公开(公告)号：US20250099999A1

公开(公告)日：2025-03-27

申请号：US18675465

申请日：2024-05-28

Applicant: SEMES CO., LTD.

Inventor： Yong Hoon HONG ,  Jin Ah HAN ,  Byung Sun BANG ,  Hyun Woo TAK

IPC: B05B14/30 ,  B05B12/08

Abstract: A treatment liquid supply apparatus includes a discharge line through which treatment liquid is discharged from a substrate processing apparatus; a first tank storing recovered treatment liquid, recovered through the discharge line; a treatment liquid supply unit supplying new treatment liquid to the discharge line through a first transfer line; a first heating unit disposed between the treatment liquid supply unit and the discharge line and controlling a temperature of the new treatment liquid passing through the first transfer line; and a second tank resupplying the recovered treatment liquid supplied from the first tank through a second transfer line to the substrate processing apparatus through a supply line.

公开(公告)号：US20240153792A1

公开(公告)日：2024-05-09

申请号：US18387713

申请日：2023-11-07

Applicant: SEMES CO., LTD. ,  SAMSUNG ELECTRONICS CO., LTD.

Inventor： Min Jung KIM ,  Jin Ah HAN ,  Hee Hwan KIM ,  Yong Hoon HONG ,  Kyoung Suk KIM ,  Jong Hyeok PARK ,  Jin Hyung PARK ,  Dae Hyuk CHUNG ,  Ji Hoon CHA

IPC: H01L21/67 ,  H01L21/306

CPC classification number: H01L21/6708 ,  H01L21/30604

Abstract: An apparatus and method for processing a substrate can reduce the concentration of process by-products in a chemical solution. The apparatus includes a substrate rotating device configured to rotate a seated substrate in a spinning manner, a chemical solution supply device configured to supply a chemical solution to the substrate, a chemical solution discharge line configured to discharge the chemical solution having undergone a process to an outside, a chemical solution circulation line configured to circulate the chemical solution having undergone the process to the chemical solution supply device, and a discharged chemical solution selection device configured to discharge a chemical solution containing a first amount of process by-products to the outside through the chemical solution discharge line and to circulate a chemical solution containing a second amount of process by-products through the chemical solution circulation line, wherein the first amount of process by-products is larger than the second amount of process by-products.