公开(公告)号：US20160315137A1

公开(公告)日：2016-10-27

申请号：US15201704

申请日：2016-07-05

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： SANG-YEOL KANG ,  SUK-JIN CHUNG ,  YOUN-SOO KIM ,  JAE-HYOUNG CHOI ,  JAE-SOON LIM ,  MIN-YOUNG PARK

IPC: H01L49/02 ,  H01L27/108 ,  H01L21/02

CPC classification number: H01L28/60 ,  H01L21/02178 ,  H01L21/02181 ,  H01L21/02189 ,  H01L21/02271 ,  H01L21/0228 ,  H01L21/28194 ,  H01L27/10808 ,  H01L27/10814 ,  H01L27/10855 ,  H01L28/40 ,  H01L29/517 ,  H01L29/78

Abstract: To form a dielectric layer, an organometallic precursor is adsorbed on a substrate loaded into a process chamber. The organometallic precursor includes a central metal and ligands bound to the central metal. An inactive oxidant is provided onto the substrate. The inactive oxidant is reactive with the organometallic precursor. An active oxidant is also provided onto the substrate. The active oxidant has a higher reactivity than that of the inactive oxidant.

Abstract translation: 为了形成电介质层，有机金属前体被吸附在装载到处理室中的基板上。 有机金属前体包括中心金属和与中心金属结合的配体。 在基材上提供无活性氧化剂。 无活性氧化剂与有机金属前体反应。 活性氧化剂也提供到基底上。 活性氧化剂的反应活性高于非活性氧化剂。

公开(公告)号：US20170176859A1

公开(公告)日：2017-06-22

申请号：US15349578

申请日：2016-11-11

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： SOO-YOUNG KIM ,  JAE-HEE CHOI ,  JUNG-HOON LEE ,  BOO-DEUK KIM ,  JOON-JE LEE ,  YOUN-SOO KIM

IPC: G03F7/039 ,  G03F7/038 ,  G03F7/20 ,  H01L21/28 ,  G03F7/32 ,  H01L27/115 ,  H01L29/788 ,  G03F7/004 ,  G03F7/16

CPC classification number: G03F7/039 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/16 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/322 ,  H01L21/28008 ,  H01L27/11519 ,  H01L27/11521 ,  H01L27/11524 ,  H01L29/788

Abstract: A photoresist composition comprises a photosensitive resin including a blend of a photoresist polymer and a dye resin, a photo-acid generator, and a solvent, in which an amount of the dye resin is in a range from about 20 weight percent to about 80 weight percent based on a total weight of the photosensitive resin.