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公开(公告)号：US20240329537A1
公开(公告)日：2024-10-03
申请号：US18509184
申请日：2023-11-14
发明人： Taegeun SEONG , Hyungrang MOON , Yoojeong CHOI , Wanhee LIM , Chungheon LEE , Daeseok SONG , Jun SAKONG
CPC分类号： G03F7/32 , G03F7/0042 , G03F7/168
摘要： A metal-containing photoresist developer composition, and a method of forming patterns including a step (e.g., an act or task) of developing using the same are provided. The metal-containing photoresist developer composition includes an organic solvent, an acid compound, and a conjugate base compound of the acid compound.
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公开(公告)号：US20210324235A1
公开(公告)日：2021-10-21
申请号：US17224363
申请日：2021-04-07
发明人： Wanhee LIM , Hyeonsu Jo , Byeonggyu Hwang , Taeksoo Kwak , Jin-Hee Bae , Seungwoo Jang
IPC分类号： C09D183/16 , B05D1/00 , C08G77/62 , B05D3/10
摘要： Provided is a composition for forming a silica layer including a silicon-containing polymer, and a solvent, wherein the silicon-containing polymer has a weight average molecular weight (Mw) of 8,000 g/mol to 15,000 g/mol, and wherein a content of nitrogen atoms of the silicon-containing polymer measured by a kjeldahl titration method is 25 wt % to 30 wt % based on a total weight of the silicon-containing polymer.
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公开(公告)号：US20170092488A1
公开(公告)日：2017-03-30
申请号：US15178378
申请日：2016-06-09
发明人： Jiho LEE , Kunbae NOH , Huichan YUN , Jin-Hee BAE , Wanhee LIM
IPC分类号： H01L21/02
CPC分类号： H01L21/02164 , H01L21/02216 , H01L21/02222 , H01L21/02282 , H01L21/02307 , H01L21/02337
摘要： A method of manufacturing a silica layer includes: coating a pre-wetting liquid material including a carbon compound on a substrate; coating a composition for forming a silica layer on the substrate coated with the pre-wetting liquid material; and curing a substrate coated with the composition for forming a silica layer.
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