-
公开(公告)号:US20210223692A1
公开(公告)日:2021-07-22
申请号:US16994957
申请日:2020-08-17
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Hyunji SONG , Sukkoo HONG , Sumin KIM , Yechan KIM , Juyoung KIM , Jinjoo KIM , Hyunwoo KIM , Juhyeon PARK , Songse YI
IPC: G03F7/004 , G03F7/039 , C07D277/26 , C07D263/32 , C07D233/64 , C07D213/68
Abstract: A photo-decomposable compound, a photoresist composition, and a method of manufacturing an IC device, the compound generating acid upon exposure and acts as a quenching base that neutralizes acid in an unexposed state and being represented by Formula 1: wherein, in Formula 1, Ra is a C5 to C40 substituted or unsubstituted cyclic hydrocarbon group including at least one nitrogen atom, Ya is a C1 to C20 divalent linear or cyclic hydrocarbon group, n is an integer of 1 to 5, and A+ is a counter ion.
-
公开(公告)号:US20230050295A1
公开(公告)日:2023-02-16
申请号:US17975097
申请日:2022-10-27
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Jinjoo KIM , Kwangmo YANG , Siho JANG
IPC: H05B6/76
Abstract: According to various embodiments of the disclosure, a microwave oven may include: a main body including a cooking chamber and a front panel; a door to the main body including a door frame corresponding to the front panel; and a shielding device connected to the door to shield electromagnetic waves leaking from the cooking chamber. The shielding device may include: a choke unit extending from the door frame and including a plurality of portions constructed by being bent at least once; and a choke covering the choke unit. The choke cover may include a first portion constructed of a first material coupled to a portion of the choke unit; and a second portion connected integrally with the first portion and constructed of a second material different from the first material.
-
公开(公告)号:US20210255544A1
公开(公告)日:2021-08-19
申请号:US17003414
申请日:2020-08-26
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Yechan KIM , Suk Koo HONG , Su Min KIM , Ju-Young KIM , Jinjoo KIM , Hyunwoo KIM , Juhyeon PARK , Hyunji SONG , Songse YI
Abstract: A resist composition including a polymer; a photoacid generator; and a material represented by Formula 1:
-
公开(公告)号:US20210263411A1
公开(公告)日:2021-08-26
申请号:US16991281
申请日:2020-08-12
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Yechan KIM , Su Min KIM , Ju-Young KIM , Jinjoo KIM , Hyunwoo KIM , Juhyeon PARK , Hyunji SONG , Songse YI , Suk Koo HONG
IPC: G03F7/004 , C08L25/06 , C07C381/12 , C08L35/00
Abstract: A resist composition including a polymer; and a compound represented by Formula 1, in Formula 1, R1 is hydrogen, a halogen, an alkyl group having 1 to 7 carbon atoms, a carbonyl group having 1 to 7 carbon atoms, an ester group having 1 to 7 carbon atoms, an acetal group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, an ether group having 1 to 7 carbon atoms, or a group represented by Formula R, and R2, R3, R4 and R5 are hydrogen, a halogen, an alkyl group having 1 to 7 carbon atoms, an ester group having 1 to 7 carbon atoms, an acetal group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, or an ether group having 1 to 7 carbon atoms,
-
公开(公告)号:US20210240079A1
公开(公告)日:2021-08-05
申请号:US17003373
申请日:2020-08-26
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Juhyeon PARK , Su Min KIM , Yechan KIM , Ju-Young KIM , Jinjoo KIM , Hyunwoo KIM , Hyunji SONG , Songse YI , Suk Koo HONG
IPC: G03F7/038 , G03F7/004 , G03F7/38 , H01L21/027 , H01L21/3213 , G03F7/20
Abstract: A photolithography method and a method of manufacturing a semiconductor device, the photolithography method including applying a composition on a substrate to form a photoresist layer; performing an exposing process using extreme ultraviolet radiation (EUV) on the photoresist layer; and developing the photoresist layer to form photoresist patterns, wherein the composition includes a photosensitive resin, a photo-acid generator, a photo decomposable quencher, an additive, and a solvent, and the additive is a compound represented by the following Formula 4A: in Formula 4A, R1 to R5 are each independently hydrogen or iodine, at least one of R1 to R5 being iodine.
-
公开(公告)号:US20230131429A1
公开(公告)日:2023-04-27
申请号:US17730532
申请日:2022-04-27
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Jiyup KIM , Hyunwoo KIM , Hyun-Ji SONG , Juyoung KIM , Jinjoo KIM , Sunghwan PARK , Giyoung SONG
IPC: G03F7/004 , C07C381/12 , C07C309/12 , H01L21/027
Abstract: A photo-decomposable compound, a photoresist composition including the photo-decomposable compound, and a method of manufacturing an integrated circuit (IC) device using the photoresist composition, the photo-decomposable compound including a phenyl sulfonium cation component; and an anion component, wherein the phenyl sulfonium cation component has a protecting group, which is decomposable by an action of acid to generate an alkali-soluble group in response to exposure, the anion component generates acid in response to exposure, the protecting group is represented by *—C(═O)OR, in which R is a substituted or unsubstituted t-butyl group or a substituted or unsubstituted C3 to C30 alicyclic group, and * is a bonding site, and the protecting group is bonded to a phenyl group of the phenyl sulfonium cation component through an ether linking group.
-
公开(公告)号:US20220344073A1
公开(公告)日:2022-10-27
申请号:US17860105
申请日:2022-07-08
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Bumhee BAE , Jinjoo KIM , Jongwan SHIM
IPC: H01B7/04 , H01B7/08 , H01B13/008 , H01B11/00 , G02B6/42
Abstract: A flexible flat cable includes a highly reflective member having a plate shape, light-transmitting signal transmission members spaced apart from each other on a first surface of the highly reflective member, conductive signal transmission members spaced apart from each other on the first surface of the highly reflective member, a highly reflective adhesive member that fixes the light-transmitting signal transmission members and the conductive signal transmission members to the highly reflective member, and couples the highly reflective member to a non-conductive member, the non-conductive member including a first surface in contact with the highly reflective adhesive member, and a second surface opposite to the first surface of the non-conductive member, an adhesive member that is disposed on the second surface of the non-conductive member, and couples an electrical shield member to the non-conductive member, and the electrical shield member coupled to the non-conductive member by the adhesive member.
-
8.
公开(公告)号:US20230194985A1
公开(公告)日:2023-06-22
申请号:US18076818
申请日:2022-12-07
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Jinjoo KIM , Sumin KIM , Hyunwoo KIM , Yechan KIM , Juyoung KIM , Jicheol PARK , Giyoung SONG , Suk Koo HONG
IPC: G03F7/039 , H01L21/027
CPC classification number: G03F7/0392 , H01L21/0276 , H01L21/0275
Abstract: A brush polymer for a photoresist, a photoresist composition, and a method of manufacturing an integrated circuit device, the brush polymer including a core and a plurality of side polymer chains, the plurality of side polymer chains being bonded to the core and extending from the core to form a bottle-brush polymer or a star-brush polymer, together with the core, wherein each of the plurality of side polymer chains includes a first repeating unit represented by Formula 1 and a second repeating unit represented by Formula 2:
-
公开(公告)号:US20230120542A1
公开(公告)日:2023-04-20
申请号:US18080348
申请日:2022-12-13
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Sumin KIM , Hyunwoo KIM , Sukkoo HONG , Yechan KIM , Juyoung KIM , Jinjoo KIM , Juhyeon PARK , Hyunji SONG , Songse YI
IPC: G03F7/004 , C07C381/12 , G03F7/039 , C07C309/12
Abstract: A photo-decomposable compound includes an anion component including an adamantyl group and a cation component including a C5 to C40 cyclic hydrocarbon group and forming a complex with the anion component. At least one of the adamantyl group and the cyclic hydrocarbon group has a substituent, which decomposes by acid and generates an alkali soluble group. The substituent includes an acid-labile protecting group. A photoresist composition includes a chemically amplified polymer, the photo-decomposable compound, and a solvent. To manufacture an integrated circuit (IC) device, a photoresist film is formed using the photoresist composition on a feature layer, a first area of the photoresist film is exposed to generate a plurality of acids from the photo-decomposable compound in the first area, the chemically amplified polymer is deprotected due to the plurality of acids, and the first area is removed to form a photoresist pattern.
-
公开(公告)号:US20210240078A1
公开(公告)日:2021-08-05
申请号:US17005636
申请日:2020-08-28
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Sumin KIM , Hyunwoo KIM , Sukkoo HONG , Yechan KIM , Juyoung KIM , Jinjoo KIM , Juhyeon PARK , Hyunji SONG , Songse YI
IPC: G03F7/004 , C07C381/12 , C07C309/12 , G03F7/039
Abstract: A photo-decomposable compound includes an anion component including an adamantyl group and a cation component including a C5 to C40 cyclic hydrocarbon group and forming a complex with the anion component. At least one of the adamantyl group and the cyclic hydrocarbon group has a substituent, which decomposes by acid and generates an alkali soluble group. The substituent includes an acid-labile protecting group. A photoresist composition includes a chemically amplified polymer, the photo-decomposable compound, and a solvent. To manufacture an integrated circuit (IC) device, a photoresist film is formed using the photoresist composition on a feature layer, a first area of the photoresist film is exposed to generate a plurality of acids from the photo-decomposable compound in the first area, the chemically amplified polymer is deprotected due to the plurality of acids, and the first area is removed to form a photoresist pattern.
-
-
-
-
-
-
-
-
-