Substrate processing apparatus and nozzle unit

    公开(公告)号:US11167326B2

    公开(公告)日:2021-11-09

    申请号:US16502272

    申请日:2019-07-03

    Abstract: An apparatus for processing a substrate comprises a processing vessel having a processing space inside, a substrate support unit that supports and rotates the substrate in the processing vessel, and a nozzle unit that dispenses a processing liquid onto the substrate. The nozzle unit comprises a nozzle that dispenses the processing liquid and an ultraviolet (UV) light supply unit that emits UV light to activate radicals of the processing liquid dispensed onto the substrate.

Patent Agency Ranking