公开(公告)号：US10981184B2

公开(公告)日：2021-04-20

申请号：US15935111

申请日：2018-03-26

Applicant: SEMES CO., LTD.

Inventor： Soon Cheon Cho ,  Bongkyu Shin ,  Hyun Joong Kim

IPC: B05B5/025 ,  B05C5/02 ,  B05B17/04 ,  B05B5/08 ,  B05B7/22 ,  B05B5/00 ,  B05D1/04 ,  B05D3/00 ,  B05D3/14

Abstract: Disclosed are a coating apparatus and a coating method. The coating apparatus includes a chamber, a support located in an interior space of the chamber and configured to support a substrate which is to be coated, an ejection nozzle configured to eject a coating material toward the support, and an electric field forming unit configured to form an electric field in a movement path of the coating material to provide kinetic energy for the coating material.

公开(公告)号：US20230124857A1

公开(公告)日：2023-04-20

申请号：US17744624

申请日：2022-05-14

Applicant: SEMES CO., LTD.

Inventor： Yoon Seok CHOI ,  Soon Cheon Cho ,  Sang Jeong Lee ,  Hyun Woo Jo ,  Jong Won Park

IPC: H01J37/32

Abstract: A plasma processing apparatus is provided. The plasma processing apparatus includes a chamber having a processing space defined therein in which plasma is generated; and a plasma generation unit configured to excite gas in the processing space into a plasma state, wherein the plasma generation unit includes: a first power supply to supply power for generation of the plasma; a coil connected to the first power supply; a first shunt capacitor disposed between and connected to a first node of the coil and a ground; and a second shunt capacitor disposed between and connected to a second node other than the first node of the coil and the ground.