-
公开(公告)号:US20220165589A1
公开(公告)日:2022-05-26
申请号:US17533348
申请日:2021-11-23
Applicant: SEMES CO., LTD.
Inventor: Ki Sang EUM , Jin Ho CHOI , Byoung Doo CHOI , Seung Han LEE , Sun Wook JUNG , Si Eun KIM
IPC: H01L21/67 , C23C16/455 , C23C16/44 , H01L21/687 , H01L21/02
Abstract: An apparatus for treating a substrate, the apparatus comprising: a processing container having an inner space; a support unit having a support plate configured to support and rotate the substrate in the inner space; a liquid supply unit supplying treating liquid to the substrate supported by the support unit; and an exhaust unit exhausting an air flow in the inner space, wherein the processing container includes a bottom wall and a side wall extending from the outside end of the bottom wall, the processing container including a first gas-liquid separator provided at the side wall.
-
公开(公告)号:US20220139738A1
公开(公告)日:2022-05-05
申请号:US17515737
申请日:2021-11-01
Applicant: SEMES CO., LTD.
Inventor: Jae Oh BANG , Young Seo AN , Seung Han LEE , Seung Hwan LEE , Hyun Min KIM
Abstract: The inventive concept relates to a substrate treating apparatus including a process chamber having a first and a second body, a support unit supporting a substrate, a heating unit heats the substrate, a driver moves any one of the first body and the second body, an interval state detection unit that detects an interval state between a side wall of the first body and a side wall of the second body when the first and the second body are placed in a process location, and a controller that controls the driver and the interval state detection unit, wherein the interval state detection unit includes a pressure provision line that provides a positive pressure or a negative pressure between the side wall of the first body and the side wall of the second body, and a pressure measurement member that measures a change in a pressure of the pressure provision line.
-