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公开(公告)号：US20240216957A1
公开(公告)日：2024-07-04
申请号：US18386914
申请日：2023-11-03
Applicant: SEMES CO., LTD.
Inventor： Sun Wook JUNG , Hyun YOON , Ha Neul YOO , Ho Jong HWANG
CPC classification number: B08B3/022 , B08B13/00 , H01L21/67051
Abstract: According to the present disclosure, provided is a bowl receiving incident droplets and preventing the same from scattering, or causing the same to scatter downwardly, the bowl including: a main body surrounding a substrate support unit; a groove formed in a spiral shape in at least a portion of an inner surface of the main body; and a separation wall disposed between adjacent grooves in a vertical direction on the inner surface of the main body, wherein a thickness at a first position in the main body in which the groove is formed is greater than a thickness at a second position, lower than the first position.
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公开(公告)号：US20240162056A1
公开(公告)日：2024-05-16
申请号：US18367564
申请日：2023-09-13
Applicant: SEMES CO., LTD.
Inventor： Sun Wook JUNG , Ha Neul YOO , Woo Ram LEE , Young Jun SON
CPC classification number: H01L21/67051 , B08B3/022
Abstract: An apparatus for processing a substrate includes a first bowl and a processing space therein; a first support portion disposed in the processing space and configured to support the substrate in a first support position; a second bowl disposed to move in a first direction in the processing space; a second support portion configured to move upwardly and downwardly with respect to the first support portion to support the substrate between the second support position disposed above the first support position and the third support position, and to move in the first direction; and a cleaning unit including a first cleaning portion disposed below the substrate toward a rear surface of the substrate in the first support position and a second cleaning portion disposed below the substrate and opposing a rear surface of the substrate between the second support position and the third support position.
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