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公开(公告)号：US20210223692A1
公开(公告)日：2021-07-22
申请号：US16994957
申请日：2020-08-17
发明人： Hyunji SONG , Sukkoo HONG , Sumin KIM , Yechan KIM , Juyoung KIM , Jinjoo KIM , Hyunwoo KIM , Juhyeon PARK , Songse YI
IPC分类号： G03F7/004 , G03F7/039 , C07D277/26 , C07D263/32 , C07D233/64 , C07D213/68
摘要： A photo-decomposable compound, a photoresist composition, and a method of manufacturing an IC device, the compound generating acid upon exposure and acts as a quenching base that neutralizes acid in an unexposed state and being represented by Formula 1: wherein, in Formula 1, Ra is a C5 to C40 substituted or unsubstituted cyclic hydrocarbon group including at least one nitrogen atom, Ya is a C1 to C20 divalent linear or cyclic hydrocarbon group, n is an integer of 1 to 5, and A+ is a counter ion.
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2.发明申请公开(公告)号：US20220116198A1
公开(公告)日：2022-04-14
申请号：US17336625
申请日：2021-06-02
发明人： Hanbyeul NA , Sumin KIM , Hongrak SON , Junho SHIN
摘要： A homomorphic operation accelerator includes a plurality of circuits and a homomorphic operation managing circuit. The plurality of circuits may perform homomorphic operations. The homomorphic operation managing circuit may receive ciphertext data, homomorphic encryption information and homomorphic operation information from an external device. The homomorphic operation managing circuit may activate or deactivate each of a plurality of enable signals applied to the plurality of circuits based on the homomorphic encryption information and the homomorphic operation information. The homomorphic operation managing circuit may activate or deactivate each of the plurality of circuits based on the plurality of enable signals. The homomorphic encryption information may be associated with a homomorphic encryption algorithm used to generate the ciphertext data. The homomorphic operation information may be associated with the homomorphic operations to be performed on the ciphertext data.
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公开(公告)号：US20210067825A1
公开(公告)日：2021-03-04
申请号：US16959340
申请日：2018-12-19
发明人： Sungmin LIM , Changwon CHOI , Sumin KIM , Younghyun KIM , Youngin PARK , Hanjin PARK , Seockyoung SHIM , Taehoon LEE
IPC分类号： H04N21/431 , G06F3/0483 , H04N21/4782 , G06F3/0482
摘要： The disclosure provides a display device and a content providing method thereof. The content providing method of the display device includes: displaying a list including a plurality of web pages pre-selected by a user; and displaying, in case that a user command for selecting one of the plurality of web pages is input, a reconstructed content obtained by reconstructing the selected web page based on a type of the selected web page.
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公开(公告)号：US20230120542A1
公开(公告)日：2023-04-20
申请号：US18080348
申请日：2022-12-13
发明人： Sumin KIM , Hyunwoo KIM , Sukkoo HONG , Yechan KIM , Juyoung KIM , Jinjoo KIM , Juhyeon PARK , Hyunji SONG , Songse YI
IPC分类号： G03F7/004 , C07C381/12 , G03F7/039 , C07C309/12
摘要： A photo-decomposable compound includes an anion component including an adamantyl group and a cation component including a C5 to C40 cyclic hydrocarbon group and forming a complex with the anion component. At least one of the adamantyl group and the cyclic hydrocarbon group has a substituent, which decomposes by acid and generates an alkali soluble group. The substituent includes an acid-labile protecting group. A photoresist composition includes a chemically amplified polymer, the photo-decomposable compound, and a solvent. To manufacture an integrated circuit (IC) device, a photoresist film is formed using the photoresist composition on a feature layer, a first area of the photoresist film is exposed to generate a plurality of acids from the photo-decomposable compound in the first area, the chemically amplified polymer is deprotected due to the plurality of acids, and the first area is removed to form a photoresist pattern.
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公开(公告)号：US20220171284A1
公开(公告)日：2022-06-02
申请号：US17238355
申请日：2021-04-23
发明人： Eunkyung LEE , Sumin KIM , Hyunwoo KIM , Juhyeon PARK , Giyoung SONG , Sukkoo HONG , Yoonhyun KWAK , Youngmin NAM , Byunghee SOHN , Sunyoung LEE , Aram JEON , Sungwon CHOI
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , C07C381/12 , C07C309/12 , C07D333/76
摘要： Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1: wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.
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公开(公告)号：US20210240078A1
公开(公告)日：2021-08-05
申请号：US17005636
申请日：2020-08-28
发明人： Sumin KIM , Hyunwoo KIM , Sukkoo HONG , Yechan KIM , Juyoung KIM , Jinjoo KIM , Juhyeon PARK , Hyunji SONG , Songse YI
IPC分类号： G03F7/004 , C07C381/12 , C07C309/12 , G03F7/039
摘要： A photo-decomposable compound includes an anion component including an adamantyl group and a cation component including a C5 to C40 cyclic hydrocarbon group and forming a complex with the anion component. At least one of the adamantyl group and the cyclic hydrocarbon group has a substituent, which decomposes by acid and generates an alkali soluble group. The substituent includes an acid-labile protecting group. A photoresist composition includes a chemically amplified polymer, the photo-decomposable compound, and a solvent. To manufacture an integrated circuit (IC) device, a photoresist film is formed using the photoresist composition on a feature layer, a first area of the photoresist film is exposed to generate a plurality of acids from the photo-decomposable compound in the first area, the chemically amplified polymer is deprotected due to the plurality of acids, and the first area is removed to form a photoresist pattern.
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