Abstract:
A thin film transistor including a substrate; a semiconductor layer disposed over the substrate; a gate insulting film disposed over the semiconductor layer; and a gate electrode. The semiconductor layer includes a channel region, a source region, and a drain region. The gate insulating film includes a first region and a second region. The second region borders the first region. The gate electrode is disposed over the first region. A step shape is formed where the second region meets the first region.
Abstract:
A thin film transistor includes: a substrate, a semiconductor layer disposed on the substrate, a first gate electrode and a second gate electrode disposed on the semiconductor layer, a gate insulating layer disposed between the semiconductor layer and the first and second gate electrodes and having a first through hole between the first and second gate electrodes and a capping layer covering the first gate electrode and contacting the semiconductor layer via the first through hole. The capping layer includes a conductive material.
Abstract:
A display panel includes: a first gate line extending in a first direction; a second gate line extending in the first direction and spaced apart from the first gate line in a second direction crossing the first direction; a first connection line extending in the second direction; and a second connection line extending in the second direction and spaced apart from the first connection line in the first direction, wherein a distal end of the first connection line overlaps the first gate line and is electrically connected to the first gate line, and wherein a distal end of the second connection line overlaps the second gate line and is electrically connected to the second gate line.
Abstract:
A thin film transistor including a substrate; a semiconductor layer disposed over the substrate; a gate insulting film disposed over the semiconductor layer; and a gate electrode. The semiconductor layer includes a channel region, a source region, and a drain region. The gate insulating film includes a first region and a second region. The second region borders the first region. The gate electrode is disposed over the first region. A step shape is formed where the second region meets the first region.