Image sensor
    1.
    发明授权

    公开(公告)号:US11411052B2

    公开(公告)日:2022-08-09

    申请号:US17122070

    申请日:2020-12-15

    IPC分类号: H01L27/30 H01L51/44

    摘要: An image sensor includes an insulating pattern disposed on a semiconductor substrate and having an opening, a color filter disposed within the opening of the insulating pattern, a capping insulating layer disposed on the color filter, a first electrode disposed on the capping insulating layer and having a portion overlapping with the color filter, a separation structure surrounding a side surface of the first electrode, and a photoelectric layer disposed on the first electrode. The separation structure includes a first insulating layer and a second insulating layer formed of different material.

    IMAGE SENSOR CHIP
    2.
    发明申请

    公开(公告)号:US20210351220A1

    公开(公告)日:2021-11-11

    申请号:US17134699

    申请日:2020-12-28

    IPC分类号: H01L27/146

    摘要: An image sensor chip includes a lower chip, an upper chip stacked on the lower chip and including a photoelectric element, a via hole penetrating through the upper chip and penetrating through at least a portion of the lower chip, and a conductive connection layer electrically connecting the lower chip and the upper chip to each other in the via hole. The upper chip includes an upper substrate, an upper isolation layer and an upper element on the upper substrate, a connection contact plug, and a multilayer interconnection line electrically connected to the connection contact plug. A distance between an upper surface of the connection contact plug and an upper surface of the upper isolation layer is greater than a distance between an upper surface of an upper gate electrode of the upper element and an upper surface of the upper isolation layer.

    IMAGE SENSOR
    3.
    发明申请

    公开(公告)号:US20210104577A1

    公开(公告)日:2021-04-08

    申请号:US17122070

    申请日:2020-12-15

    IPC分类号: H01L27/30 H01L51/44

    摘要: An image sensor includes an insulating pattern disposed on a semiconductor substrate and having an opening, a color filter disposed within the opening of the insulating pattern, a capping insulating layer disposed on the color filter, a first electrode disposed on the capping insulating layer and having a portion overlapping with the color filter, a separation structure surrounding a side surface of the first electrode, and a photoelectric layer disposed on the first electrode. The separation structure includes a first insulating layer and a second insulating layer formed of different material.

    Image sensor chip
    4.
    发明授权

    公开(公告)号:US11776982B2

    公开(公告)日:2023-10-03

    申请号:US17134699

    申请日:2020-12-28

    IPC分类号: H01L27/146 H01L25/065

    摘要: An image sensor chip includes a lower chip, an upper chip stacked on the lower chip and including a photoelectric element, a via hole penetrating through the upper chip and penetrating through at least a portion of the lower chip, and a conductive connection layer electrically connecting the lower chip and the upper chip to each other in the via hole. The upper chip includes an upper substrate, an upper isolation layer and an upper element on the upper substrate, a connection contact plug, and a multilayer interconnection line electrically connected to the connection contact plug. A distance between an upper surface of the connection contact plug and an upper surface of the upper isolation layer is greater than a distance between an upper surface of an upper gate electrode of the upper element and an upper surface of the upper isolation layer.