,并且在固化后形成具有连续外皮的柔软且有弹性的泡沫。

    Radiation-sensitive recording material for the production of
planographic printing plates
    5.
    发明授权
    Radiation-sensitive recording material for the production of planographic printing plates 失效
    用于生产平版印刷版的辐射敏感记录材料

    公开(公告)号:US5998084A

    公开(公告)日:1999-12-07

    申请号:US749854

    申请日:1996-11-15

    CPC分类号: B41N3/038 G03F7/0226

    摘要: A positive-working, radiation-sensitive recording material capable of being used for the production of planographic printing plates, comprising: an aluminum support and a radiation-sensitive layer coated thereon, whereinthe aluminum support has been grained in nitric acid, then cleaned in sulfuric acid, anodized in sulfuric acid, and subsequently hydrophilized with a compound comprising at least one unit with a phosphonic acid or phosphonate group; andthe radiation-sensitive layer comprisesa) a radiation-sensitive 1,2-naphthoquinone-2-diazide-4- or -5-sulfonic acid ester of a polycondensate having phenolic hydroxy groups, said polycondensate being obtained by reacting a phenolic compound with an aldehyde or ketone,b) a novolak or a polycondensation product obtained by reacting a polyphenol with an aldehyde or ketone, as an alkali-soluble resin,c) a vinyl-type polymer comprising at least one unit having a lateral hydroxyphenyl group,d) a clathrate-forming compound,e) a low-molecular weight compound which comprises at least one acidic hydrogen atom, andf) silica gel particles having a maximum diameter of 15 .mu.m.

    摘要翻译: 能够用于生产平版印刷版的正面工作的辐射敏感记录材料,包括:铝载体和涂覆在其上的辐射敏感层,其中铝载体已经在硝酸中粒化,然后在 硫酸,在硫酸中阳极氧化,随后用包含至少一个具有膦酸或膦酸酯基团的单元的化合物亲水化; 辐射敏感层包括a)具有酚羟基的缩聚物的辐射敏感的1,2-萘醌-2-二叠氮化物-4-或-5-磺酸酯,所述缩聚物是通过使酚类化合物与 醛或酮,b)通过使多酚与醛或酮反应得到的酚醛清漆或缩聚产物作为碱溶性树脂,c)包含至少一个具有侧羟基苯基单元的乙烯基型聚合物,d )包合物形成化合物,e)包含至少一个酸性氢原子的低分子量化合物,和f)最大直径为15μm的硅胶颗粒。

    Radiation-sensitive recording material with a positive-working,
radiation-sensitive layer having a rough surface containing a
surfactant having polysiloxane units
    7.
    发明授权
    Radiation-sensitive recording material with a positive-working, radiation-sensitive layer having a rough surface containing a surfactant having polysiloxane units 失效
    具有正性辐射敏感层的辐射敏感记录材料,其具有包含具有聚硅氧烷单元的表面活性剂的粗糙表面

    公开(公告)号:US5378584A

    公开(公告)日:1995-01-03

    申请号:US924750

    申请日:1992-08-04

    摘要: A radiation-sensitive recording material, in particular for producing planographic printing plates, is disclosed. The material is composed of a layer support and a positive-working, radiation-sensitive layer having a rough surface containing at least one 1,2-quinonediazide as a radiation-sensitive compound, a polycondensate or polymer as a binder insoluble in water and soluble or swellable in aqueous-alkaline solutions, a dye and a filler. At a layer weight of 3 g/m.sup.2 or less, the radiation-sensitive layer comprises a silicic acid product having a mean grain size in the range from 3 to 5 .mu.m with an exclusion limit of 15 .mu.m as a filler in such a quantity that it exhibits a Bekk smoothness in the range from 20 to 100 seconds (determined according to DIN 53 107, Method A). The layer additionally comprises a surfactant having polysiloxane units. The recording material shows good copying properties and technical printing properties, such as an advantageous evacuation time, screen evenness, low susceptibility to air occlusions, good resolving power and a good coating structure. The invention also relates to a process for producing a planographic printing plated, using the recording material according to the invention.

    摘要翻译: 公开了一种辐射敏感记录材料,特别是用于生产平版印刷版的材料。 该材料由具有粗糙表面的层载体和正性辐射敏感层组成,其具有至少一种作为辐射敏感性化合物的1,2-醌二叠氮化物,作为不溶于水和可溶性的粘合剂的缩聚物或聚合物 或在水性碱性溶液中溶胀,染料和填料。 在3g / m 2以下的层重量下,辐射敏感层包含平均粒度在3〜5μm的硅酸产品,排阻极限为15μm作为填料, 其表现为Bekk平滑度在20至100秒的范围内(根据DIN 53 107,方法A确定)。 该层还包含具有聚硅氧烷单元的表面活性剂。 记录材料具有良好的复印性能和技术打印性能,例如有利的抽真空时间,屏幕均匀性,对空气阻塞的低敏感性,良好的分辨能力和良好的涂层结构。 本发明还涉及使用根据本发明的记录材料来生产平版印刷电镀的方法。

    Developer mixture for developing exposed light-sensistive copying layers
    8.
    发明授权
    Developer mixture for developing exposed light-sensistive copying layers 失效
    用于显影曝光的光敏复印层的显影剂混合物

    公开(公告)号:US4339530A

    公开(公告)日:1982-07-13

    申请号:US196279

    申请日:1980-10-14

    CPC分类号: G03F7/32

    摘要: This invention relates to a developer mixture for washing out light-sensitive copying layers previously exposed in imagewise manner and containing a polymer of an N-vinyl amine, of vinyl alcohol or of a vinyl alcohol derivative, an alcohol being water-soluble in an amount less than 10% by weight, and water as the main constituent, the mixture containing as said polymer a copolymer which is water-soluble or which can be dispersed in water to form a stable dispersion, composed of (a) hydrophilic units of the formula I: ##STR1## wherein A is O-R or ##STR2## R is a hydrogen atom or a methyl group; R.sub.1 is a hydrogen atom, an alkyl group or an alkoxy alkyl group having 1 to 10 carbon atoms each or an aryl group with 6 to 10 carbon atoms; R.sub.2 is an alkyl group or an acyl group having 1 to 5 carbon atoms each, and wherein a homopolymer of the hydrophilic units is water-soluble and of (b) hydrophobic units of vinyl monomers whose homopolymer is water-insoluble and which have an aromatic or a long-chain aliphatic group as the substituent, the proportion of the hydrophobic units being sufficient to ensure that an 0.1% aqueous solution of said copolymer has a surface tension of not more than 50 mN/m and that the quantity of said copolymer is at least sufficient to emulsify any quantity of alcohol exceeding the solubility limit. The invention also relates to a process for developing exposed light-sensitive copying layers using said developer mixture.

    摘要翻译: 本发明涉及一种显影剂混合物,其用于洗涤先前以成像方式暴露并含有N-乙烯基胺,乙烯醇或乙烯醇衍生物的聚合物的乙烯醇衍生物的聚合物,水溶性的醇 小于10重量%,以水为主要成分,该混合物含有作为所述聚合物的共聚物,该共聚物是水溶性的,或者可以分散在水中以形成稳定的分散体,它由(a)式 I:其中A为OR或R为氢原子或甲基; R1是氢原子,烷基或具有1-10个碳原子的烷氧基烷基或具有6-10个碳原子的芳基; R 2是各自具有1至5个碳原子的烷基或酰基,并且其中亲水单元的均聚物是水溶性的,和(b)均聚物是水不溶性且具有芳族化合物的乙烯基单体的疏水单元 或长链脂族基团作为取代基时,疏水单元的比例足以确保所述共聚物的0.1%水溶液的表面张力不大于50mN / m,并且所述共聚物的量为 至少足以使超过溶解度极限的任何量的醇乳化。 本发明还涉及使用所述显影剂混合物显影曝光的感光复印层的方法。