公开(公告)号：US20250104915A1

公开(公告)日：2025-03-27

申请号：US18733071

申请日：2024-06-04

Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.

Inventor： Dae Jin SHIM ,  Jung Jin PARK ,  Jung Jin PARK ,  Jae Won KIM ,  Hyo Sung CHOI ,  Nam Ju YOO ,  Jung Hee KIM ,  Jong Ho LEE

IPC: H01G4/008 ,  C04B37/00 ,  C04B41/45 ,  C04B41/51 ,  C08K5/42 ,  C09D5/16 ,  C09D7/63 ,  C09D183/08 ,  H01G4/12 ,  H01G4/30

Abstract: A release film including: a base film; and a release layer disposed on one surface of the base film, wherein the release layer is a cured layer of a release composition including a heterocyclic compound including nitrogen and polydimethylsiloxane, and when analyzing a surface using X-ray photoelectron spectroscopy (XPS), the release layer has an atomic ratio of nitrogen (N) to silicon (Si) (N/Si) of 0.6 to 1.1.