公开(公告)号：US11167326B2

公开(公告)日：2021-11-09

申请号：US16502272

申请日：2019-07-03

Applicant: SEMES CO., LTD.

Inventor： Min Sung Han ,  Doyeon Kim ,  Jinkyu Kim ,  Yoon Jong Ju

IPC: H01L21/67 ,  B08B7/00

Abstract: An apparatus for processing a substrate comprises a processing vessel having a processing space inside, a substrate support unit that supports and rotates the substrate in the processing vessel, and a nozzle unit that dispenses a processing liquid onto the substrate. The nozzle unit comprises a nozzle that dispenses the processing liquid and an ultraviolet (UV) light supply unit that emits UV light to activate radicals of the processing liquid dispensed onto the substrate.

公开(公告)号：US10005092B2

公开(公告)日：2018-06-26

申请号：US15223931

申请日：2016-07-29

Applicant: Semes Co., Ltd.

Inventor： Sehoon Oh ,  Kihoon Choi ,  Jinkyu Kim

IPC: B05B3/00 ,  B05C5/02 ,  B05B7/10 ,  B05B7/06 ,  B05B7/08 ,  H01L21/67

CPC classification number: B05B7/10 ,  B05B7/06 ,  B05B7/061 ,  B05B7/0815 ,  B05C5/0208 ,  H01L21/67051

Abstract: A nozzle for supplying a fluid to a substrate, the nozzle including a body having a liquid discharge line through which the liquid flows and a gas discharge line that surrounds the liquid discharge line and through which a gas flow, wherein the body includes a plurality of liquid discharge holes that discharge the liquid flowing through the liquid discharge line, and a gas discharge hole that discharges the gas flowing through the gas discharge line.