公开(公告)号：US20210057239A1

公开(公告)日：2021-02-25

申请号：US16999836

申请日：2020-08-21

Applicant: SEMES CO., LTD.

Inventor： Junho KIM ,  Kyungsik SHIN ,  Youngseo AN ,  Jinki SHIN ,  Man Kyu KANG ,  Yoonki SA

IPC: H01L21/67 ,  H01L21/683

Abstract: An apparatus for treating a substrate includes a process chamber having a process space therein, a support unit that supports the substrate in the process space, a heating member that heats the substrate supported on the support unit, and an exhaust unit that evacuates the process space. The exhaust unit includes an exhaust duct and a heat retention unit having a retention space that retains heat released from the process space. The retention space surrounds an adjacent area located adjacent to the process chamber in the exhaust duct.

公开(公告)号：US20180151409A1

公开(公告)日：2018-05-31

申请号：US15823311

申请日：2017-11-27

Applicant: SEMES CO., LTD.

Inventor： Min Woo JO ,  Cheolmin CHOI ,  Sanguk PARK ,  Man Kyu KANG

IPC: H01L21/687

CPC classification number: H01L21/68785 ,  H01L21/67109 ,  H01L21/6715 ,  H01L21/67178 ,  H01L21/67769 ,  H01L21/68742 ,  H01L21/6875

Abstract: Embodiments of the inventive concept relate to a substrate treating apparatus. A substrate support unit configured to support a substrate includes a support plate, on which the substrate is positioned, the support plate may include a passage formed on an upper surface of the support plate and connecting a central area and a side surface of the support plate, and a recess formed in a peripheral area of the support plate and recessed inwards from a side surface of the support plate, and the recess may communicate with one end of the passage.