公开(公告)号：US11531277B2

公开(公告)日：2022-12-20

申请号：US17499182

申请日：2021-10-12

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jihoon Na ,  Sungho Kang ,  Jaewhan Sung ,  Hak-Seok Lee ,  Hyunjune Cho

IPC: G03F7/20 ,  G03F1/86

Abstract: An EUV mask inspection system includes a mask receiving unit configured to receive a manufactured EUV mask, a main chamber configured to perform an inspection on the EUV mask, and a load-lock chamber disposed between the mask receiving unit and the main chamber. The load-lock chamber includes a mask table for loading the EUV mask, an UV lamp disposed adjacent the mask table in a first direction, a cold trap disposed adjacent the mask table in a second direction, and a vacuum pump. The first direction is a direction perpendicular to a sidewall of the mask table, and the second direction is a direction perpendicular to a top surface of the mask table. The UV lamp is configured to evaporate water molecules on the EUV mask by irradiating UV light onto the EUV mask. The cold trap is configured to trap the water molecules evaporated from the EUV mask.

公开(公告)号：US11729896B2

公开(公告)日：2023-08-15

申请号：US17468644

申请日：2021-09-07

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jihoon Na ,  Mun Ja Kim ,  Jaewhan Sung ,  Byungchul Yoo ,  Jibeom Yoo ,  Hakseok Lee ,  Myeongjin Jeong ,  Hyunjune Cho

IPC: H05G2/00 ,  G03F7/20 ,  G02B5/20 ,  G02B5/08 ,  G03F7/00

CPC classification number: H05G2/008 ,  G02B5/0891 ,  G02B5/208 ,  G03F7/70033 ,  G03F7/70191 ,  G03F7/70308 ,  G03F7/70958

Abstract: An apparatus for generating extreme ultraviolet (EUV) light includes a raw material supply unit supplying a plasma source for generating EUV light. An EUV light source unit uses a laser to generate plasma from the plasma source. A filter is configured to extract EUV light from the light. A first protective layer is disposed on a front surface of the filter. A frame having a first region exposing at least a portion of the filter or the first protective layer is disposed on the first protective layer. A width of the first region is smaller than a width of the first protective layer and smaller than or equal to a width of the filter.

公开(公告)号：US20230194845A1

公开(公告)日：2023-06-22

申请号：US18056984

申请日：2022-11-18

Applicant: Samsung Electronics Co., Ltd.

Inventor： Garam Choi ,  Taejoong Kim ,  Jihoon Na ,  Changhoon Choi

IPC: G02B21/14 ,  G02B21/28 ,  G02B21/36 ,  G02B27/28 ,  G02B26/08 ,  G03F7/20

CPC classification number: G02B21/14 ,  G02B21/28 ,  G02B21/361 ,  G02B27/283 ,  G02B26/0816 ,  G03F7/7065

Abstract: An EUV photomask inspection apparatus includes a plurality of optical systems respectively forming different confocal points in a mask structure including an EUV photomask and a pellicle on the EUV photomask. A first optical system among the plurality of optical systems includes a first light source emitting first light having a wavelength in a visible light range, a beam splitter transmitting or reflecting the first light, an objective lens configured to allow the first light to pass through at least a portion of the mask structure to form a first focus in the mask structure, a first light detector configured to detect first reflected light reflected from the mask structure by the incident first light, and a pinhole plate in front of the first light source. The first light detector includes a detection module including a PMT and an APD, and a thermoelectric cooling.

公开(公告)号：US20220283519A1

公开(公告)日：2022-09-08

申请号：US17499182

申请日：2021-10-12

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jihoon Na ,  Sungho Kang ,  Jaewhan Sung ,  Hak-Seok Lee ,  Hyunjune Cho

IPC: G03F7/20 ,  G03F1/86

Abstract: An EUV mask inspection system includes a mask receiving unit configured to receive a manufactured EUV mask, a main chamber configured to perform an inspection on the EUV mask, and a load-lock chamber disposed between the mask receiving unit and the main chamber. The load-lock chamber includes a mask table for loading the EUV mask, an UV lamp disposed adjacent the mask table in a first direction, a cold trap disposed adjacent the mask table in a second direction, and a vacuum pump. The first direction is a direction perpendicular to a sidewall of the mask table, and the second direction is a direction perpendicular to a top surface of the mask table. The UV lamp is configured to evaporate water molecules on the EUV mask by irradiating UV light onto the EUV mask. The cold trap is configured to trap the water molecules evaporated from the EUV mask.