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公开(公告)号:US20220171284A1
公开(公告)日:2022-06-02
申请号:US17238355
申请日:2021-04-23
发明人: Eunkyung LEE , Sumin KIM , Hyunwoo KIM , Juhyeon PARK , Giyoung SONG , Sukkoo HONG , Yoonhyun KWAK , Youngmin NAM , Byunghee SOHN , Sunyoung LEE , Aram JEON , Sungwon CHOI
IPC分类号: G03F7/004 , G03F7/038 , G03F7/039 , C07C381/12 , C07C309/12 , C07D333/76
摘要: Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1: wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.
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公开(公告)号:US20230131429A1
公开(公告)日:2023-04-27
申请号:US17730532
申请日:2022-04-27
发明人: Jiyup KIM , Hyunwoo KIM , Hyun-Ji SONG , Juyoung KIM , Jinjoo KIM , Sunghwan PARK , Giyoung SONG
IPC分类号: G03F7/004 , C07C381/12 , C07C309/12 , H01L21/027
摘要: A photo-decomposable compound, a photoresist composition including the photo-decomposable compound, and a method of manufacturing an integrated circuit (IC) device using the photoresist composition, the photo-decomposable compound including a phenyl sulfonium cation component; and an anion component, wherein the phenyl sulfonium cation component has a protecting group, which is decomposable by an action of acid to generate an alkali-soluble group in response to exposure, the anion component generates acid in response to exposure, the protecting group is represented by *—C(═O)OR, in which R is a substituted or unsubstituted t-butyl group or a substituted or unsubstituted C3 to C30 alicyclic group, and * is a bonding site, and the protecting group is bonded to a phenyl group of the phenyl sulfonium cation component through an ether linking group.
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