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公开(公告)号:US20180142375A1
公开(公告)日:2018-05-24
申请号:US15819477
申请日:2017-11-21
CPC分类号: C30B23/025 , C30B23/063 , C30B29/46 , H01L21/0242 , H01L21/02433 , H01L21/02485 , H01L21/02505 , H01L21/02568 , H01L21/02598 , H01L21/02631 , H01L21/02664 , H01L29/24
摘要: A method of making high quality insulating single crystalline In2Se3 films by (1) depositing at least one quintuple layer (QL) of Bi2Se3 on a substrate layer at a temperature below which only the Se adheres to the substrate; (2) depositing a plurality of In2Se3 QL's on the deposited Bi2Se3 layer or layers at a temperature between about 200° C. and about 330° C. to form a hetero-structure; and (3) heating the hetero-structure to a temperature between about 400° C. and about 700° C. so that the Bi2Se3 layer is diffused through the In2Se3 layer and evaporated away.