公开(公告)号：US10198827B2

公开(公告)日：2019-02-05

申请号：US15409922

申请日：2017-01-19

Applicant: Samsung Electronics Co., Ltd.

Inventor： Woongkyu Son ,  Sangkyo Lim ,  Sunhee Shim ,  MiJung Jeon

IPC: G06T7/62 ,  G06T7/00 ,  G06T5/00 ,  G06T5/50

Abstract: A method of inspecting a sample includes performing a focusing operation on a target pattern of a sample. The focusing operation includes scanning the target pattern at different focusing levels to obtain a plurality of focus images. The method further includes using at least one of the plurality of the focus images as a target pattern image of the target pattern and then measuring a dimension of the target pattern based on the target pattern image.

公开(公告)号：US20170256070A1

公开(公告)日：2017-09-07

申请号：US15409922

申请日：2017-01-19

Applicant: Samsung Electronics Co., Ltd.

Inventor： Woongkyu Son ,  Sangkyo Lim ,  Sunhee Shim ,  MiJung Jeon

IPC: G06T7/62 ,  G06T7/00

CPC classification number: G06T7/62 ,  G06T5/003 ,  G06T5/50 ,  G06T7/001 ,  G06T2207/10061 ,  G06T2207/10148 ,  G06T2207/20016 ,  G06T2207/20221 ,  G06T2207/30148

Abstract: A method of inspecting a sample includes performing a focusing operation on a target pattern of a sample. The focusing operation includes scanning the target pattern at different focusing levels to obtain a plurality of focus images. The method further includes using at least one of the plurality of the focus images as a target pattern image of the target pattern and then measuring a dimension of the target pattern based on the target pattern image.

公开(公告)号：US09360308B2

公开(公告)日：2016-06-07

申请号：US14248673

申请日：2014-04-09

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Byung Hyun Hwang ,  Kwang-Hoon Kim ,  Woongkyu Son ,  Chulgi Song ,  Choonshik Leem

IPC: G01N23/20 ,  G01B15/02

CPC classification number: G01B15/02 ,  G01N23/20

Abstract: A method for analyzing an object includes measuring a first reflectivity of light from a surface and measuring a second reflectivity of light from the object, after the object is formed on the surface. A variation between the first and second reflectivities is calculated, and the variation is transformed by a predetermined transform. A thickness of the object is determined based on the transformed variation.

Abstract translation: 用于分析物体的方法包括在物体形成在表面上之后测量来自表面的光的第一反射率和测量来自物体的光的第二反射率。 计算第一和第二反射率之间的变化，并且通过预定变换来变换变化。 基于变换的变化确定对象的厚度。