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1.
公开(公告)号:US08875363B2
公开(公告)日:2014-11-04
申请号:US12237409
申请日:2008-09-25
申请人: Seigi Suh , Esther Kim , William J. Borland , Christopher Allen Gross , Omega N. Mack , Timothy R. Overcash
发明人: Seigi Suh , Esther Kim , William J. Borland , Christopher Allen Gross , Omega N. Mack , Timothy R. Overcash
CPC分类号: H01G4/12 , H01G13/00 , H05K1/162 , H05K2201/0175 , H05K2201/0195 , H05K2201/0355 , H05K2203/1126 , Y10T29/43 , Y10T29/435 , Y10T29/49128 , Y10T29/49147 , Y10T29/49155 , Y10T29/49163
摘要: Disclosed are methods of making a dielectric on a metal foil, and a method of making a large area capacitor that includes a dielectric on a metal foil. A first dielectric layer is formed over the metal foil by physical vapor deposition, and a dielectric precursor layer is formed over the first dielectric layer by chemical solution deposition. The metal foil, first dielectric layer and dielectric precursor layer are prefired at a prefiring temperature in the range of 350 to 650° C. The prefired dielectric precursor layer, the first dielectric layer and the base metal foil are subsequently fired at a firing temperature in the range of 700 to 1200° C.
摘要翻译: 公开了在金属箔上制造电介质的方法,以及制造在金属箔上包含电介质的大面积电容器的方法。 通过物理气相沉积在金属箔上形成第一电介质层,并且通过化学溶液沉积在第一介电层上形成电介质前体层。 金属箔,第一电介质层和电介质前体层在预热温度为350至650℃的范围内预烧制。预烧电介质前体层,第一介电层和贱金属箔随后在焙烧温度 范围700〜1200℃
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2.
公开(公告)号:US20100073845A1
公开(公告)日:2010-03-25
申请号:US12237409
申请日:2008-09-25
申请人: SEIGI SUH , Esther Kim , William J. Borland , Christopher Allen Gross , Omega N. Mack , Timothy R. Overcash
发明人: SEIGI SUH , Esther Kim , William J. Borland , Christopher Allen Gross , Omega N. Mack , Timothy R. Overcash
CPC分类号: H01G4/12 , H01G13/00 , H05K1/162 , H05K2201/0175 , H05K2201/0195 , H05K2201/0355 , H05K2203/1126 , Y10T29/43 , Y10T29/435 , Y10T29/49128 , Y10T29/49147 , Y10T29/49155 , Y10T29/49163
摘要: Disclosed are methods of making a dielectric on a metal foil, and a method of making a large area capacitor that includes a dielectric on a metal foil. A first dielectric layer is formed over the metal foil by physical vapor deposition, and a dielectric precursor layer is formed over the first dielectric layer by chemical solution deposition. The metal foil, first dielectric layer and dielectric precursor layer are prefired at a prefiring temperature in the range of 350 to 650° C. The prefired dielectric precursor layer, the first dielectric layer and the base metal foil are subsequently fired at a firing temperature in the range of 700 to 1200° C.
摘要翻译: 公开了在金属箔上制造电介质的方法,以及制造在金属箔上包含电介质的大面积电容器的方法。 通过物理气相沉积在金属箔上形成第一电介质层,并且通过化学溶液沉积在第一介电层上形成电介质前体层。 金属箔,第一电介质层和电介质前体层在预热温度为350至650℃的范围内预烧制。预烧电介质前体层,第一介电层和贱金属箔随后在焙烧温度 范围700〜1200℃
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