公开(公告)号：US20240153792A1

公开(公告)日：2024-05-09

申请号：US18387713

申请日：2023-11-07

申请人： SEMES CO., LTD. ,  SAMSUNG ELECTRONICS CO., LTD.

发明人： Min Jung KIM ,  Jin Ah HAN ,  Hee Hwan KIM ,  Yong Hoon HONG ,  Kyoung Suk KIM ,  Jong Hyeok PARK ,  Jin Hyung PARK ,  Dae Hyuk CHUNG ,  Ji Hoon CHA

IPC分类号： H01L21/67 ,  H01L21/306

CPC分类号： H01L21/6708 ,  H01L21/30604

摘要： An apparatus and method for processing a substrate can reduce the concentration of process by-products in a chemical solution. The apparatus includes a substrate rotating device configured to rotate a seated substrate in a spinning manner, a chemical solution supply device configured to supply a chemical solution to the substrate, a chemical solution discharge line configured to discharge the chemical solution having undergone a process to an outside, a chemical solution circulation line configured to circulate the chemical solution having undergone the process to the chemical solution supply device, and a discharged chemical solution selection device configured to discharge a chemical solution containing a first amount of process by-products to the outside through the chemical solution discharge line and to circulate a chemical solution containing a second amount of process by-products through the chemical solution circulation line, wherein the first amount of process by-products is larger than the second amount of process by-products.

公开(公告)号：US20210090911A1

公开(公告)日：2021-03-25

申请号：US17026504

申请日：2020-09-21

申请人： SEMES CO., LTD.

发明人： Yong Hoon HONG ,  Heehwan KIM ,  Ji Young LEE

IPC分类号： H01L21/67 ,  H01L21/687 ,  B08B3/08 ,  B08B13/00

摘要： The inventive concept relates to an apparatus for treating a substrate. The apparatus includes a support unit that supports the substrate and a nozzle unit having a nozzle that dispenses a chemical onto the substrate, in which the nozzle is connected with a ground line, and a variable resistor is provided on the ground line.

公开(公告)号：US20210335596A1

公开(公告)日：2021-10-28

申请号：US17239091

申请日：2021-04-23

申请人： SEMES CO., LTD.

发明人： Yong Hoon HONG ,  Sul LEE ,  Myung A JEON ,  Moonsik CHOI ,  Young Su KIM

IPC分类号： H01L21/02 ,  H01L21/263

摘要： The inventive concept provides a substrate treating apparatus. In an embodiment, the substrate treating apparatus includes a housing having a treatment space for treating a substrate in an interior thereof, a support unit that supports the substrate in the treatment space, a nozzle that supplies a liquid to the substrate positioned on the support unit, a liquid supply unit that supplies the liquid to the nozzle, and a controller that controls the liquid unit, the liquid supply unit includes a tank having an interior space for storing the liquid, and a first circulation line that circulates the liquid stored in the interior space and in which a first heater is installed, and the controller controls the first heater such that the first heater heats the liquid to a first temperature, at which particles in the interior of the liquid are not eluted.

公开(公告)号：US20210130951A1

公开(公告)日：2021-05-06

申请号：US17086061

申请日：2020-10-30

申请人： SEMES CO., LTD.

发明人： Yong Hoon HONG ,  Dohyeon YOON ,  Heehwan KIM ,  Ji Young LEE ,  Young Su KIM

IPC分类号： C23C16/448 ,  C23C16/44 ,  C23C16/52 ,  C23C16/455

摘要： A chemical supply apparatus includes an evaporation unit disposed downstream of a chemical supply source to vaporize supplied chemical thereto, a filter unit disposed downstream of the evaporation unit, wherein the filter unit filters impurities in the vaporized chemical while the vaporized chemical passes through the filter unit, a liquefaction unit disposed downstream of the filter unit to liquefy the vaporized chemical, and a chemical storage tank disposed downstream of the liquefaction unit to store the liquefied chemical therein, wherein an electrode is disposed between the chemical supply source and the liquefaction unit, wherein the electrode electrically reacts with the chemical or particles in the chemical to change electrical properties of the chemical or the particles.