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公开(公告)号:US12046466B2
公开(公告)日:2024-07-23
申请号:US17965911
申请日:2022-10-14
Applicant: SEMES CO., LTD.
Inventor: Yong-Jun Seo , Hyun Yoon , Jungsuk Goh , Byeong Geun Kim , Yoonki Sa , Doyeon Kim , Yerim Yeon , Choonghyun Lee , Pil Kyun Heo , Youngje Um , Jaeseong Lee , Dongok Ahn
CPC classification number: H01L21/02101 , H01L21/6715
Abstract: The inventive concept provides a method for treating a substrate. In an embodiment, the substrate treating method includes a treatment step of treating a residue on the substrate with a first fluid in a supercritical state and a second fluid in a supercritical state in a process space of a chamber, and the first fluid in the supercritical state and the second fluid in the supercritical state have different densities.
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公开(公告)号:US11961695B2
公开(公告)日:2024-04-16
申请号:US17409840
申请日:2021-08-24
Applicant: SEMES CO., LTD.
Inventor: Doyeon Kim , Hyun Yoon , Ho Jong Hwang
IPC: H01J37/02 , H01J37/20 , H01J37/317 , H01L21/687
CPC classification number: H01J37/026 , H01J37/20 , H01J37/3171 , H01L21/6875 , H01J2237/0044 , H01J2237/2007
Abstract: An apparatus for treating a substrate includes a process chamber that performs a liquid treatment process by dispensing a treatment liquid onto the substrate, and components provided in the process chamber. A surface of at least one of the components is formed of a material containing an ion-implanted fluorine resin.
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公开(公告)号:US11600593B2
公开(公告)日:2023-03-07
申请号:US16658469
申请日:2019-10-21
Applicant: SEMES CO., LTD.
Inventor: Hanglim Lee , Jungsuk Goh , Kwangsup Kim , Doyeon Kim , Minyoung Kim , Jihoon Park , Yungi Kim , Do Heon Kim , Choonghyun Lee , Hyo Seok Lee , Soo Ill Jang
Abstract: Disclosed are a die bonding apparatus, a substrate bonding apparatus, a die bonding method, and a substrate bonding method that are capable of bonding a die to a substrate or bonding substrates together without using a bonding medium such as an adhesion film and a solder bump. The die bonding method includes hydrophilizing a bonding surface of the die, by plasma processing, forming a liquid film on a bonding area of the substrate, by supplying a liquid including water to the bonding area of the substrate, pre-bonding the die to the substrate by bringing the die into contact with the liquid film, and post-bonding one or more dies to the substrate at the same time, by performing heat treatment in a state in which the one or more dies are pre-bonded to the substrate.
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公开(公告)号:US11167326B2
公开(公告)日:2021-11-09
申请号:US16502272
申请日:2019-07-03
Applicant: SEMES CO., LTD.
Inventor: Min Sung Han , Doyeon Kim , Jinkyu Kim , Yoon Jong Ju
Abstract: An apparatus for processing a substrate comprises a processing vessel having a processing space inside, a substrate support unit that supports and rotates the substrate in the processing vessel, and a nozzle unit that dispenses a processing liquid onto the substrate. The nozzle unit comprises a nozzle that dispenses the processing liquid and an ultraviolet (UV) light supply unit that emits UV light to activate radicals of the processing liquid dispensed onto the substrate.
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