Method of producing a transparent diffusive OLED substrate
    2.
    发明授权
    Method of producing a transparent diffusive OLED substrate 有权
    制造透明扩散OLED基板的方法

    公开(公告)号:US09391300B2

    公开(公告)日:2016-07-12

    申请号:US14431444

    申请日:2013-09-24

    摘要: A method of producing a transparent diffusive OLED substrate includes lapping one face or both faces of a flat translucent glass substrate with an abrasive slurry, so as to obtain a flat glass substrate with at least one roughened surface having a roughness profile with an arithmetical mean deviation Ra of between 0.1 μm and 2.0 μm; coating the roughened surface or one of the roughened surfaces with a high index glass frit having a refractive index of at least 1.7, the amount of the high index glass frit being sufficient to completely cover the roughness profile of the roughened surface after melting of the frit, and heating the coated substrate to a temperature above the melting temperature of the high index glass frit and below the softening temperature of the underlying substrate, so as to form high index enamel on one of the roughened surfaces.

    摘要翻译: 制造透明扩散OLED基板的方法包括用研磨浆料研磨平坦半透明玻璃基板的一面或两面,以获得具有至少一个具有粗糙度轮廓的粗糙表面的平坦玻璃基板,其具有算术平均偏差 Ra在0.1μm和2.0μm之间; 用折射率为至少为1.7的高折射率玻璃料涂覆粗糙表面或粗糙表面之一,高折射率玻璃料的量足以完全覆盖玻璃料熔化后粗糙表面的粗糙度轮廓 并且将涂覆的基材加热到高于高折射率玻璃料的熔融温度并低于下面的基材的软化温度的温度,以便在其中一个粗糙化表面上形成高折射率的搪瓷。

    Layered structure for an OLED and a method for producing such a structure

    公开(公告)号:US10367142B2

    公开(公告)日:2019-07-30

    申请号:US15566447

    申请日:2016-03-23

    IPC分类号: H01L51/00 H01L51/52

    摘要: A layered structure suitable as a support for an organic light emitting device (OLED), includes a light-transmissive glass substrate, a diffusive internal extraction layer (IEL) with an outer layer made of a glass containing at least 30 weight % of Bi2O3, formed on one side of the light-transmissive glass substrate, and an acid-resistant barrier layer formed on the IEL. The acid-resistant barrier layer has a bilayer structure made of an ALD-deposited metal oxide layer, the metal oxide being selected from the group consisting of aluminum oxide (Al2O3), titanium oxide (TiO2), zirconium oxide (ZrO2) and hafnium oxide (HfO2), in contact with the IEL, and a sputter-deposited SiOxNy layer in contact with the ALD-deposited metal oxide layer.

    Transparent diffusive OLED substrate and method for producing such a substrate
    4.
    发明授权
    Transparent diffusive OLED substrate and method for producing such a substrate 有权
    透明扩散OLED基板及其制造方法

    公开(公告)号:US09412958B2

    公开(公告)日:2016-08-09

    申请号:US14897781

    申请日:2014-06-13

    摘要: A transparent diffusive OLED substrate includes the following successive elements or layers: (a) a transparent flat substrate made of mineral glass having a refractive index n1 of between 1.48 and 1.58, (b) a monolayer of mineral particles attached to one side of the substrate by means of a low index mineral binder having a refractive index n2 of between 1.45 and 1.61, and (c) a high index layer made of an enamel having a refractive index n4 between 1.82 and 2.10 covering the monolayer of mineral particles, the mineral particles having a refractive index n3 between n2+0.08 and n4−0.08 and protruding from the low index mineral binder so as to be directly in contact with the high index layer, thereby forming a first diffusive interface between the mineral particles and the low index binder, and a second diffusive interface between the mineral particles and the high index layer.

    摘要翻译: 透明扩散OLED基板包括以下连续元件或层:(a)由折射率n1在1.48和1.58之间的矿物玻璃制成的透明平坦基板,(b)附着在基板一侧的单层矿物颗粒 通过折射率n2在1.45和1.61之间的低折射率矿物粘合剂,和(c)由覆盖单层矿物颗粒的折射率n4在1.82和2.10之间的搪瓷制成的高折射率层,矿物颗粒 具有n2 + 0.08和n4-0.08之间的折射率n3并且从低折射率矿物粘合剂突出,以便与高折射率层直接接触,从而在矿物颗粒和低折射率粘合剂之间形成第一扩散界面, 以及矿物颗粒和高折射率层之间的第二扩散界面。

    METHOD OF PRODUCING A TRANSPARENT DIFFUSIVE OLED SUBSTRATE
    7.
    发明申请
    METHOD OF PRODUCING A TRANSPARENT DIFFUSIVE OLED SUBSTRATE 有权
    生产透明有机OLED基板的方法

    公开(公告)号:US20150255753A1

    公开(公告)日:2015-09-10

    申请号:US14431444

    申请日:2013-09-24

    摘要: A method of producing a transparent diffusive OLED substrate includes lapping one face or both faces of a flat translucent glass substrate with an abrasive slurry, so as to obtain a flat glass substrate with at least one roughened surface having a roughness profile with an arithmetical mean deviation Ra of between 0.1 μm and 2.0 μm; coating the roughened surface or one of the roughened surfaces with a high index glass frit having a refractive index of at least 1.7, the amount of the high index glass frit being sufficient to completely cover the roughness profile of the roughened surface after melting of the frit, and heating the coated substrate to a temperature above the melting temperature of the high index glass frit and below the softening temperature of the underlying substrate, so as to form high index enamel on one of the roughened surfaces.

    摘要翻译: 制造透明扩散OLED基板的方法包括用研磨浆料研磨平坦半透明玻璃基板的一面或两面,以获得具有至少一个具有粗糙度轮廓的粗糙表面的平坦玻璃基板,其具有算术平均偏差 Ra在0.1μm和2.0μm之间; 用折射率为至少为1.7的高折射率玻璃料涂覆粗糙表面或粗糙表面之一,高折射率玻璃料的量足以完全覆盖玻璃料熔化后粗糙表面的粗糙度轮廓 并且将涂覆的基材加热到高于高折射率玻璃料的熔融温度并低于下面的基材的软化温度的温度,以便在其中一个粗糙化表面上形成高折射率的搪瓷。