公开(公告)号：US20250102926A1

公开(公告)日：2025-03-27

申请号：US18618345

申请日：2024-03-27

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sanghwan LEE ,  DOHYUNG KIM ,  JINHONG PARK ,  Sungbin JEON

IPC: G03F7/00

Abstract: Disclosed are a reticle masking device, a substrate processing apparatus, and a substrate processing method. The reticle masking device comprises a first masking device that provides a mask hole, a second masking device that is movable in a first direction with respect to the first masking device, and an optical sensor device coupled to the second masking device. The second masking device provides a slit vertically penetrates the second masking device and that overlaps the mask hole. The optical sensor device includes a first sensor fixedly coupled to a bottom surface of the second masking device, and a second sensor that stands opposite to the first sensor across the slit and is fixedly coupled to the bottom surface of the second masking device.

公开(公告)号：US20240219848A1

公开(公告)日：2024-07-04

申请号：US18519497

申请日：2023-11-27

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sanghwan LEE ,  Dohyung KIM ,  Jinhong PARK ,  Hachul SHIN ,  Seongchul HONG

IPC: G03F7/00 ,  G03F1/42

CPC classification number: G03F7/7085 ,  G03F1/42 ,  G03F7/70175 ,  G03F7/702 ,  G03F7/70558 ,  G03F7/70716

Abstract: A mask stage, including a body, a support on a lower surface of the body including an attachable extreme ultraviolet mask, a fiducial mark on the lower surface of the body and spaced apart from the support, and a sensor area including a plurality of measurement sensors configured to measure an energy of a portion of extreme ultraviolet light incident on the body, wherein the sensor area is on the lower surface of the body and is spaced apart from the support in a scan direction of the extreme ultraviolet light, and the plurality of measurement sensors are spaced apart from one another in a direction perpendicular to the scan direction.