公开(公告)号：US20250147096A1

公开(公告)日：2025-05-08

申请号：US18790237

申请日：2024-07-31

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jaewon Yang ,  Younghoon Sohn ,  Souk Kim ,  Jaeho Kim ,  Jongbeom Kim ,  HyeonBo Shim ,  Minho Rim

IPC: G01R31/265

Abstract: A substrate inspection apparatus includes a laser light source configured to emit a laser beam, an optical splitter configured to split the laser beam into a first laser beam and a second laser beam, a delay stage configured to change a relative time delay of the second laser beam and optically connected to the optical splitter, a first modulator optically connected to the optical splitter and configured to change the first laser beam, and a feedback system configured to sense the second laser beam reflected from a substrate and configured to apply electrical feedback to the first modulator.

公开(公告)号：US11988495B2

公开(公告)日：2024-05-21

申请号：US17156049

申请日：2021-01-22

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Kwangsoo Kim ,  Sungyoon Ryu ,  Daejun Park ,  Seong Yun ,  Seungryeol Oh ,  Sujin Lee ,  Jaeyong Lee ,  Minho Rim ,  Chungsam Jun ,  Myungjun Lee

IPC: G01B11/02 ,  G01N21/88 ,  G03F7/00

CPC classification number: G01B11/02 ,  G01N21/8806 ,  G01N21/8851 ,  G03F7/70625 ,  G03F7/7065 ,  G01B2210/56 ,  G01N2021/8887

Abstract: Provided is a through-focus image-based metrology device including an optical device, and a computing device configured to acquire at least one through-focus image of a target from the optical device, generate an intensity profile based on the acquired at least one through-focus image, and perform metrology on the target based on the generated intensity profile, wherein the optical device includes a stage on which the target is disposed, the stage being configured to move by one step in at least one direction based on control of the computing device, and to acquire the at least one through-focus image, an image sensor disposed on the stage, an objective lens disposed between the image sensor and the stage, the objective lens being configured to transmit reflected light from the target, and a light source configured to emit illumination light to the target through the objective lens.

公开(公告)号：US20210396510A1

公开(公告)日：2021-12-23

申请号：US17156049

申请日：2021-01-22

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Kwangsoo Kim ,  Sungyoon Ryu ,  Daejun Park ,  Seong Yun ,  Seungryeol Oh ,  Sujin Lee ,  Jaeyong Lee ,  Minho Rim ,  Chungsam Jun ,  Myungjun Lee

IPC: G01B11/02 ,  G01Q60/24 ,  G03F7/20

Abstract: Provided is a through-focus image-based metrology device including an optical device, and a computing device configured to acquire at least one through-focus image of a target from the optical device, generate an intensity profile based on the acquired at least one through-focus image, and perform metrology on the target based on the generated intensity profile, wherein the optical device includes a stage on which the target is disposed, the stage being configured to move by one step in at least one direction based on control of the computing device, and to acquire the at least one through-focus image, an image sensor disposed on the stage, an objective lens disposed between the image sensor and the stage, the objective lens being configured to transmit reflected light from the target, and a light source configured to emit illumination light to the target through the objective lens.