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公开(公告)号：US20210013029A1
公开(公告)日：2021-01-14
申请号：US16920418
申请日：2020-07-02
Applicant: SEMES CO., LTD.
Inventor： Do Yeon KIM , Se Hoon OH , Won Geun KIM , Ju Mi LEE , Ho Jong HWANG , Pil Kyun HEO , Hyun YOON , Choong Hyun LEE , Hyun Goo PARK
Abstract: Provided is a substrate treatment apparatus including a treatment container equipped with a conductive member. The conductive member is made of a material having a lower resistivity than that of the treatment container. The conductive member prevents a rise of an electric potential of the treatment container, which is caused by charging during treatment of a substrate, thereby preventing the substrate from being contaminated and damaged by particles and electrostatic arcing.
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公开(公告)号：US20240170304A1
公开(公告)日：2024-05-23
申请号：US18515611
申请日：2023-11-21
Applicant: SEMES CO., LTD.
Inventor： Ho Jong HWANG , Hyun Goo PARK , Hyo Won YANG , Ki-Moon KANG , Sang Min LEE , Se Hoon OH , Won Sik SON
IPC: H01L21/67
CPC classification number: H01L21/67017 , H01L21/67109
Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes treating modules having an opening for taking in and taking out a substrate and which are stacked on each other; and an air flow generating member for generating a downward airflow at each treating module, and wherein the air flow generating member includes: a pan unit configured to supply an air; a spray unit configured to be provided above the treating module and which sprays an air supplied from the pan unit; and an exhaust unit configured to exhaust an air sprayed by the spray unit to outside of the treating module.
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公开(公告)号：US20250093768A1
公开(公告)日：2025-03-20
申请号：US18770090
申请日：2024-07-11
Applicant: SEMES CO., LTD. , SAMSUNG ELECTRONICS CO. LTD.
Inventor： Jin Yeong SUNG , Ki Hoon CHOI , Seung Un OH , Young Ho PARK , Sang Hyeon RYU , Jang Jin LEE , Hyun YOON , Sang Gun LEE , Yu Jin CHO , Ho Jong HWANG , Jong Ju PARK , Jong Keun OH , Yong Woo KIM
Abstract: A substrate processing apparatus is provided and includes: a support unit including a spin chuck and a centering jig that is on the spin chuck, the spin chuck configured to support and rotate a substrate; a spraying unit configured to spray processing liquid onto the substrate; a swing arm including a correction unit that includes a sensor and an emitter, the swing arm configured to move such that the correction unit moves to a target point on the substrate, and the emitter configured to irradiate a beam towards the substrate; and a controller configured to: control the spin chuck and the swing arm; and determine whether a movement trajectory of the swing arm is aligned with a rotation center of the spin chuck based on information acquired by the sensor about the centering jig.
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公开(公告)号：US20230307260A1
公开(公告)日：2023-09-28
申请号：US17703255
申请日：2022-03-24
Applicant: SEMES CO., LTD.
Inventor： Ho Jong HWANG , Do Yeon KIM , Hyun YOON
IPC: H01L21/67 , H01L21/687 , B08B3/08 , B08B3/04 , B08B3/02
CPC classification number: H01L21/67051 , H01L21/68764 , B08B3/08 , B08B3/041 , B08B3/022
Abstract: The present invention provides a substrate treating apparatus. The substrate treating apparatus includes: a cup having a treatment space therein; a support unit configured to support a substrate within the treatment space, and including a rotatable support plate; and a liquid discharge unit configured to discharge a chemical liquid to the substrate supported by the support unit, in which the support unit includes: a plurality of pin members provided to the support plate to support the substrate placed on the support plate; and a discharge member coupled to the pin member to discharge charges to the air according to a rotation of the support plate, and the discharge member is provided as a conductive member.
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公开(公告)号：US20240216957A1
公开(公告)日：2024-07-04
申请号：US18386914
申请日：2023-11-03
Applicant: SEMES CO., LTD.
Inventor： Sun Wook JUNG , Hyun YOON , Ha Neul YOO , Ho Jong HWANG
CPC classification number: B08B3/022 , B08B13/00 , H01L21/67051
Abstract: According to the present disclosure, provided is a bowl receiving incident droplets and preventing the same from scattering, or causing the same to scatter downwardly, the bowl including: a main body surrounding a substrate support unit; a groove formed in a spiral shape in at least a portion of an inner surface of the main body; and a separation wall disposed between adjacent grooves in a vertical direction on the inner surface of the main body, wherein a thickness at a first position in the main body in which the groove is formed is greater than a thickness at a second position, lower than the first position.
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Patent Agency Ranking
公开(公告)号：US20230405648A1
公开(公告)日：2023-12-21
申请号：US18201934
申请日：2023-05-25
Applicant: SEMES CO., LTD.
Inventor： Won Sik SON , Pil Kyun HEO , Ho Jong HWANG
Abstract: The moving assembly for a recovery guard includes a recovery vessel including a first recovery vessel disposed to surround a substrate support and a second recovery vessel disposed inside of the first recovery vessel, concentrically with respect to the first recovery vessel, and a lifting driver connected to the first and second recovery vessels and elevating the first and second recovery vessels. The lifting driver includes a motor, a drive shaft connected to the motor and rotated in a first direction, a first shaft connected to the first recovery vessel and extending in a second direction, perpendicular to the first direction, a second shaft connected to the second recovery vessel and extending in the second direction, a first clutch connecting the drive shaft and the first shaft, and a second clutch connecting the drive shaft and the second shaft.
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公开(公告)号：US20230286713A1
公开(公告)日：2023-09-14
申请号：US17693807
申请日：2022-03-14
Applicant: SEMES CO., LTD.
Inventor： Hyun YOON , Ho Jong HWANG , Young Jin KIM
Abstract: The present invention relates to a bowl including a collection container having an inner surface, and an outer surface disposed opposite to the inner surface, in which a pattern is formed on the inner surface.
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公开(公告)号：US20240222154A1
公开(公告)日：2024-07-04
申请号：US18507008
申请日：2023-11-10
Applicant: SEMES CO., LTD.
Inventor： Won Sik SON , Ho Jong HWANG , Hyun Goo PARK
CPC classification number: H01L21/67028 , B08B3/10 , B08B5/02 , B08B7/0021 , B08B2203/007
Abstract: A substrate processing apparatus using a supercritical fluid that can remove floating particles is provided. The substrate processing apparatus comprises a vessel including a processing space for processing a substrate, and a first vessel and a second vessel configured to be combined to be open and closed, wherein the first vessel and the second vessel seal the processing space in a closed position, and the first vessel and the second vessel open the processing space in an open position; a clamping unit configured to clamp the first vessel and the second vessel in the closed position; and an intake unit configured to intake a particle by including an intake member positioned to correspond to an open space between the first vessel and the second vessel in the open position.
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公开(公告)号：US20230205103A1
公开(公告)日：2023-06-29
申请号：US18145480
申请日：2022-12-22
Applicant: SEMES CO., LTD.
Inventor： Ho Jong HWANG , Do Yeon Kim
CPC classification number: G03F7/70975 , B05C5/02 , B08B3/02
Abstract: The present invention provides a home pot. The home pot comprising: a housing having a cylindrical accommodation space of which the upper part is open and in which a nozzle tip can be accommodated, and has n injection flow paths formed on a sidewall in contact with the accommodation space; and a cleaning liquid supply portion provided in the housing and configured to supply a cleaning liquid to the n injection flow paths, and the n injection flow paths are disposed to be inclined with respect to the center of the accommodation space such that a high-speed swirling flow is generated in the accommodation space.
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公开(公告)号：US20230166307A1
公开(公告)日：2023-06-01
申请号：US17825049
申请日：2022-05-26
Applicant: SEMES CO., LTD.
Inventor： Ho Jong HWANG
IPC: B08B9/093
CPC classification number: B08B9/093
Abstract: A substrate processing apparatus includes a spraying unit installed in an inner space of a chamber member in which a substrate is processed, spraying a cleaning liquid into the inner space of the chamber member so as to clean devices for discharging a chemical liquid to the substrate and then collecting the chemical liquid, and spraying a drying gas for drying the remaining cleaning liquid into the inner space of the chamber member, a management unit removing a residue remaining on the spraying unit after the spraying unit sprays the cleaning liquid, and a controller controlling the spraying unit and the management unit.
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