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公开(公告)号：US20170332861A1
公开(公告)日：2017-11-23
申请号：US15670660
申请日：2017-08-07
发明人： Hyun KIM , Sang Won LEE , Dong Suk KO , Jin Hyung PARK , Eung Ryeol SEO , Hyeon Joon OH , Joo Yong LEE , Jae Ho CHOI , Kwang Su HEO
CPC分类号： A47L9/22 , A47L9/0081 , A47L2201/00 , F04D29/4206 , F04D29/444 , F04D29/626 , F05D2250/52
摘要： A cleaning device includes an inhalation unit to generate inhalation force to inhale air into a main body, the inhalation unit comprising: an impeller that is rotatable; an impeller cover having an inlet damper formed therein; and a return channel that is coupled to the impeller cover so that the impeller is capable of being accommodated in the return channel and that is directly coupled to the impeller so that air passing through the impeller is capable of being introduced into the return channel, the return channel comprising: an inner frame; and an outer frame at an outer side of the inner frame so as to be spaced apart from the inner frame.
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公开(公告)号：US20240153792A1
公开(公告)日：2024-05-09
申请号：US18387713
申请日：2023-11-07
发明人： Min Jung KIM , Jin Ah HAN , Hee Hwan KIM , Yong Hoon HONG , Kyoung Suk KIM , Jong Hyeok PARK , Jin Hyung PARK , Dae Hyuk CHUNG , Ji Hoon CHA
IPC分类号： H01L21/67 , H01L21/306
CPC分类号： H01L21/6708 , H01L21/30604
摘要： An apparatus and method for processing a substrate can reduce the concentration of process by-products in a chemical solution. The apparatus includes a substrate rotating device configured to rotate a seated substrate in a spinning manner, a chemical solution supply device configured to supply a chemical solution to the substrate, a chemical solution discharge line configured to discharge the chemical solution having undergone a process to an outside, a chemical solution circulation line configured to circulate the chemical solution having undergone the process to the chemical solution supply device, and a discharged chemical solution selection device configured to discharge a chemical solution containing a first amount of process by-products to the outside through the chemical solution discharge line and to circulate a chemical solution containing a second amount of process by-products through the chemical solution circulation line, wherein the first amount of process by-products is larger than the second amount of process by-products.
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