公开(公告)号：US20140264089A1

公开(公告)日：2014-09-18

申请号：US14097644

申请日：2013-12-05

Applicant: Samsung Electronics Co., Ltd.

Inventor： In-Sung Kim ,  Ho-Yeon Kim ,  Ho-Chul Kim ,  Seung-Koo Lee ,  Jin-Ho Jeon

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H01S3/2232 ,  H01S3/2316

Abstract: An apparatus and method for generating extreme ultra violet EUV radiation includes a light source providing light to a laser medium to generate a first laser, a droplet generator to provide a droplet to reflect the first laser to one end of the laser medium, a laser generator positioned at the opposite end of the laser medium from that of the droplet and a second laser to expand the droplet or not and to thereby control the conversion efficiency and dose of the EUV generation apparatus.

Abstract translation: 用于产生极端紫外EUV辐射的装置和方法包括：向激光介质提供光以产生第一激光的光源;液滴发生器，用于提供液滴以将第一激光反射到激光介质的一端;激光发生器 位于激光介质的另一端和液滴的另一端，第二激光器不扩散液滴，从而控制EUV产生装置的转换效率和剂量。

公开(公告)号：US09658522B2

公开(公告)日：2017-05-23

申请号：US14814763

申请日：2015-07-31

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sang-Hyun Kim ,  Dong-Wan Kim ,  Chang-Min Park ,  In-Sung Kim ,  Dong-Gun Lee

IPC: G03F1/24

CPC classification number: G03F1/24

Abstract: A reflective extreme ultraviolet (EUV) mask includes a mask substrate, a reflecting layer on an upper surface of the mask substrate, and an absorbing layer pattern on an upper surface of the reflecting layer, the absorbing layer pattern having an exposing region and a peripheral region, and the absorbing layer pattern including a grating pattern in the peripheral region to reduce reflectivity of light incident on the peripheral region.