公开(公告)号：US20170103154A1

公开(公告)日：2017-04-13

申请号：US15251411

申请日：2016-08-30

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： JONG-WOOK JEON ,  JAE-HEE CHOI ,  YOO-HWAN KIM ,  KEUN-HO LEE ,  UI-HUI KWON ,  JONG-CHOL KIM

IPC: G06F17/50

CPC classification number: G06F17/5036 ,  G06F17/505 ,  G06F17/5068 ,  G06F2217/76

Abstract: A circuit design method includes extracting aging information of each of multiple devices from a netlist including one or more devices and a model library including information associated with a process variation. An arithmetic operation is performed using the information associated with the process variation and the aging information to calculate a deviation of the process variation of each device caused by aging. A netlist and/or a model library is extracted in which the calculated deviation is reflected.

公开(公告)号：US20170176859A1

公开(公告)日：2017-06-22

申请号：US15349578

申请日：2016-11-11

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： SOO-YOUNG KIM ,  JAE-HEE CHOI ,  JUNG-HOON LEE ,  BOO-DEUK KIM ,  JOON-JE LEE ,  YOUN-SOO KIM

IPC: G03F7/039 ,  G03F7/038 ,  G03F7/20 ,  H01L21/28 ,  G03F7/32 ,  H01L27/115 ,  H01L29/788 ,  G03F7/004 ,  G03F7/16

CPC classification number: G03F7/039 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/16 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/322 ,  H01L21/28008 ,  H01L27/11519 ,  H01L27/11521 ,  H01L27/11524 ,  H01L29/788

Abstract: A photoresist composition comprises a photosensitive resin including a blend of a photoresist polymer and a dye resin, a photo-acid generator, and a solvent, in which an amount of the dye resin is in a range from about 20 weight percent to about 80 weight percent based on a total weight of the photosensitive resin.