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    Workpiece processing apparatus
    2.
    发明申请
    Workpiece processing apparatus 审中-公开
    工件加工装置

    公开(公告)号：US20080289577A1

    公开(公告)日：2008-11-27

    申请号：US12152039

    申请日：2008-05-12

    申请人： Ryuichi Iwasaki ,  Hirofumi Mankawa ,  Shigeru Masuda ,  Hirofumi Hayashi ,  Masaaki Mike

    发明人： Ryuichi Iwasaki ,  Hirofumi Mankawa ,  Shigeru Masuda ,  Hirofumi Hayashi ,  Masaaki Mike

    IPC分类号： C23C16/00

    CPC分类号： H01L21/67069

    摘要： A workpiece processing apparatus S, which comprises: a plasma generator unit 6 including a plasma generation section 18 operable to plasmatize a given gas supplied thereto, and emit the plasmatized gas therefrom; and a transport mechanism 2 adapted to support a target workpiece W in a position beneath the plasma generation section 18, wherein the plasmatized gas is emitted onto the workpiece W to carry out a given processing. The workpiece processing apparatus S further includes a setup frame 4 adapted to set up the plasma generator unit 6 to allow the plasma generation section 18 to be located over the workpiece. The plasma generator unit 6 is mounted to the setup frame 4 in a manner capable of being drawn out of a setup position where the plasma generation section 18 is positioned over the workpiece W, in a horizontal direction.

    摘要翻译： 工件处理装置S，其包括：等离子体发生器单元6，其包括等离子体产生部分18，其可操作以等离子体化供给的给定气体，并从其中排出等离子体化气体; 以及适于将目标工件W支撑在等离子体产生部18下方的输送机构2，其中等离子体化气体被发射到工件W上以进行给定的处理。 工件处理装置S还包括适于建立等离子体发生器单元6以允许等离子体产生部分18位于工件上方的安装框架4。 等离子体发生器单元6以能够从等离子体产生部分18在水平方向上位于工件W上方的设置位置被拉出的方式安装到安装框架4上。

    Plasma generation apparatus and workpiece processing apparatus using the same
    3.
    发明申请
    Plasma generation apparatus and workpiece processing apparatus using the same 审中-公开
    等离子体发生装置和使用其的工件处理装置

    公开(公告)号：US20080053988A1

    公开(公告)日：2008-03-06

    申请号：US11895706

    申请日：2007-08-27

    申请人： Kiyotaka Arai ,  Hirofumi Mankawa ,  Hidetaka Matsuuchi ,  Ryuichi Iwasaki ,  Kazuhiro Yoshida ,  Shigeru Masuda ,  Hirofumi Hayashi ,  Masaaki Mike

    发明人： Kiyotaka Arai ,  Hirofumi Mankawa ,  Hidetaka Matsuuchi ,  Ryuichi Iwasaki ,  Kazuhiro Yoshida ,  Shigeru Masuda ,  Hirofumi Hayashi ,  Masaaki Mike

    IPC分类号： H05B6/68

    CPC分类号： H05B6/72 ,  H01J37/32192 ,  H01J37/32229 ,  H01J37/32275 ,  H01J37/32752 ,  H01J37/32825 ,  H05B6/705 ,  H05B6/78

    摘要： Disclosed is a plasma generation apparatus, which comprises a microwave generation section adapted to generate a microwave, a gas supply section adapted to supply a gas to be plasmatized, a plasma generation nozzle which is provided with an inner electrode adapted to receive the microwave and an outer electrode concentrically disposed outside the inner electrode, and adapted to plasmatize the gas supplied from the gas supply section thereinto, based on energy of the microwave, and emit the plasmatized gas from a distal end thereof; and an adapter attached to the distal end of the plasma generation nozzle. In the plasma generation apparatus, the inner and outer electrodes of the plasma generation nozzle are disposed to allow a glow discharge to be induced therebetween so as to plasmatize the gas in a space defined therebetween, and, according to a new supply of the gas into the space, emit the plasmatized gas under atmospheric pressures from a ring-shaped spout of the space in the distal end of the plasma generation nozzle. The adapter is adapted to convert the ring-shaped spout to a lengthwise spout thereof.

    摘要翻译： 公开了一种等离子体产生装置，其包括适于产生微波的微波产生部分，适于供应待等离子体化气体的气体供应部分，具有适于接收微波的内部电极的等离子体产生喷嘴和 外部电极同心地设置在内部电极的外部，并且适于基于微波的能量等离子体化从气体供应部分供应的气体，并从其远端发射等离子体化气体; 以及连接到等离子体产生喷嘴的远端的适配器。 在等离子体产生装置中，等离子体产生喷嘴的内电极和外电极被设置成允许在它们之间引起辉光放电，以便在其间限定的空间中等离子体化气体，并且根据新的气体供应 该空间在大气压下从等离子体生成喷嘴的远端的空间的环状喷口排出等离子体化气体。 适配器适于将环形喷嘴转换成其纵向喷口。

    Plasma generator and workpiece processing apparatus using the same
    5.
    发明申请
    Plasma generator and workpiece processing apparatus using the same 审中-公开
    等离子发生器和工件加工设备使用相同

    公开(公告)号：US20080296268A1

    公开(公告)日：2008-12-04

    申请号：US12154384

    申请日：2008-05-22

    申请人： Masaaki Mike ,  Hirofumi Mankawa ,  Shigeru Masuda ,  Hirofumi Hayashi

    发明人： Masaaki Mike ,  Hirofumi Mankawa ,  Shigeru Masuda ,  Hirofumi Hayashi

    IPC分类号： H05H1/34

    CPC分类号： H01L21/67069 ,  H01J37/32192 ,  H01J37/32825 ,  H05H1/46

    摘要： Disclosed are a plasma generator and a workpiece processing apparatus, wherein an adapter 38 is attached to a distal end of each of a plurality of plasma generation nozzles 31 to convert a spot-shaped spout port of the plasma generation nozzle 31 to a lengthwise sport port 387, and a cover member 93 is provided to cover the plasma generation nozzles 31 so as to allow a narrow space to be defined between the cover member 93 and a workpiece, whereby plasma spouted from the spout port 387 is retained in the space in such a manner as to hit against and rebound from the workpiece into the space. This makes it possible to subject a workpiece having a relatively large surface area to plasma exposure in a uniform manner, while suppressing cooling of plasma in the space to allow the plasma to survive for a relatively long period of time (reduce a plasma disappearance rate) so as to provide enhanced efficiency of plasma exposure.

    摘要翻译： 公开了一种等离子体发生器和工件处理装置，其中适配器38连接到多个等离子体产生喷嘴31中的每一个的远端，以将等离子体产生喷嘴31的点状喷口端口转换成纵向运动端口 387，并且设置盖构件93以覆盖等离子体产生喷嘴31，以便在盖构件93和工件之间限定狭窄的空间，从而从喷口387喷出的等离子体保持在该空间中 一种从工件撞击和反弹到空间的方式。 这使得可以以均匀的方式对具有相对大的表面积的工件进行等离子体曝光，同时抑制空间中的等离子体的冷却，以允许等离子体存活相当长的时间段（降低等离子体消失速率） 从而提高等离子体曝光的效率。