Transparent diffusive oled substrate and method for producing such a substrate

    公开(公告)号:US10147894B2

    公开(公告)日:2018-12-04

    申请号:US14891577

    申请日:2014-04-29

    Abstract: A transparent diffusive OLED substrate includes (a) a transparent flat substrate made of mineral glass having a refractive index of between 1.45 and 1.65, (b) a rough low index layer including mineral particles, the mineral particles being attached to one side of the substrate by means of a sol-gel mineral binder, the mineral particles near, at or protruding from the mineral binder's surface creating a surface roughness characterized by an arithmetical mean deviation Ra comprised between 0.15 and 3 μm, the mineral particles and mineral binder both having a refractive index of between 1.45 and 1.65; (c) a high index layer made of an enamel having a refractive index comprised between 1.8 and 2.1 covering the rough low index layer.

    Method of producing a transparent diffusive OLED substrate
    2.
    发明授权
    Method of producing a transparent diffusive OLED substrate 有权
    制造透明扩散OLED基板的方法

    公开(公告)号:US09391300B2

    公开(公告)日:2016-07-12

    申请号:US14431444

    申请日:2013-09-24

    Abstract: A method of producing a transparent diffusive OLED substrate includes lapping one face or both faces of a flat translucent glass substrate with an abrasive slurry, so as to obtain a flat glass substrate with at least one roughened surface having a roughness profile with an arithmetical mean deviation Ra of between 0.1 μm and 2.0 μm; coating the roughened surface or one of the roughened surfaces with a high index glass frit having a refractive index of at least 1.7, the amount of the high index glass frit being sufficient to completely cover the roughness profile of the roughened surface after melting of the frit, and heating the coated substrate to a temperature above the melting temperature of the high index glass frit and below the softening temperature of the underlying substrate, so as to form high index enamel on one of the roughened surfaces.

    Abstract translation: 制造透明扩散OLED基板的方法包括用研磨浆料研磨平坦半透明玻璃基板的一面或两面,以获得具有至少一个具有粗糙度轮廓的粗糙表面的平坦玻璃基板,其具有算术平均偏差 Ra在0.1μm和2.0μm之间; 用折射率为至少为1.7的高折射率玻璃料涂覆粗糙表面或粗糙表面之一,高折射率玻璃料的量足以完全覆盖玻璃料熔化后粗糙表面的粗糙度轮廓 并且将涂覆的基材加热到高于高折射率玻璃料的熔融温度并低于下面的基材的软化温度的温度,以便在其中一个粗糙化表面上形成高折射率的搪瓷。

    Back-emitting OLED device
    4.
    发明授权
    Back-emitting OLED device 有权
    背面发射OLED器件

    公开(公告)号:US09236582B2

    公开(公告)日:2016-01-12

    申请号:US14369362

    申请日:2012-12-28

    Abstract: An OLED device includes an anode, which is transparent, anode of a sheet resistance R1, a cathode of sheet resistance R2, the ratio r=R2/R1 ranging from 0.1 to 5, a first anode contact and a second anode contact, spaced from and facing the first anode contact, and a first cathode electrical contact, which is: arranged above the active zone, offset from the first anode contact and from the second anode contact, at every point of the contact surface.

    Abstract translation: OLED器件包括透明的阳极,薄层电阻R1的阳极,薄层电阻R2的阴极,比率r = R2 / R1为0.1至5,第一阳极触点和第二阳极触点间隔开 并且面对第一阳极接触,以及第一阴极电接触,其在接触表面的每个点处布置在有源区上方,偏离第一阳极接触和第二阳极接触。

    METHOD OF PRODUCING A TRANSPARENT DIFFUSIVE OLED SUBSTRATE
    5.
    发明申请
    METHOD OF PRODUCING A TRANSPARENT DIFFUSIVE OLED SUBSTRATE 有权
    生产透明有机OLED基板的方法

    公开(公告)号:US20150255753A1

    公开(公告)日:2015-09-10

    申请号:US14431444

    申请日:2013-09-24

    Abstract: A method of producing a transparent diffusive OLED substrate includes lapping one face or both faces of a flat translucent glass substrate with an abrasive slurry, so as to obtain a flat glass substrate with at least one roughened surface having a roughness profile with an arithmetical mean deviation Ra of between 0.1 μm and 2.0 μm; coating the roughened surface or one of the roughened surfaces with a high index glass frit having a refractive index of at least 1.7, the amount of the high index glass frit being sufficient to completely cover the roughness profile of the roughened surface after melting of the frit, and heating the coated substrate to a temperature above the melting temperature of the high index glass frit and below the softening temperature of the underlying substrate, so as to form high index enamel on one of the roughened surfaces.

    Abstract translation: 制造透明扩散OLED基板的方法包括用研磨浆料研磨平坦半透明玻璃基板的一面或两面,以获得具有至少一个具有粗糙度轮廓的粗糙表面的平坦玻璃基板,其具有算术平均偏差 Ra在0.1μm和2.0μm之间; 用折射率为至少为1.7的高折射率玻璃料涂覆粗糙表面或粗糙表面之一,高折射率玻璃料的量足以完全覆盖玻璃料熔化后粗糙表面的粗糙度轮廓 并且将涂覆的基材加热到高于高折射率玻璃料的熔融温度并低于下面的基材的软化温度的温度,以便在其中一个粗糙化表面上形成高折射率的搪瓷。

    BACK-EMITTING OLED DEVICE
    6.
    发明申请
    BACK-EMITTING OLED DEVICE 有权
    反射OLED器件

    公开(公告)号:US20150041782A1

    公开(公告)日:2015-02-12

    申请号:US14369351

    申请日:2012-12-28

    Abstract: An OLED device includes a transparent anode of given sheet resistance R1, a cathode of given sheet resistance R2, the ratio r=R2/R1 ranging from 0.1 to 5, a first anode electrical contact and a first cathode electrical contact which is offset from the anode electrical contact, for any point B1 of each anode contact, on defining a distance D1 between the point B1 and a point C1 of the contact surface which is closest to the point B1, and on defining a distance L1 between the point B1 and a point X1 of a second edge of the active zone opposite from the first edge, passing through C1, then the following criteria are defined: if 0.1≦r

    Abstract translation: OLED器件包括具有给定薄层电阻R1的透明阳极,给定薄层电阻R2的阴极,比率r = R2 / R1为0.1至5,第一阳极电接触和第一阴极电接触,其偏离 阳极电接触,对于每个阳极触点的任何点B1,在点B1和最靠近点B1的接触表面的点C1之间限定距离D1,并且在点B1和点B1之间限定距离L1 有效区域与第一边缘相反的第二边缘的点X1通过C1,然后定义以下标准:如果0.1&nlE; r <1.75,则20%

    Transparent diffusive OLED substrate and method for producing such a substrate
    7.
    发明授权
    Transparent diffusive OLED substrate and method for producing such a substrate 有权
    透明扩散OLED基板及其制造方法

    公开(公告)号:US09412958B2

    公开(公告)日:2016-08-09

    申请号:US14897781

    申请日:2014-06-13

    Abstract: A transparent diffusive OLED substrate includes the following successive elements or layers: (a) a transparent flat substrate made of mineral glass having a refractive index n1 of between 1.48 and 1.58, (b) a monolayer of mineral particles attached to one side of the substrate by means of a low index mineral binder having a refractive index n2 of between 1.45 and 1.61, and (c) a high index layer made of an enamel having a refractive index n4 between 1.82 and 2.10 covering the monolayer of mineral particles, the mineral particles having a refractive index n3 between n2+0.08 and n4−0.08 and protruding from the low index mineral binder so as to be directly in contact with the high index layer, thereby forming a first diffusive interface between the mineral particles and the low index binder, and a second diffusive interface between the mineral particles and the high index layer.

    Abstract translation: 透明扩散OLED基板包括以下连续元件或层:(a)由折射率n1在1.48和1.58之间的矿物玻璃制成的透明平坦基板,(b)附着在基板一侧的单层矿物颗粒 通过折射率n2在1.45和1.61之间的低折射率矿物粘合剂,和(c)由覆盖单层矿物颗粒的折射率n4在1.82和2.10之间的搪瓷制成的高折射率层,矿物颗粒 具有n2 + 0.08和n4-0.08之间的折射率n3并且从低折射率矿物粘合剂突出,以便与高折射率层直接接触,从而在矿物颗粒和低折射率粘合剂之间形成第一扩散界面, 以及矿物颗粒和高折射率层之间的第二扩散界面。

    Back-emitting OLED device and method for homogenizing the luminance of a back-emitting OLED device
    8.
    发明授权
    Back-emitting OLED device and method for homogenizing the luminance of a back-emitting OLED device 有权
    背面发射OLED器件和用于均衡反向发射OLED器件的亮度的方法

    公开(公告)号:US09252386B2

    公开(公告)日:2016-02-02

    申请号:US14369266

    申请日:2012-12-28

    Abstract: An OLED device includes a transparent anode, of sheet resistance R1, and a cathode, of sheet resistance R2, the ratio r=R2/R1 ranging from 0.01 to 2.5, a first anode electrical contact, a first cathode electrical contact, arranged above the active zone, and a reflector covering the active zone above an OLED system, and for each point B of the anode contact, the point B being in an edge of the first anodic region, on defining a distance D between B and the point C closest to the point B, and on defining a distance L between the point B and a point X of an opposite edge of the first anodic region from the first edge, and passing through Ci the following criteria are defined: if 0.01≦r

    Abstract translation: OLED器件包括薄层电阻R1的透明阳极和薄层电阻R2的阴极,比率r = R2 / R1的范围为0.01至2.5,第一阳极电接触,第一阴极电接触,布置在 活动区域和覆盖OLED系统上方的活动区域的反射器,并且对于阳极触点的每个点B,点B位于第一阳极区域的边缘中,在B和最接近的点C之间限定距离D 到点B,并且在从第一边缘定义点B和第一阳极区域的相对边缘的点X之间的距离L,并且通过Ci,定义以下标准:如果0.01&lt; N1; r <0.1 ,如果为0.5&nlE; r <1,则10%

    TRANSPARENT SUPPORTED ELECTRODE FOR AN OLED
    9.
    发明申请
    TRANSPARENT SUPPORTED ELECTRODE FOR AN OLED 审中-公开
    用于OLED的透明支持电极

    公开(公告)号:US20150001520A1

    公开(公告)日:2015-01-01

    申请号:US14377657

    申请日:2013-02-07

    Abstract: An OLED electrode includes a transparent or translucent non-conductive substrate, with a refractive index between 1.3 and 1.6. A continuous network of lines of a metal or alloy with electrical conductivity at least 5·106 S·m−1 is on a substrate surface. The metal lines have an average width between 0.05 and 3 μm. These metal lines delimit non-metalized fields of average equivalent diameter between 0.1 and 7.0 μm. At least 20% of the metal lines' surface has a tangent forming an angle between 15 and 75° relative to a substrate-electrode plane. A transparent or translucent layer completely covers the metal lines and non-metalized fields. The layer has refractive index between 1.6 and 2.4 and resistivity greater than that of the metal lines and less than 104 Ω·cm. The metal lines and the transparent or translucent layer form a composite layer called an electrode layer.

    Abstract translation: OLED电极包括透明或半透明的非导电衬底,折射率在1.3和1.6之间。 具有至少5·106S·m-1的导电性的金属或合金的线的连续网络位于基板表面上。 金属线的平均宽度为0.05〜3μm。 这些金属线限定了平均当量直径在0.1和7.0μm之间的非金属化场。 至少20%的金属线表面具有相对于基板 - 电极平面形成15至75°角的切线。 透明或半透明的层完全覆盖金属线和非金属场。 该层的折射率在1.6和2.4之间,电阻率大于金属线的折射率,小于104&OHgr。·cm。 金属线和透明或半透明层形成称为电极层的复合层。

    Laminated glazing
    10.
    发明授权

    公开(公告)号:US11472162B2

    公开(公告)日:2022-10-18

    申请号:US16964817

    申请日:2019-01-23

    Abstract: A laminated glazing includes a first sheet of a colored glass and a second sheet of a clear glass which are joined together by a lamination interlayer, the first sheet having a thickness el ranging from 1.5 to 2.5 mm, the second sheet having a thickness e2 ranging from 0.4 to 1.9 mm, the ratio R=e2/e12 being at most 0.40 mm−1, the glazing having a light transmission of at least 70% and a direct solar transmission of at most 55%, the colored glass having a chemical composition including a weight content of total iron, expressed in the form Fe2O3, ranging from 1.1 to 2.0%, with a redox ratio, defined as the ratio between the weight content of ferrous iron, expressed in the form FeO, and the weight content of total iron, expressed in the form Fe2O3, ranging from 0.23 to 0.32.

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