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公开(公告)号:US20170301591A1
公开(公告)日:2017-10-19
申请号:US15635188
申请日:2017-06-27
Applicant: Samsung Electronics Co., Ltd.
Inventor: SANG-YOUNG KIM , KYUNG-SOO RHO , HO-JEONG MOON , HYUCK SHIN , SUN-NYEONG JUNG
IPC: H01L21/66 , H01L25/065 , H01L23/00 , H01L23/31 , G01N23/04
CPC classification number: H01L22/12 , G01N23/04 , G21K1/10 , H01L23/3114 , H01L24/48 , H01L25/0657 , H01L2224/48091 , H01L2224/48153 , H01L2224/48227 , H01L2224/8592 , H01L2924/00014 , H01L2924/15184 , H01L2224/45099
Abstract: An X-ray source is disposed and a detector is disposed adjacent to the X-ray source. A test specimen holder is disposed between the X-ray source and the detector. A filter is disposed between the X-ray source and the test specimen holder. The filter has a plate-shaped semiconductor, a granular semiconductor, or a combination thereof.
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公开(公告)号:US20220070992A1
公开(公告)日:2022-03-03
申请号:US17242022
申请日:2021-04-27
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: SUNGHO JANG , YOONJAE KIM , HYUCK SHIN , DONGHYUB LEE , KUL INN
Abstract: A method of manufacturing a semiconductor includes generating plasma in an amplifying tube using gas as a gain medium; detecting a state of the plasma generated in the amplifying tube; determining a virtual laser gain based on the detected state of the plasma; controlling the state of the plasma such that the virtual laser gain is within a target range; and manufacturing the semiconductor device including performing an exposure process on a substrate using a laser beam output from the amplifying tube adjusted to have the virtual laser gain within the target range.
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